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Photocopying June invention type 06/10

20100157259 - Automatic dust-removing filmscanner: An automatic dust-removing filmscanner comprises a scanner body, a film holder and a dust-removing element. The scanner body has a film-scanning platform and an image-capture module thereinside and has a slot on the surface thereof. The dust-removing element is installed in the film holder. When the film holder is inserted... Agent: Sinorica, LLC

20100157262 - Exposure apparatus and device manufacturing method: An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and... Agent: Oliff & Berridge, PLC

20100157260 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100157261 - Substrate treating apparatus: A photolithography process facility comprising a substrate treating apparatus, the substrate treating apparatus includes a temperature control plate controlling a temperature a substrate, a central supporter having a pin shape vertically penetrating the temperature control plate and supporting a central region of substrate, and a collision preventer preventing a collision... Agent: F. Chau & Associates, LLC

20100157265 - Fluid handling structure, table, lithographic apparatus, immersion lithographic apparatus, and device manufacturing methods: A fluid handling structure comprising a conduit is described. The conduit is configured to supply fluid to (i) a space between a projection system and a substrate and/or substrate table, and/or (ii) a top surface of a substrate and/or substrate table radially outward of the space. The fluid comprises a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100157263 - Lithographic apparatus, and patterning device for use in a lithographic process: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100157264 - Method for damping an object, an active damping system, and a lithographic apparatus: A method for damping an object in two or more degrees of freedom, including measuring a position quantity at each of the two or more measurement locations; extracting from the measured position quantities a measurement signal for each dynamic mode; feeding the measurement signal of a dynamic mode to a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100157266 - Projection exposure method and projection exposure apparatus for microlithography: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate... Agent: Fish & Richardson PC

20100157270 - Apparatus for manipulation of an optical element: The invention relates to an apparatus for manipulation of an optical element (7) in up to six degrees of freedom with respect to a structure (8) via at least three actuator devices (9). The actuator devices (9) each have at least two force-controlled actuators, which each produce an effective force... Agent: Fish & Richardson PC

20100157269 - Illumination system for illuminating a mask in a microlithographic projection exposure apparatus: An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided,... Agent: Fish & Richardson PC

20100157268 - Illumination system of a microlothographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams... Agent: Fish & Richardson PC

20100157267 - Radiation source, lithographic apparatus and device manufacturing method: A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma generating EUV radiation. A mirrored collector collects and reflects the EUV radiation generated at a first focus towards... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100157271 - Lithographic apparatus and method of irradiating at least two target portions: A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100157274 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine... Agent: Oliff & Berridge, PLC

20100157275 - Exposure apparatus, exposure method, and device manufacturing method: When a wafer on a fine movement stage supported by a coarse movement stage is exposed via a projection optical system with an illumination light at an exposure station, a position of the fine movement stage within an XY plane is measured with good precision by a measurement system. Further,... Agent: Oliff & Berridge, PLC

20100157276 - Exposure apparatus, exposure method, device manufacturing method, and carrier method: An exposure apparatus is equipped with a coarse movement stage which can move along an XY plane and includes a first section and a second section that can come close to and separate from each other, a fine movement stage which holds wafer W and is supported relatively movable at... Agent: Oliff & Berridge, PLC

20100157272 - Lithographic apparatus and control method: A method includes providing a controller to control a speed of a substrate table in a scan direction, the controller including a first input to receive a first signal representative of a first time period of a movement of the substrate table in a step direction, a second input to... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100157273 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table including a substrate holder... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100157277 - Lithographic apparatus and device manufacturing method: A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100149499 - Pulsed multiple colour laser system: A pulsed multiple colour laser system is disclosed having particular application for incorporation into a digital holographic printer for producing RGB colour reflection holograms. A Nd:YLF crystal 1 in a laser cavity is excited to produce an emission at 1313 nm which is frequency converted by doubling to 656.5 nm... Agent: Paul S Madan Madan & Sriram, PC

20100149501 - Fluid extraction system, lithographic apparatus and device manufacturing method: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100149500 - Projection lens for microlithography and corresponding terminal element: The invention relates to a projection lens (5) for microlithography, in particular, for immersion lithography, designed to operate at a wavelength of more than 190 nm and comprising an optical element made from quartz glass with an OH content of less than 50 ppm, in particular between 10 ppm and... Agent: Sughrue Mion, PLLC

20100149502 - Method of detecting reticle errors: A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0th diffraction light from among diffraction lights transmitted through the reticle. A method... Agent: Harness, Dickey & Pierce, P.L.C

20100149503 - Method of structuring a photosensitive material: A method of structuring a photosensitive material is disclosed. The method includes illuminating a first object structure and projecting a pattern of the first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to... Agent: Fish & Richardson PC

20100149504 - Illumination device of a microlithographic projection exposure apparatus, and microlithographic projection exposure method: Illumination devices of a microlithographic projection exposure apparatus, include a deflection device with which at least two light beams impinging on the deflection device can be variably deflected independently of one another by variation of the deflection angle in each case in such a way that each of the light... Agent: Fish & Richardson PC

20100149506 - Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method: An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100149507 - Dedicated metrology stage for lithography applications: A system and method are used to detect parameters regarding an exposure portion or an exposure beam. The system comprising a substrate stage and a metrology stage. The substrate stage is configured to position a substrate to receive an exposure beam from an exposure portion of a lithography system. The... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100149505 - Euv mask inspection system: Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100149508 - Method for a lithographic apparatus: In an embodiment, there is provided a method of at least partially compensating for a deviation in a property of a pattern feature to be applied to a substrate using a lithographic apparatus. The method includes determining a desired phase change to be applied to at least a portion of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100149511 - Illumination optical system, exposure apparatus, and exposure method: An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality... Agent: Oliff & Berridge, PLC

20100149510 - Methods for producing an antireflection surface on an optical element, optical element and associated optical arrangement: Methods for producing an antireflection surface (6) on an optical element (1) made of a material that is transparent at a useful-light wavelength λ in the UV region, preferably at 193 nm. A first method includes: applying a layer (3) of an inorganic, non-metallic material, which forms nanostructures (4) and... Agent: Sughrue Mion, PLLC

20100149509 - Optical system, exposure apparatus, and method of manufacturing electronic device: An aperture diaphragm plate is provided to define a light flux on a pupil plane of an optical system or a plane or surface disposed in the vicinity of the pupil plane. An aperture, which is formed in the aperture diaphragm plate, has a three-dimensional shape corresponding to an optimum... Agent: Staas & Halsey LLP

20100149512 - Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method: A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100149513 - Fluid pressure compensation for immersion litography lens: An immersion lithography system compensates for displacement of the final optical element of the optical assembly caused by the immersion fluid. The system includes an optical assembly to project an image defined by a reticle onto a wafer. The optical assembly includes a final optical element spaced from the wafer... Agent: Oliff & Berridge, PLC

20100149514 - Lithographic apparatus and device manufacturing method: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100149515 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus has a barrier member surrounding a space between the projection system and the substrate so as to at least partly confine liquid in the space. A jet of liquid is directed radially inwardly in a gap between the barrier member and the substrate and/or between the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100149516 - Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus: Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam,... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100149517 - Projection objective and method for its manufacture: A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection... Agent: Fish & Richardson PC

20100141911 - Exposure apparatus and device manufacturing method: An exposure apparatus, exposing a substrate via liquid so as to transfer a pattern of a mask onto the substrate, includes a stage configured to move while holding the substrate. The stage includes a substrate supporting portion on which the substrate is disposed, a supporting surface disposed outside the substrate... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100141912 - Exposure apparatus and measuring device for a projection lens: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To... Agent: Fish & Richardson PC

20100141910 - Member with a cleaning surface and a method of removing contamination: A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100141909 - Radiation system and lithographic apparatus: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100141913 - Exposure apparatus and device manufacturing method: An apparatus which projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate, comprises a measurement unit which performs measurement to calculate a deformation amount of the original, and a controller which calculates a predicted deformation amount of the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100141915 - Lithographic apparatus and device manufacturing method: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100141916 - Lithographic apparatus and device manufacturing method with double exposure overlay control: l

20100141914 - Lithographic apparatus and positioning apparatus: A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100141918 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100141917 - Method and system for indirect determination of local irradiance in an optical system: The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a... Agent: Fish & Richardson PC

20100141920 - Device and method for transmission image sensing: A device for transmission image sensing for sensing an aerial image in a lithographic exposure apparatus comprises a projection system arranged to form, at an image side of the projection system, an aerial image of an object mark. The device further comprises a detector comprising a slit pattern having features... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100141919 - Exposing apparatus for fabricating process of flat panel display device: An exposing apparatus for a fabricating process of a flat panel display device includes a light source emitting a light; a beam edge cutter for improving an uniformity of the light from the light source; an exposing mask under the beam edge cutter and including a pattern; a gas jetting... Agent: Morgan Lewis & Bockius LLP

20100141922 - Illumination optical apparatus, exposure apparatus, and device manufacturing method: There is disclosed a illumination optical apparatus for illuminating a second surface optically conjugate with a first surface via a reflection type original plate which can be arranged on the first surface, the illumination optical apparatus comprising: a first partial field stop arranged to define a first outer edge of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100141921 - Optical system, exposure system, and exposure method: An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial... Agent: Oliff & Berridge, PLC

20100141923 - Stage apparatus and aligner: In a stage apparatus used for fabrication or for inspection, by fastening two pieces of first frames (1) and two pieces of second frames (2) by bolts in a positional relationship of making the first frames (1) and the second frames (2) respectively opposed to each other, a counter mass... Agent: Sughrue-265550

20100141924 - Substrate holder, stage apparatus, and exposure apparatus with first support part provided in a suction space and second support part: An object of the invention is to hold a substrate with satisfactory flatness, even at a circumferential edge part that surrounds a suction space. The invention is equipped with a circumferential edge part that surrounds a suction space, and a first support part that is provided in the suction space... Agent: Oliff & Berridge, PLC

20100141926 - Optical system,exposure system, and exposure method: An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial... Agent: Oliff & Berridge, PLC

20100141925 - Scanner model representation with transmission cross coefficients: The present invention relates to a method for simulating aspects of a lithographic process. According to certain aspects, the present invention uses transmission cross coefficients to represent the scanner data and models. According to other aspects, the present invention enables sensitive data regarding various scanner subsystems to be hidden from... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100134773 - Apparatus and method to control vacuum at porous material using multiple porous materials: An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is... Agent: Oliff & Berridge, PLC

20100134771 - Coupling apparatus, exposure apparatus, and device fabricating method: A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, a projection system arranged to project... Agent: Oliff & Berridge, PLC

20100134770 - Exposure apparatus and method for manufacturing device: An exposure apparatus projects a pattern of an original plate onto a substrate through a projection optical system to expose the substrate to the pattern. The exposure apparatus includes a supporting member configured to support an optical element of the projection optical system along the direction of gravitational force, and... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100134772 - Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device: An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates... Agent: Oliff & Berridge, PLC

20100134769 - Lithographic apparatus and device manufacturing method: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100134768 - Projection exposure system for microlithography: The disclosure relates to a projection exposure system for microlithography, which includes at least one optical system that has at least one optical element with at least two aspherical surfaces essentially arranged rigidly relative to each other.... Agent: Fish & Richardson PC

20100134774 - Calibration methods and devices useful in semiconductor photolithography: Several embodiments of photolithography devices and associated methods of focal calibration are disclosed herein. In one embodiment, a method for determining a focus shift in a photolithography system include placing a microelectronic substrate on a substrate support of the photolithography system and producing first and second refraction patterns on the... Agent: Perkins Coie LLP Patent-sea

20100134775 - Exposure apparatus and device manufacturing method: An apparatus includes an original stage configured to hold an original, a substrate stage configured to hold a substrate, an illumination optical system configured to illuminate the original with light from a light source, a projection optical system configured to project light from the original to the substrate to expose... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100134776 - High repetition pulse power source and exposure device with high repetition power source: A pulse power source which can perform high repetition of pulse signals by enhancing the throughput of a pulse source is provided. The pulse power source includes: a charger; an initial-stage capacitor section which is provided with a capacitor charged by the charger; and a magnetic pulse compression circuit which... Agent: Jordan And Hamburg LLP

20100134777 - Diaphragm changing device: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has... Agent: Fish & Richardson PC

20100134778 - Calibration method for a lithographic apparatus: Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system;... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100134779 - Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method: A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results... Agent: Oliff & Berridge, PLC