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Photocopying April category listing, related patent applications 04/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 04/29/2010 > patent applications in patent subcategories. category listing, related patent applications
20100103391 - Fluid handling structure, lithographic apparatus and device manufacturing method: A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100103392 - Immersion exposure device cleaning method, dummy wafer, and immersion exposure device: The immersion exposure device cleaning method according to the invention includes: placing a dummy wafer onto a stage of the immersion exposure device; and moving the stage while maintaining an immersion solution between the dummy wafer and a projector lens. The dummy wafer includes a substrate and an adsorption area... Agent: Mcginn Intellectual Property Law Group, PLLC
20100103390 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate. The apparatus is provided with a clamp, including a support part configured to support the patterning device or the substrate and a temperature control part configured to control the temperature of the patterning device... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100103393 - Scanning exposure apparatus and device manufacturing method: An apparatus comprises a device which measures a surface position of a substrate at a plurality of measurement points, and a controller configured to cause the device to measure the surface position under a condition that an arrangement direction in which the plurality of measurement points are arranged and a... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100103394 - Reflection projection optical system, exposure apparatus, and method of manufacturing device: A reflection projection optical system projects a pattern positioned on an object plane onto an image plane via a mirror. The system has bilateral telecentricity on a side of the object plane and a side of the image plane, and has the object plane and the image plane positioned to... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100103396 - Exposure apparatus and device fabrication method: An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, includes a stage apparatus which is movable with respect to an optical axis of the exposure light; a light-transmissive member provided at the stage apparatus, wherein a liquid is supplied on an upper surface of... Agent: Oliff & Berridge, PLC
20100103395 - Fly's eye integrator, illuminator, lithographic apparatus and method: A transmissive fly's eye integrator is disclosed that includes a first array of lenses and a second array of lenses. The first array of lenses and second array of lenses together form a fly's eye integrator, and the first array of lenses and second array of lenses comprise lenses which... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100103397 - Exposure apparatus, exposure method, and method of manufacturing display panel substrate: A position of a chuck 10 is detected. The movements of the stages 5 and 7 are controlled according to a result of detecting the position of the chuck 10, so as to position the chuck 10. Further, a light receiving means 51 is disposed on the chuck 10 for... Agent: J C Patents
20100103399 - Fluid assisted gas gauge proximity sensor: A fluid assisted gas gauge coupled to a pressure sensor enables proximity measurements to be made with a high bandwidth. A two-chamber gas gauge, containing a gas-filled measurement chamber and a fluid-filled transfer chamber and a diaphragm separating the two chambers, exhausts gas onto the surface being measured, while the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100103400 - Illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam... Agent: Fish & Richardson PC
20100103401 - Method and device for forming poly-silicon film: A method and a device for forming a poly-silicon film, using sequential lateral solidification (SLS) by laser irradiation through an optical device to pattern the laser beam so as to lengthen the crystalline grains and enhance the throughput. The optical device comprises a plurality of first transparent regions, a plurality... Agent: Birch Stewart Kolasch & Birch
20100103398 - Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method: An optical integrator has a plurality of wavefront dividing elements two-dimensionally arrayed, and is so configured that a ray group obliquely incident to an optical-axis center of an entrance face of each wavefront dividing element is emitted in parallel with the optical axis from the wavefront dividing element. In each... Agent: Oliff & Berridge, PLC
20100103402 - Work stage of exposing apparatus, exposing method and method of manufacturing a structure: The present invention provides an exposing method comprising: a supporting step in which a peripheral portion 6b of a thin plate-shaped work 6 of which both front and rear surfaces are subjected to work is supported by a supporting portion 7 of a work stage 9 provided to a exposing... Agent: Sughrue Mion, PLLC
20100103403 - Wavelength shift measuring apparatus, optical source apparatus, interference measuring apparatus, exposure apparatus, and device manufacturing method: A wavelength shift measuring apparatus of the present invention is a wavelength shift detection sensor (WLCD1) which measures a shift of a wavelength of a light beam emitted from a light source, and includes a beam splitter (BS2) splitting the light beam emitted from the light source into a plurality... Agent: Rossi, Kimms & Mcdowell LLP.04/22/2010 > patent applications in patent subcategories. category listing, related patent applications
20100097585 - Apparatus and method to control vacuum at porous material using multiple porous materials: An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and first... Agent: Oliff & Berridge, PLC
20100097584 - Exposure apparatus and device fabrication method: An exposure apparatus which exposes a substrate via a liquid supplied between a projection optical system and the substrate, the apparatus comprises a gas supply-recovery mechanism configured to blow a gas around the liquid, wherein the gas supply-recovery mechanism includes a nozzle unit in which a supply port configured to... Agent: Fitzpatrick Cella Harper & Scinto
20100097587 - Lithographic apparatus and a method of removing contamination: A lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt % water; from 1 to 74.99 wt % solvent selected from one or more glycol ethers, esters, alcohols and ketones; and... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100097586 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus is provided in which a maximum permissible velocity of the substrate relative to a fluid confinement structure that controls the immersion fluid is determined based on a property of the substrate to be exposed and, during the exposure process, the velocity of the substrate relative to... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100097591 - Exposure apparatuses and methods: An exposure apparatus may include: a stage configured to move a substrate; an optical unit configured to generate and project a plurality of laser beams; and a control unit configured to measure straightness of the stage by controlling the projection of the laser beams to an exposed surface of the... Agent: Harness, Dickey & Pierce, P.L.C
20100097588 - Exposure method, device manufacturing method, and mask: An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side... Agent: Roeder & Broder LLP
20100097589 - Lithographic apparatus comprising an assembly of a line carrier with low-friction cables, hoses or the like and such an assembly in general: A lithographic apparatus includes an assembly of a plurality of flexible medium transfer lines and a line carrier, the liner carrier configured to moveably guide the plurality of flexible medium transfer lines from one connection point of the apparatus to another connection point, wherein at least one of the two... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100097590 - Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement: Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be generated using a stochastic process such as a Monte Carlo or structured experiment over the expected range of... Agent: Molecular Imprints
20100097593 - Euv light source, euv exposure apparatus, and electronic device manufacturing method: Provided is an EUV light source which brings a target into the plasma state to radiate EUV light from the generated plasma. The target is one of a plurality of discrete targets. The surface area of each target is 1.5 times or more of that of a sphere which has... Agent: Oliff & Berridge, PLC
20100097592 - High transmission, high aperture catadioptric projection objective and projection exposure apparatus: The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object... Agent: Fish & Richardson PC
20100097594 - Apparatus for fabricating and optically detecting biochip: An apparatus for fabricating a biochip is provided. The apparatus includes a reaction chamber which encapsulates the biochip to be sealed form an external environment. The apparatus further includes an exposure system which has a light source and a spatial light modulator. The spatial light modulator receives light from the... Agent: Cantor Colburn, LLP
20100097595 - Exposure apparatus and device manufacturing method: An apparatus includes a stage configured to move a substrate, an optical system configured to project an image of a pattern on an original onto the substrate, an alignment detection system configured to detect an image of an alignment mark formed on the substrate and measure a position of the... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100097596 - Scanning exposure method: A scanning exposure method is provided. A mask and a substrate are oppositely moved along a direction. The mask and the substrate are moved in at least two different uniform relative velocities during a one shot exposure, thus producing an exposed shot area of an expected size on the substrate.... Agent: Quintero Law Office, PC04/15/2010 > patent applications in patent subcategories. category listing, related patent applications
20100091255 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100091256 - Method and apparatus for reproducing a programmable mask on a substrate: A pattern, is imaged by means of a programmable mask, on a substrate that has a photosensitive layer, illumination spots being produced on the mask by means of an illumination unit and individual pixels being produced, via an optical unit, forming a grid of pixels on the substrate corresponding to... Agent: Jordan And Hamburg LLP
20100091257 - Optical imaging system and method for imaging up to four reticles to a single imaging location: A catadioptric optical imaging system and method is provided, in which up to four (4) reticles are imaged to a single imaging location (e.g. for imaging substrates), in a manner designed to provide high throughput, with a relatively high resolution, and with substrates whose size may approach 450 mm.... Agent: Lawrence R. Oremland, P.C.
20100091259 - Exposure apparatus: An exposure apparatus is configured to expose a substrate via a liquid filled in a space between the substrate and a final optical element in a projection optical system which is closest to the substrate. The exposure apparatus includes a pressure detector configured to detect a pressure of the liquid,... Agent: Rossi, Kimms & Mcdowell LLP.
20100091260 - Lithographic apparatus and device manufacturing method: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100091258 - Substrate measurement method and apparatus: A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100091262 - positioning system, method, and lithographic apparatus: A lithographic apparatus includes a positioner configured to position a first part of the apparatus relative to a second part of the apparatus, the positioner including a motor having a motor position dependent motor constant defining a relation between a motor input and a motor output, and a control system... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100091261 - Operating valve, exposure apparatus, and device manufacturing method: An operating valve of the present invention is a differential pressure operating valve 100 for performing a vacuum suction of a substrate, the operating valve comprises a body 4 having an opening which is provided at an exhaust side for exhausting an air from an inside to an outside and... Agent: Rossi, Kimms & Mcdowell LLP.04/08/2010 > patent applications in patent subcategories. category listing, related patent applications
20100085545 - Fluid handling structure, lithographic apparatus and device manufacturing method: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100085546 - Lithographic apparatus and humidity measurement system: A humidity measurement system for use in, for example, a lithographic apparatus. The humidity measurement system includes a tunable laser diode configured to emit a measurement radiation beam having a wavelength in a wavelength range. The wavelength range includes a first wavelength associated with an absorption peak of water molecules.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100085548 - Method and system for overlay control using dual metrology sampling: A system and method are provided for determining an overlay of a first layer N−1 and a second layer N that are positioned one over the other on a substrate. The first layer includes a first overlay portion. The second layer includes a first complementary overlay portion. The first overlay... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100085547 - Source module, radiation source and lithographic apparatus: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100085549 - Exposure device: An exposure device for producing semiconductors and liquid crystals has an optical system capable of effectively using light generated without making a hole in a lamp discharge vessel when high energy laser light is supplied to it for emitting light, such as ultraviolet light. The exposure device has a light... Agent: Roberts Mlotkowski Safran & Cole, P.C. Intellectual Property Department
20100085550 - Projection optical system and exposure apparatus: An projection optical system for an i-line projection exposure apparatus includes positive, negative, positive, negative and positive lens units which include a lens having an Abbe number equal to or smaller than 62. 0.125≦NAO, −0.251<β<−0.249, 80 mm≦|OB1max|, 20 mm≦|OB2max|, |Dt/(NAO·|OB1max|)|≦62.0, Dt/Td≦0.645, 0.072≦|OB1max|/Td| are met, where NAO is a numerical aperture... Agent: Rossi, Kimms & Mcdowell LLP.
20100085551 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100085553 - Lithographic apparatus and device manufacturing method utilizing a substrate handler: A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100085552 - Lithographic apparatus and lorentz actuator: A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100085554 - Adaptor of an aligner system: An adapter is disclosed, comprising a frame including an inner edge with a first side, a second side, a third side and a fourth side, wherein the first side and the fourth side are opposite and the second side and the third side are opposite. At least two fixed hold... Agent: Muncy, Geissler, Olds & Lowe, PLLC
20100085555 - In-situ cleaning of an imprint lithography tool: Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.... Agent: Molecular Imprints04/01/2010 > patent applications in patent subcategories. category listing, related patent applications
20100079736 - Exposure apparatus and device manufacturing method: An apparatus that exposes a pattern of an original onto a plate through a projection optical system. The apparatus includes a reference base that holds the projection optical system, a supporting unit configured to elastically support the reference base, a base structure that holds the supporting unit on an installation... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100079738 - Optical measurement apparatus for a projection exposure system: An optical measurement apparatus (50) for a projection exposure system (10) for microlithography includes an optical sensor (52) that measures a given property of exposure radiation (16) within the projection exposure system (10) and a data interface (66; 166) that transmits at least one value for the measured property in... Agent: Sughrue Mion, PLLC
20100079739 - Projection objective for microlithography: A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed.... Agent: Fish & Richardson PC
20100079737 - Support for a component of an optical device: The disclosure provides an arrangement for an optical device including a component of the optical device and a support structure supporting the component. The support structure includes at least one locking device connected to the component and including a first fixation device and an associated second fixation device. The first... Agent: Fish & Richardson PC
20100079740 - Image forming device provided with sensor: An image forming device has a conveying member, a light source, a photo-sensor, a shutter member, a shutter driving unit, a reflecting member and a judging member. The shutter member located between the photo-sensor and the conveying member is moved between a close position and an open position. The reflecting... Agent: Baker Botts LLP C/o Intellectual Property Department
20100079741 - Projection objective for microlithography: A projection objective for use in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured under the manufacturing method are disclosed.... Agent: Fish & Richardson PC
20100079742 - Substrate holding apparatus, mask, substrate processing apparatus, and image display device manufacturing method: An apparatus comprises a carrier including a permanent electromagnet and configured to hold a mask containing a magnetic material and a substrate by magnetically attracting the mask via the substrate, and a sensor unit configured to sense a state of the carrier using a magnetic sensor for sensing a magnetic... Agent: Buchanan, Ingersoll & Rooney PC
20100079743 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while... Agent: Oliff & Berridge, PLCPrevious industry: Optics: image projectors
Next industry: Optics: measuring and testing
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