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Photocopying May archived by USPTO category 05/10

20100128235 - Lithographic apparatus and device manufacturing method: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100128236 - Image forming apparatus and light intensity correction method: Disclosed is an image forming apparatus including an optical writing device including, a light source section composed of a plurality of light emitting elements arranged in a main scanning direction; an optical section including a plurality of coupled lenses to form an image on a light exposure face by gathering... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100128237 - Driving apparatus, exposure apparatus, and device manufacturing method: A driving apparatus of the present invention is a driving apparatus which adjusts a position of a member to be driven. The driving apparatus comprises a driving member connected with the member to be driven and made of an elastic member, a female screw provided so as to penetrate the... Agent: Rossi, Kimms & Mcdowell LLP.

20100128238 - Frequency selective iterative learning control system and method for controlling errors in stage movement: Methods and control systems are provided for controlling stage position errors based, in some embodiments, on a selection of frequency components in a stage position error signal. An error frequency representation of a position error signal may be generated in the frequency domain and filtered by selecting one or more... Agent: Intellectual Property Group Fredrikson & Byron, P.A.

20100128240 - Chromatically corrected objective and projection exposure apparatus including the same: for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements... Agent: Sughrue Mion, PLLC

20100128239 - Exposure method and exposure apparatus: In an exposure apparatus, exposure light from a lamp (continuous light source) (9) is applied at an exposure station (exposure section) (2) to a substrate (4), which is being transferred at a fixed speed in a fixed direction by a substrate transfer section (5), through a mask (11) arranged on... Agent: Kolisch Hartwell, P.C.

20100128242 - Bonding silicon silicon carbide to glass ceramics: A wafer chuck for use in a lithographic apparatus, which includes a low-thermal expansion glass ceramic substrate, a silicon silicon carbide layer, and a bonding layer comprising silicate having a strength of at least about 5 megapascals, the bonding layer attaching the silicon silicon carbide layer to the substrate is... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100128241 - Lithographic apparatus provided with a swap bridge: A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100123883 - Projection optical system, exposure apparatus, and device manufacturing method: An object is to provide a projection optical system, for example, capable of improving the throughput of scanning exposure in application to scanning exposure apparatus. A projection optical system for forming an image of a first surface and an image of a second surface on a third surface comprises a... Agent: Klarquist Sparkman, LLP

20100123884 - Exposure apparatus and device manufacturing method: An apparatus comprises a controller configured to generate a first list of measurement points arranged symmetrically with respect to a center of a shot region along a direction of scanning at a predetermined pitch, and a control by the controller includes a first control which causes a measurement device to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100123885 - Large area nanopatterning method and apparatus: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the... Agent: Boris Kobrin

20100123886 - Lithographic apparatus and device manufacturing method: A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100123888 - Exposure apparatus and method of manufacturing device: An apparatus, which scans an original and a substrate relative to light slit-shaped on the original and on the substrate, comprises an adjusting device configured to adjust a distribution of a width of the light slit-shaped, the width being a width in a scanning direction, the distribution being a distribution... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100123887 - Method for a lithographic apparatus: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100123889 - Super-resolution lithography apparatus and method based on multi light exposure method: Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first... Agent: Fenwick & West LLP

20100123890 - Lithographic apparatus and control system: A control system to control a position quantity of a movable object in dependency of signals provided by a sensor representing an actual position quantity of the moveable object, the control system being configured to provide a drive signal to an actuator which is able to apply forces to the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100123891 - Scanning exposure apparatus and device manufacturing method: An apparatus including an original stage that holds an original, a substrate stage that holds a substrate, and a projection optical system that projects a pattern of the original onto the substrate, and being configured to scan and expose the substrate during a period in which the speeds of the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100118286 - Exposure apparatus and device manufacturing method: An exposure apparatus exposes a substrate to light via an immersion liquid and includes a stage configured to hold the substrate and to be moved. The stage includes a chuck configured to hold the substrate, a support member arranged around the chuck and configured to support the immersion liquid, a... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100118285 - Exposure apparatus, substrate processing apparatus, lithography system, and device manufacturing method: An exposure apparatus for exposing a substrate to radiant energy, the substrate being conveyed from a processing apparatus including a coater that coats the substrate with a photoresist and an auxiliary regulator that regulates a temperature of the substrate, the exposure apparatus comprising a measurement device configured to measure the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100118287 - Discharge lamp, connecting cable, light source apparatus, and exposure apparatus: A light source device having a large cooling action on the base member of a discharge lamp. A connector on the sides of the power supply and the air blower and the base-side connector of a discharge lamp are connected to each other through a connection cable having a power... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100118288 - Lithographic projection system and projection lens polarization sensor: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100118289 - Member used in immersion exposure apparatus and immersion exposure apparatus: A member of an immersion exposure apparatus for exposing an image of a pattern of an original on a substrate via a liquid, and configured to be in contact with the liquid, includes a base portion, and a plurality of protruded portions provided on the base portion, wherein a contact... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100118290 - Exposure device: An exposure device is provided. The exposure device includes an alignment stage unit, an exposure processing unit and a workpiece moving mechanism. The alignment stage unit includes: an alignment stage that holds a workpiece having workpiece marks thereon; at least one first alignment microscope that detects the workpiece marks of... Agent: Drinker Biddle & Reath (dc)

20100110397 - High heat load optics with a liquid metal interface for use in an extreme ultraviolet lithography system: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid... Agent: Technology & Innovation Law Group, PC Attn: 1401

20100110398 - Methods relating to immersion lithography and an immersion lithographic apparatus: A method of detecting particles in an immersion fluid of or from a lithographic apparatus. The method includes extracting a sample, using a vacuum system, from a single phase flow of the immersion fluid of or from a fluid handling structure in the lithographic apparatus. The method includes detecting particles... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100110399 - Reverse flow gas gauge proximity sensor: A gas gauge proximity sensor supplying gas in a reverse flow direction from the injection chamber to the measurement chamber. Supplying gas in a reverse flow direction enables the transient behavior in the sensor to more rapidly stabilize, with a resulting increase in bandwidth. Optionally, a scavenger chamber can be... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100110400 - Scanning exposure apparatus, control method therefor, and device manufacturing method: An apparatus which includes a measurement device measuring a surface position of a substrate at each of a plurality of measurement points; which is configured to scan-expose the substrate using slit-shaped light while controlling the surface position based on the measurement result; and in which a width, in a non-scanning... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100110402 - Focus correction in lithography tools via lens aberration control: Aberration control capabilities of sophisticated lithography tools may be exploited in order to locally adapt the focal surface of the optical system. That is, higher order correction terms may be incorporated in the design of the local surface in addition to the conventionally used first order corrections, thereby enhancing uniformity... Agent: Williams, Morgan & Amerson

20100110403 - Measurement apparatus, exposure apparatus, and device manufacturing method: A measurement apparatus for measuring wavefront aberration of an optical system to be measured comprises a pinhole mask having a pinhole, an illumination optical system configured to illuminate the pinhole mask, a test pattern disposed between the pinhole mask and the optical system to be measured, a detector configured to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100110404 - Optical element supporting device, exposure apparatus using same, and device manufacturing method: The optical element supporting device of the present invention includes a first supporting member that supports the optical element, a second supporting member that supports the first supporting member at a plurality of locations, a plate spring fastened to the first supporting member and having a plate thickness extending in... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100110401 - Photolithography systems and associated methods of focus correction: Several embodiments of photolithography systems and associated methods of focus correction are disclosed herein. In one embodiment, a method for characterizing focus errors in a photolithography system includes placing a microelectronic substrate onto a substrate support of the photolithography system. The microelectronic substrate is divided into a plurality of fields... Agent: Perkins Coie LLP Patent-sea

20100110406 - Exposure apparatus, method of controlling the same, and device manufacturing method: An apparatus which illuminates an original by an illumination optical system and projects a pattern of the original onto a substrate, the illumination optical system including an adjusting mechanism configured to adjust a light intensity distribution on a pupil plane of the projection optical system, comprises a measuring device configured... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100110405 - Radiation source and lithographic apparatus: A source configured to generate EUV radiation includes a fuel droplet generator configured to deliver a droplet of fuel to an interaction point, optics configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate a plasma, and a collector arranged to collect EUV radiation emitted by... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100110407 - Illumination optical system and exposure apparatus: An illumination optical system includes a diffractive optical element configured to convert a light intensity distribution, an optical integrator configured to uniformly illuminate a surface to be illuminated using light that has passed the diffractive optical element, a light shield member arranged at or near a Fourier transform plane between... Agent: Rossi, Kimms & Mcdowell LLP.

20100110408 - Calibration method and lithographic apparatus for calibrating an optimum take over height of a substrate: A calibration method for calibrating an optimum take over height of a substrate in a lithographic apparatus between a substrate table and an ejector element moveable to load and unload the substrate from the substrate table, the method including clamping the substrate on one of the substrate table and ejector... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100110410 - Lithographic apparatus and device manufacturing method: A seal between a table and a component in a lithographic apparatus is disclosed. The seal bridges a gap between the component and the table when the component is in a position relative to the table. The component is moveable, in use, relative to the table and in an embodiment... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100110409 - Separation in an imprint lithography process: Systems, methods, and processes for separating a template from a substrate retained on an air cavity chuck during an imprint lithography process. Generally, vacuum level provided by air cavity chuck may be controlled during conforming of polymerizable material between the template and the substrate and during separation of the template... Agent: Molecular Imprints

20100110411 - Anti-piracy coding technique: An internegative duplicate (12), as used to make motion picture release prints, undergoes marking by exposing at least one area within at least one frame to provide a decodable pattern specific to the internegative duplicate. In this way, pirated copies of content made by a rogue laboratory can be tracked.... Agent: Robert D. Shedd, Patent Operations Thomson Licensing LLC