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Photocopying August inventions list 08/10

20100214544 - Fluid handling device, an immersion lithographic apparatus and a device manufacturing method: A fluid handling device for an immersion lithographic apparatus, the fluid handling device comprising: at least one body with a surface facing a space for fluid; a plurality of openings for the flow of fluid therethrough defined in the surface; at least one barrier moveable relative to the plurality of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100214543 - Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100214545 - Creating metal gate structures using lithography-etch-lithography-etch (lele) processing sequences: The invention can provide apparatus and methods of creating metal gate structures on wafers in real-time using Lithography-Etch-Lithography-Etch (LELE) processing sequence. Real-time data and/or historical data associated with LELE processing sequences can be fed forward and/or fed back as fixed variables or constrained variables in internal-Integrated-Metrology modules (i-IMM) to improve... Agent: Tokyo Electron U.s. Holdings, Inc.

20100214547 - Methods of determining quality of a light source: Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on... Agent: Duane Morris LLP (tsmc)IPDepartment

20100214546 - Projection optical system, exposure apparatus, and device manufacturing method: where EA0 represents an effective aperture of each of the plurality of optical elements and EA represents an axial light flux diameter of each of the plurality of optical elements, and a control unit configured to control the deformation unit, wherein n positions on an outer circumference of the deformable... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100214548 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100214549 - Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system: A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100214550 - Alignment system and alignment marks for use therewith: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100214551 - Projection objective and method for optimizing a system aperture stop of a projection objective: In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective... Agent: Fish & Richardson PC

20100214552 - Multi-table lithographic systems, lithography processing tools and methods for processing workpieces: A lithographic workpiece processing tool includes a loading area for loading a workpiece; and a processing area for processing a workpiece. The workpiece processing tool further includes a multi-table system arranged between the loading area and the processing area. The multi-table system includes at least two tables configured to pass... Agent: Harness, Dickey & Pierce, P.L.C

20100214553 - Exposing method and device manufacturing method: In an exposing method which illuminates, by illumination light, a mask having apertures arranged in matrix and a latticed light shielding portion, projects the mask on an object to be projected via a projection optical system, and thus forms a dark portion pattern image at a position conjugate in relation... Agent: Fitzpatrick Cella Harper & Scinto

20100208220 - Aligner and self-cleaning method for aligner: When a self-cleaning method for an aligner is carried out, a reflecting plate having a convex lens portion is set in an original plate holder, and exposure light rays are irradiated from a light source. The surface of the lens portion is coated with a reflective film. The light rays... Agent: Rabin & Berdo, PC

20100208221 - Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method: A fluid supply system for a lithographic apparatus, includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100208222 - Exposure apparatus and method to measure beam position and assign address using the same: An exposure apparatus and a method to measure a beam position and assigning an address using the same are disclosed. The exposure apparatus includes a Digital Micromirror Device (DMD) having a plurality of micromirrors, each micromirror to modulate light projected from a light source and project a modulated DMD beam... Agent: Staas & Halsey LLP

20100208223 - Illumination optical system, exposure apparatus, and device fabrication method: The present invention provides an illumination optical system which illuminates an illumination target surface with a light beam from a light source, the system including a plurality of adjustment units each having one of a reflectance distribution and a transmittance distribution to adjust an incident angle distribution of the light... Agent: Rossi, Kimms & Mcdowell LLP.

20100208224 - Lithographic apparatus and method of removing liquid: A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100208225 - Projection objective for micrlolithography having an obscurated pupil: A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends... Agent: Fish & Richardson PC

20100208227 - Dual-stage switching system for lithographic machine: A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and... Agent: Ratnerprestia

20100208226 - Holographic exposure apparatuses: A holographic exposure apparatus may include an object to be exposed, a holographic mask on which a pattern to be transferred onto the object is formed, a stage to support the mask, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative... Agent: Harness, Dickey & Pierce, P.L.C

20100208228 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus of the present invention is an exposure apparatus which exposes a pattern of an original plate 3 onto a substrate 5, and the exposure apparatus comprises an original plate alignment detection system 13 which moves the original plate 3 in an in-plane direction at an outside of... Agent: Rossi, Kimms & Mcdowell LLP.

20100208229 - Maskless exposure method: Disclosed is a maskless exposure method, where it is possible to perform a more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit, and it is also possible to reduce generation of a blur in an exposed pattern.... Agent: Mckenna Long & Aldridge LLP

20100208230 - Method for arranging an optical module in a measuring apparatus and a measuring apparatus: A method for arranging an optical module in a measuring apparatus includes: providing the measuring apparatus with an irradiation system for irradiating the optical module with electromagnetic radiation, a reference component, and a detection element defining a detection surface, the detection element being disposed in a defined position in relation... Agent: Sughrue Mion, PLLC

20100201958 - Optical correction device: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for... Agent: Fish & Richardson PC

20100201959 - Projection objective for microlithography: A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on... Agent: Fish & Richardson PC

20100201960 - Optical system of a microlithographic projection exposure apparatus: In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the... Agent: Fish & Richardson PC

20100201961 - System for improving critical dimension uniformity: A system for improving substrate critical dimension uniformity is described. The system includes an exposing means for exposing a plurality of mask patterns on a first plurality of substrates at predetermined locations with common splits of focus ({Fj}) and exposure dose ({Ek}) for each of the first plurality of substrates... Agent: Haynes And Boone, LLPIPSection

20100201962 - Projection exposure method, system and objective: A projection exposure method is disclosed which includes exposing an exposure area of a radiation-sensitive substrate, arranged in an image surface of a projection objective, with at least one image of a pattern of a mask arranged in an object surface of the projection objective in a scanning operation. The... Agent: Fish & Richardson PC

20100201963 - Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100201964 - Projection objective for microlithography: An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is... Agent: Fish & Richardson PC

20100201965 - Method and system for improved overlay correction: A method for improving alignment in a photolithography machine is provided. The method comprises identifying first empirical alignment data that has been determined from use of a target photomask within at least one non-target tool, and identifying second empirical alignment data that has been determined from use of a non-target... Agent: Slater & Matsil, L.L.P.

20100195065 - Exposure apparatuses: An exposure apparatus may include a light source generating light; a hologram mask, on which a hologram pattern is formed; and an optical unit movably disposed on the hologram mask to guide the light generated from the light source to the hologram mask. An exposure apparatus may include a light... Agent: Harness, Dickey & Pierce, P.L.C

20100195066 - System and method for treating substrate: A method and system for treating a substrate are provided. The system includes a coating unit, a pre/post-exposure treatment unit, and a developing unit. Each of the units includes a load port and an index module. The pre/post-exposure treatment unit includes first and second modules that are arranged in different... Agent: Harness, Dickey & Pierce, P.L.C

20100195068 - Cleaning member, cleaning method, and device manufacturing method: A cleaning member is smaller than a substrate for exposure where exposure light is irradiated, and at least part of a substrate-holding member that holds a rear face of the substrate for exposure is held by the substrate-holding member in order to clean.... Agent: Staas & Halsey LLP

20100195067 - Exposure apparatus, exposure method, and method for producing device: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate. The apparatus includes a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into... Agent: Oliff & Berridge, PLC

20100195069 - Exposure method and exposure system: An exposure method has acquiring first OPE (Optical Proximity Effect) error corresponding to a first and second transcriptional pattern portions formed by transcribing a first and second pattern portions of a mask pattern onto a substrate with an exposure apparatus, computing a first correction amount of an exposure condition, the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100195070 - Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate: A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a... Agent: Fish & Richardson PC

20100195071 - Image sensor, method for image detection and computer program product: The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100195077 - Illumination system for a microlithography projection exposure installation: An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity... Agent: Sughrue Mion, PLLC

20100195072 - Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method: There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first area through which a... Agent: Staas & Halsey LLP

20100195076 - Optical membrane element: An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one... Agent: Fish & Richardson PC

20100195075 - Projection objective having mirror elements with reflective coatings: An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements having a reflective surface formed by a reflective coating positioned... Agent: Fish & Richardson PC

20100195073 - Scanned writing of an exposure pattern on a substrate: An exposure pattern is written on a substrate, by scanning a light spot along a trajectory over the substrate and switching it on and off according to a desired pattern. Respective spot sizes of the light for illuminating the substrate in respective parts of the trajectory according to a geometry... Agent: Dorsey & Whitney, LLP Intellectual Property Department

20100195074 - Thermal regulation of vibration-sensitive objects: An exemplary thermally regulated component is an optical element or chuck for holding an optical element, or a stage for same, or combination thereof. The component has first and second heat-transfer zones. The first has a first component surface that receives a heating influence such as incident electromagnetic radiation. The... Agent: Klarquist Sparkman, LLP

20100195079 - Exposure device and image forming apparatus: An exposure device includes a substrate on which a light emitting element array is provided, a focusing lens that focuses light emitted by the light emitting element array, a supporting member that supports the substrate and the focusing lens. The supporting member has a contact surface. A base is provided... Agent: Rabin & Berdo, PC

20100195078 - Projection exposure apparatus and projection exposure method: Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the... Agent: Foley & Lardner LLP

20100195080 - Clamping device and object loading method: The present invention relates to a c lamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100195082 - Device, system, and method for multidirectional ultraviolet lithography: A system according to an embodiment of the present invention comprises a movable stage having a top surface. A photosensitive material may be deposited on the top surface and a mask may be placed on the photosensitive material. A vessel, having a top portion, one or more flexible sides, and... Agent: Hodgson Russ LLP The Guaranty Building

20100195081 - Reticle support that reduces reticle slippage: A system and method substantially eliminate reticle slip during the movement of a reticle stage. The system includes a mask holding system, a mask force device, and a support transport device. The mask holding system includes a support device and a holding device where the holding device releasably couples a... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100195083 - Automatic substrate transport system: An automatic substrate transport system having adjustable mechanisms to guide and float substrates on a film of air along a sloped path, permits smooth movement with significantly reduced contact and abrasion damage to imaged surfaces on the substrates. This allows for the transportation of any substrates including those coated with... Agent: Reed Smith LLP

20100195084 - Substrate holding platen with high speed vacuum: A substrate holding platen has a top surface having a plurality of openings, an enclosed plenum area below the top surface, and a large orifice valve connecting the plenum area to a high flow vacuum pump. The plurality of openings may include snubber slots on the top surface, and/or openings... Agent: Reed Smith LLP

20100195085 - Positioning apparatus, exposure apparatus, and device manufacturing method: A positioning apparatus of the present invention performs a positioning of an object with a predetermined number of degrees of freedom. The positioning apparatus comprises a plurality of drivers whose number is more than that of the degrees of freedom, which are configured to drive the object, a calculator configured... Agent: Rossi, Kimms & Mcdowell LLP.