SEARCH:      Monitor Keywords |  Custom RSS

Photocopying July category listing 07/10

20100188646 - Drawing method and drawing apparatus: A drawing method includes the steps of: moving a plurality of drawing heads relative to a drawing surface in a predetermined scanning direction, each of the drawing heads being equipped with a drawing point forming section, in which drawing elements for forming drawing points on the drawing surface are arranged... Agent: Sughrue Mion, PLLC

20100188647 - Control systems and methods applying iterative feedback tuning for feed-forward and synchronization control of microlithography stages and the like: Stage assemblies and control methods are disclosed. An exemplary assembly includes a first stage and first and second controllers. The first controller feedback-controls the first stage according to a respective parameter vector. The second controller controls the first stage by feed-forward control, according to a respective parameter vector. The controllers... Agent: Klarquist Sparkman, LLP

20100182576 - Lithographic apparatus and device manufacturing method: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100182577 - Projection optical system, exposure apparatus and device manufacturing method: A projection optical system of the present invention includes an optical element group that includes optical elements, and a controller that drives at least one of the first optical elements. The optical element group includes aspheric surfaces having a complementary relationship with each other and are arranged so that the... Agent: Rossi, Kimms & Mcdowell LLP.

20100182578 - Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of a substrate table is arranged to be easily applied and removed and in an embodiment, reduces transmission of forces between the different parts.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100182579 - Laser device: A laser device includes a seed laser, an amplifier, a detector, and an optical element arranged to direct radiation emitted by the seed laser towards a plasma generation site. The optical element is arranged to direct towards the detector amplified spontaneous emission radiation which has been emitted by the seed... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100182581 - Lens, exposure apparatus, and device manufacturing method: A lens 10 is used in a state where a direction of an optical axis 1b passing through a curvature center of a lens surface is different from a direction of a gravitational force, and a position of a center 1a of a light beam effective portion 3 (a position... Agent: Rossi, Kimms & Mcdowell LLP.

20100182580 - Photolithography systems with local exposure correction and associated methods: Photolithography systems with local exposure correction and associated methods are disclosed. In one embodiment, a photolithography system includes an off-axis illumination source and a substrate support facing the illumination source. The substrate support is configured to carry a microelectronic substrate. The photolithography system further includes a photomask between the illumination... Agent: Perkins Coie LLP Patent-sea

20100182583 - Exposure apparatus and device manufacturing method: An exposure apparatus 1 comprises a collecting mirror 104 configured to collect emitted light from plasma 101, an illumination optical system which includes illumination system mirrors 201 to 204 and is configured to illuminate a reticle 301 light collected by the collecting mirror 104 using the second reflective optical element... Agent: Rossi, Kimms & Mcdowell LLP.

20100182582 - Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100182585 - Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object: A control system configured to position a control location of a movable object in two or more degrees of freedom with respect to another object, including a set-point generator, a position quantity measurement system, a controller including a single input-single output controller for each degree of freedom to control a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100182584 - Stage drive method and stage unit, exposure apparatus, and device manufacturing method: When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage-is positioned at the first area, both stages are simultaneously driven while a state where both stages are... Agent: Oliff & Berridge, PLC

20100182586 - Lithography apparatus, and method of manufacturing device using same: The Lithography apparatus of the present invention includes a container conveyance unit configured to convey a sealed container accommodating a substrate from the exterior of the apparatus to the interior of the apparatus, an opener provided in the interior of the lithography apparatus for opening and closing a front door... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100177289 - Immersion fluid for immersion lithography, and method of performing immersion lithography: An immersion lithographic system 10 comprises an optical surface 51, an immersion fluid 60 with a pH less than 7 contacting at least a portion of the optical surface, and a semiconductor structure 80 having a topmost photoresist layer 70 wherein a portion of the photoresist is in contact with... Agent: Slater & Matsil, L.L.P.

20100177290 - Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method: There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging at least one phase pattern on the first plane; illuminating... Agent: Staas & Halsey LLP

20100177291 - Film printing system and method utilizing a digital light processing imager or organic light emitting diode: A motion picture printing system having a digital micromirror device for manipulating light used to expose a film negative is disclosed. A motion picture printing system having an organic light emitting diode for emitting light to expose a film negative is disclosed.... Agent: Robert D. Shedd, Patent Operations Thomson Licensing LLC

20100177292 - Lithographic apparatus and device manufacturing method: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100177293 - Polarization-modulating optical element: A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first... Agent: Fish & Richardson PC

20100177294 - Method for in-situ aberration measurement of optical imaging system in lithographic tools: The present invention has disclosed a method for in-situ aberration measurement in an optical imaging system of lithographic tools, which comprises the steps of: imaging the reticle pattern by the beams transmitting through the reticle via the optical imaging system; using particular tools to measure plural groups of linewidths by... Agent: Rabin & Berdo, PC

20100177295 - Exposure method and exposure apparatus, stage unit, and device manufacturing method having two substrate stages with one stage temporarily positioned below other stage: By an exposure method including a process where in parallel with an exposure operation performed on a wafer on one of the wafer stages, the other wafer stage is temporarily positioned under the one wafer stage in order to interchange both wafer stages, a part of the interchange operation (exchange... Agent: Oliff & Berridge, PLC

20100171939 - Lithographic apparatus and device manufacturing method: In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100171940 - Projection exposure apparatus, projection exposure method, and method for producing device: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to... Agent: Oliff & Berridge, PLC

20100171941 - Stage apparatus and exposure apparatus: A wafer stage system moves a wafer stage that retains a wafer via a wafer holder along a wafer base. For example, the wafer holder is formed from a material whose density is not uniform, such that the portion that includes the reflecting surface that reflects a measuring beam for... Agent: Oliff & Berridge, PLC

20100171942 - Method for wafer alignment: A method for wafer alignment includes the following steps. First, a wafer including a first material layer and a second material layer on the top of the first material layer is provided, wherein the first material layer includes a first alignment mark. Then, the wafer is aligned in an exposure... Agent: North America Intellectual Property Corporation

20100165309 - Deformation measuring apparatus, exposure apparatus, jig for the deformation measuring apparatus, position measuring method and device fabricating method: A piezoelectric device is provided at a base member. Regulating apparatus is provided that regulate, of deformations transmitted via the base member to the piezoelectric device, the transmission of a deformation in second directions, which intersect first directions.... Agent: Oliff & Berridge, PLC

20100165310 - Euv mask inspection: A system for inspecting an extreme ultra violet (EUV) mask. The system includes an array of sensors and an optical system. The array of sensors is configured to produce analog data corresponding to received optical energy. The optical system is configured to direct EUV light from an inspection area of... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100165311 - Linear motor magnetic shield apparatus: A magnetic shield having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in a precision positioning system. Redirecting the leakage flux limits the cross-talk and associated deleterious effects. Such preferred magnetic circuit paths for the leakage are affixed to the moving magnet system of the linear motor.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100165312 - Method of determining a characteristic: A plurality of targets including a second population superimposed on a first population are formed. In the first target the second population has an asymmetry with respect to the first population. In the second target the second population has a different asymmetry with respect to the first population. Reflected radiation... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100165313 - Mirror substrate, mirror, exposure apparatus, device manufacturing method, and mirror manufacturing method: In a light-transmitting mirror substrate having an axisymmetrical aspherical surface, a surface of the mirror substrate on a side opposite to the axisymmetrical aspherical surface is inclined with respect to an axis of symmetry of the axisymmetrical aspherical surface.... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100165315 - Exposure apparatus and device manufacturing method: An apparatus which performs, using light supplied from a light source, an exposure process of transferring a pattern of an original onto a substrate by exposure and a measurement process for alignment between the original and the substrate, comprises a controller configured to control the light source, wherein the light... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100165316 - Inclined exposure lithography system: An inclined exposure lithography system is disclosed, which comprises: a substrate; a photoresist layer, formed on the substrate; a mask, disposed over the photoresist layer with a gap therebetween; and a refraction element disposed over the mask so that a light beam from a light source is refracted by a... Agent: Wpat, PC Intellectual Property Attorneys

20100165314 - Mems device with controlled gas space chemistry: A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving... Agent: Texas Instruments Incorporated

20100165317 - Illumination aperture for optical lithography: Embodiments of systems and methods for providing a hybrid illumination aperture in optical lithography are generally described herein. Other embodiments may be described and claimed.... Agent: Intel Corporation C/o Cpa Global

20100165318 - Illumination system of a microlithographic projection exposure apparatus: The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states... Agent: Fish & Richardson PC

20100165319 - Lithographic apparatus and device manufacturing method: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero... Agent: Pillsbury Winthrop Shaw Pittman, LLP