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Photocopying March listing by industry category 03/10

20100073646 - Method for the production of a multi-colour volume hologram, a document with such a hologram, and a volume hologram master: The invention relates to a method for the production of a multicolor hologram by means of a capture beam, wherein the utilized capture beam (6) has a plurality of beam bundles of the same wavelength. Advantageously, the multicolor hologram is produced by copying the structure of multiple single-color subholograms of... Agent: Collard & Roe, P.C.

20100073647 - Coating film forming apparatus and coating film forming method for immersion light exposure: A coating film forming apparatus for immersion light exposure, for forming a coating film including a resist film or a resist film and an additional film on a substrate to be fed to an immersion light exposure apparatus configured to perform a light exposure process through a liquid, includes: one... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100073649 - Exposure apparatus having an element to be cooled: An exposure apparatus having an element to be cooled and that exposes a substrate to patterned radiation by using the element. A reservoir houses a liquid coolant therein. A first pump, disposed between the reservoir and the element, supplies the coolant from the reservoir to the element. A heater, disposed... Agent: Fitzpatrick Cella Harper & Scinto

20100073650 - Lithographic apparatus and device manufacturing method: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100073648 - Masks and methods of manufacture thereof: Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment includes a method of generating an assist feature of a lithography mask. The method includes providing a layout for a material layer of a semiconductor device, the layout including a pattern for at least one feature of the... Agent: Slater & Matsil LLP

20100073654 - Evaluation method and exposure apparatus: An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction... Agent: Rossi, Kimms & Mcdowell LLP.

20100073651 - Lithography apparatus: A lithography apparatus includes: a light source comprising a first light beam and a second light beam, a photomask, a polarization controlling system positioned between the light source and the photomask, a wafer state for holding a wafer, and a lens positioned between the photomask and the wafer stage. The... Agent: North America Intellectual Property Corporation

20100073653 - Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method: In measurement of a positional information in the XY plane of a fine movement stage held by a coarse movement stage, an encoder system is used including a head which is placed facing a grating placed on a surface substantially parallel to the XY plane of the fine movement stage... Agent: Oliff & Berridge, PLC

20100073652 - Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method: A drive system drives a movable body, based on measurement results of a first measurement system which measures the position of the movable body in an XY plane by irradiating a measurement beam from an arm member on a grating placed on a surface parallel to the XY plane of... Agent: Oliff & Berridge, PLC

20100073655 - Optical system of a microlithographic projection exposure apparatus: An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which... Agent: Fish & Richardson PC

20100073656 - Alignment unit and exposure apparatus: An alignment unit includes a measurement unit configured to measure a coordinate of a center position of an alignment mark transferred to each layer that is located under an uppermost layer of a substrate, and a controller configured to determine a target coordinate of the center position of the alignment... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100073658 - Laser light source device, exposure device, and mask inspection device using this laser light source device: A laser light source device 1, comprising M number of laser light sources, of which frequency is shifted from a fundamental frequency by (m−1)·a·Δω, a first laser light source section 2 and a first fiber amplifier section 4 for amplifying these laser lights, a first optical multiplexer 6 for approximately... Agent: Morgan Lewis & Bockius LLP

20100073657 - Nanolithography system: A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is otherwise compatible with the optical lithographic process infrastructure. The exposing light is transmitted through specially designed super-resolution apertures, of which the “C-aperture” is one example,... Agent: Franklin Schellenberg

20100073659 - Exposure apparatus and image forming apparatus: An exposure apparatus has a first board on which a light-emitting element is mounted and a second board on which is mounted a driving IC for causing the light-emitting element to emit light. A second current path is extended from the driving IC, which is mounted on the second board,... Agent: Fitzpatrick Cella Harper & Scinto

20100073660 - Spectrally controlled high energy density light source photopolymer exposure system: A system for forming printing features (10) on a printing plate includes a high energy density light source (20) that has an emission spectrum that includes actinic radiation and non-actinic radiation. A reflector assembly (22) directs light produced by the high energy density light source (20) in a light path.... Agent: Kinney & Lange, P.A.

20100073661 - Stage apparatus, exposure apparatus and device manufacturing method: An exposure apparatus comprises a stage main body having a mounting surface, and a correcting mechanism that corrects a shape of the mounting surface.... Agent: Oliff & Berridge, PLC

20100073662 - Stage apparatus, exposure apparatus, and method of manufacturing device: A stage apparatus comprises plural stages movable across plural areas, movable bodies which are provided in one-to-one correspondence with the plural stages and are movable across the plural areas, plural lines which connect each of the plural stages to a corresponding one of the plural movable bodies, a driving unit... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100073663 - System and process for fabricating semiconductor packages: A method of processing semiconductor chips includes measuring locations of semiconductor dies placed on a carrier with a scanner to generate die location information, and communicating the die location information to a photolithographic stepper. The method includes aligning the photolithographic stepper with the carrier only one time, and exposing at... Agent: Dicke, Billig & Czaja

20100066987 - Lithographic apparatus and a method of operating the apparatus: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100066988 - Lithographic apparatus and method of generating the apparatus: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100066989 - Spectral purity filters and methods therefor: A spectral purity filter arrangement is disclosed. The spectral purity filter arrangement includes a film configured for filtering out at least a portion of input light and a support structure coupled to the film along at least one edge of the film. The spectral purity filter arrangement further includes a... Agent: Cymer Inc Legal Department

20100066990 - Imaging device with exchangeable diaphragms and method therefor: The disclosure concerns a method for exchangeable introduction and/or exchange of diaphragms in an imaging device, such as an EUV projection exposure system for microlithography or a corresponding imaging device with a housing and at least one diaphragm, which is accommodated exchangeably in the housing and at least one transfer... Agent: Fish & Richardson PC

20100066991 - Passivation of multi-layer mirror for extreme ultraviolet lithography: A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the multi-layer reflector to prevent oxidation. In an embodiment, the capping layer is formed of an inert oxide, such as Al2O3, HfO2, ZrO2, Ta2O5,... Agent: Ira S. Matsil Slater & Matsil, L.L.P.

20100066992 - Stage apparatus, exposure apparatus, and device fabricating method: The invention provides a stage apparatus that has a fixed part, which has a prescribed movement surface, and a first movable body, which is capable of moving along the movement surface in a plurality of directions that includes a first direction. The stage apparatus comprises: a substage that, in synchrony... Agent: Oliff & Berridge, PLC

20100060868 - Fluid handling structure, lithographic apparatus and device manufactuirng method: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100060869 - Lithographic apparatus and alignment method: An alignment method for a substrate or a patterning device is disclosed along with a corresponding apparatus. The method includes using a part of an alignment arrangement of a lithographic apparatus to undertake a part of an alignment procedure on a part of a substrate or on a part of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100060870 - Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method: A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100060871 - Off-axis light source, light screen plate, and method of defining different types of patterns with single exposure: An off-axis light source is described, including an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern at the illumination surface thereof, wherein the illumination area of the quadrupole illumination pattern is smaller than that of the X- or Y-dipole illumination pattern. A light screen plate is... Agent: Jianq Chyun Intellectual Property Office

20100060872 - Exposure apparatus and device fabrication method: The present invention provides an apparatus including a calculating unit which calculates a first time serving as a time required to drive a stage in a non-scanning direction perpendicular to a scanning direction, and a second time serving as a time required to drive the stage in the scanning direction,... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100060873 - Illumination system for illuminating a mask in a microlithographic exposure apparatus: An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a... Agent: Fish & Richardson PC

20100060874 - Maskless lithographic apparatus and methods of compensation for rotational alignment error using the same: A maskless lithographic apparatus may include a light source providing an exposure beam, a light modulator modulating the exposure beam according to an exposure pattern, an exposure optical system delivering the modulated exposure beam provided by the light modulator onto a substrate in a form of a beam spot array,... Agent: Harness, Dickey & Pierce, P.L.C

20100060875 - Optofluidic lithography system, method of manufacturing two-layered microfluidic channel, and method of manufacturing three-dimensional microstructures: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the... Agent: Sherr & Vaughn, PLLC

20100060876 - Light generating apparatus and method of controlling the same: A light beam generating apparatus and method of controlling the same is provided. The light beam generating apparatus may include a light source, a beam expander collimating a light beam emitted from the light source, an optical shutter selectively transmitting a light beam transmitted through the beam expander, and a... Agent: Harness, Dickey & Pierce, P.L.C

20100060877 - Stage unit, exposure apparatus, and exposure method: A power usage supply unit that supplies power usage to a stage which moves on a movement surface has a first axis section, first support sections, a second axis section, and a second support section. The first axis section is movably supported by the first support section in a direction... Agent: Oliff & Berridge, PLC

20100060878 - Exposure appartus, exposure method and method of manufacturing display panel substrate: A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is detected according to a detecting result of position of the chuck 10.... Agent: J C Patents

20100053574 - Liquid immersion lithography system comprising a tilted showerhead relative to a substrate: A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle (610) and a second nozzle (612) that are configured to be at different distances from a surface... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100053576 - Radiation source, lithographic apparatus and device manufacturing method: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100053575 - Thermal control for euv lithography: A method of patterning an integrated circuit including generating a thermal profile of a reticle is provided. The thermal profile of the reticle may illustrate heat accumulation (e.g., a temperature) in a EUV reticle due an incident EUV radiation beam. The thermal profile may be determined using the pattern density... Agent: Haynes And Boone, LLPIPSection

20100053577 - Roll-to-roll type apparatus for forming thin film pattern: An apparatus for forming a thin film pattern according to an aspect of the invention may include: an unwinding roll and a winding roll running a sheet; a rotary drum having an elastic layer provided on a circumferential surface thereof, and disposed between the winding roll and the unwinding roll... Agent: Mcdermott Will & Emery LLP

20100053578 - Apparatus for imprint lithography using an electric field: A lithography process for creating patterns in an activating light curable liquid using electric fields followed by curing of the activating light curable liquid is described. The process involves the use of a template that is formed of non-conductive and electrically conductive portions. The template is brought into close proximity... Agent: Molecular Imprints

20100053580 - Computer readable medium and exposure method: A computer readable medium containing computer-executable instructions which cause a computer to execute processing steps that calculate a light intensity distribution formed on an image plane of a projection optical system. When executed, the medium causes a computer to execute the steps of dividing an effective light source into the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100053582 - Device manufacturing method, control system, computer program and computer-readable medium: A device manufacturing method in a lithographic apparatus includes determining a plurality of positions on a substrate. The plurality of positions on a measurement substrate are scanned in a first direction to determine a first substrate map of the substrate levels of the measurement substrate. The plurality of positions on... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100053579 - Method and system for manufacturing a reticle using character projection particle beam lithography: A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use... Agent: The Mueller Law Office, P.C.

20100053581 - Radiation source and lithographic apparatus: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100053583 - Exposure apparatus with an illumination system generating multiple illumination beams: An exposure apparatus (10) for transferring a mask pattern (12A) from a mask (12) to first and second substrates (14A) (14B) includes an illumination system (18) that generates and simultaneously directs a first beam (32A) at the mask pattern (12A) and a second beam (32B) at the mask pattern (12A).... Agent: Roeder & Broder LLP

20100053584 - Illumination optical system and exposure apparatus: An illumination optical system includes first and second reflection integrators. The second reflection integrator forms a plurality of linear light sources using light from the first reflection integrator. The illumination optical system further includes a pair of flat plane mirrors that are arranged parallel to the meridional line direction on... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100053586 - Displacement measurement systems, lithographic apparatus, and device manufacturing method: A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100053585 - Exposure apparatus and image forming apparatus provided with the same: An exposure apparatus which exposes an object includes an exposure member which has a plurality of blinking sections and which is elongated in a predetermined longitudinal direction; a support frame which supports the exposure member; a holder which supports the support frame to be movable relative to the holder; and... Agent: Banner & Witcoff, Ltd. Attorneys For Client No. 016689

20100053587 - Exposure apparatus and device manufacturing method: An exposure apparatus for exposing a substrate to radiant energy includes: a stage including a chuck, and configured to hold the substrate on the chuck with vacuum and to be moved; a recovery device configured to recover the substrate from the stage; a first detector configured to detect an error... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100053588 - Substrate stage movement patterns for high throughput while imaging a reticle to a pair of imaging locations: A new and useful optical imaging process is provided for imaging of a plurality of substrates, in a manner that makes efficient use of an optical imaging system with the capability to image a single reticle to a pair of imaging locations, and addresses the types of substrate stage movement... Agent: Lawrence R. Oremland, P.C.

20100053590 - System and method for manufacturing a flat panel display: A method for manufacturing a flat panel display is presented. The method includes: transferring a first mask from a first mask loading/unloading part onto a main mask-stage by a first mask-transferer; transferring a second mask from a second mask loading/unloading part onto a second assistant mask-stage by a second mask-transferer;... Agent: Innovation Counsel LLP

20100053589 - System for isolating an exposure apparatus: A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system... Agent: Roeder & Broder LLP