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Photocopying February patent applications/inventions, industry category 02/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 02/25/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100045948 - Euv lithography apparatus and method for determining the contamination status of an euv-reflective optical surface: The invention relates to an EUV lithography apparatus with at least one EUV-reflective optical surface and a cavity ringdown reflectometer adapted to determine the contamination status of the EUV-reflective optical surface for at least one contaminating substance by determining the reflectivity of the EUV-reflective optical surface for radiation at a... Agent: Sughrue Mion, PLLC
20100045949 - Exposure apparatus, maintaining method and device fabricating method: An exposure apparatus exposes a substrate with exposure light that passes through a liquid. The exposure apparatus comprises: a porous member that has a first surface, which is capable of opposing an object disposed at an irradiation position of the exposure light, and a second surface, which is opposite the... Agent: Oliff & Berridge, PLC
20100045951 - Lithographic apparatus and device manufacturing method: A temperature sensor is provided to measure the temperature of immersion liquid at a position where the immersion liquid is supplied. The reading of this temperature sensor is used to control the magnitude of heat input to the immersion liquid using a heater and/or cooler. A controller is used to... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100045950 - Lithographic apparatus, drying device, metrology apparatus and device manufacturing method: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100045952 - Microlithographic projection exposure apparatus: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens... Agent: Fish & Richardson PC
20100045954 - Controllable radiation lithographic apparatus and method: A lithographic arrangement allows for controlling radiation characteristics. An illumination system provides a beam of radiation from radiation provided by a radiation source. The radiation source includes an array of individually controllable elements, each individually controllable element being capable of emitting radiation. A support structure supports a patterning device. The... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100045953 - Laser irradiation device and method of manufacturing organic light emitting diode display device using the same: A laser irradiation device and a method of manufacturing an organic light emitting diode display device using the same. The laser radiation device prevents the scattering of the laser light into portions of the donor substrate that correspond to non-transmissive regions of a mask pattern. To reduce the scattering, the... Agent: Robert E. Bushnell & Law Firm
20100045955 - Particle detection on an object surface: Systems and methods are provided for inspecting an object surface. An illumination source illuminates the object surface. An optic intercepts scattered light from the illuminated object surface and projects a real image of an area of the object surface. A sensor receives the projected real image. A computer system, coupled... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100045956 - Lithographic apparatus, method for determining at least one polarization property thereof, polarization analyzer and polarization sensor thereof: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100045958 - Lithography system: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern... Agent: Blakely Sokoloff Taylor & Zafman LLP
20100045957 - Polarization-modulating optical element: The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a... Agent: Fish & Richardson PC
20100045960 - Magnetic levitation wafer stage, and method of using the stage in an exposure apparatus: A magnetic levitation wafer stage is used to align a wafer in an exposure apparatus of photolithographic equipment. The wafer stage includes a base, a table supported on the base and whose entire top surface exhibits magnetism of a single polarity, and motors for moving the table in the X... Agent: Volentine & Whitt PLLC
20100045959 - Photolithography apparatus with leveling element and method for leveling a wafer: A method for leveling a wafer in a photolithography apparatus is disclosed, including inputting a wafer into the photolithography apparatus to be supported by a chuck, using at least three image capture devices to capture images of corresponding alignment marks on the wafer; and leveling the wafer according to the... Agent: Muncy, Geissler, Olds & Lowe, PLLC
20100045961 - Dual stage positioning and switching system: The present invention has disclosed a dual stage positioning and switching system, which comprises at least a base, a first object stage positioning unit disposed on the base for a first workstation, and a second object stage positioning unit for a second workstation. Each of the object stage positioning units... Agent: Rabin & Berdo, PC02/18/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100039628 - Cleaning tool, cleaning method, and device fabricating method: A cleaning tool is loaded onto an exposure apparatus, which exposes a substrate with exposure light, and cleans a member inside the exposure apparatus. The cleaning tool comprises: a base member; and a cleaning member that is disposed on the base member and permeated with a cleaning liquid.... Agent: Oliff & Berridge, PLC
20100039629 - Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as... Agent: Fish & Richardson PC
20100039630 - Optimization of focused spots for maskless lithography: The focused spots of an active spot array projection system, such as a maskless lithographic projection system, are optimized within a relay of the projection system. A frequency modulator is positioned proximate to the pupil of the relay for reforming the focused spots while imaging the focused spots onto a... Agent: Corning Incorporated
20100039632 - Radiation source, lithographic apparatus and device manufacturing method: A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation. The source includes a chamber in which a plasma is generated, and a mirror configured to reflect radiation emitted by the plasma. The mirror includes a multi-layer structure that includes alternating Mo/Si layers. A boundary Mo layer... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100039631 - Radiation sources and methods of generating radiation: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100039633 - Source optimization for image fidelity and throughput: A system and method for optimizing an illumination source to print a desired pattern of features dividing a light source into pixels and determining an optimum intensity for each pixel such that when the pixels are simultaneously illuminated, the error in a printed pattern of features is minimized. In one... Agent: Klarquist Sparkman, LLP
20100039634 - Exposure apparatus for display and exposing method using the same: Provided is an exposure apparatus, including a plurality of exposure lamps and a luminance changing mechanism disposed between the exposure lamps and an exposure target. The luminance changing mechanism changes the location at which the exposure light generated from the exposure lamps reaches the exposure target by changing the direction... Agent: H.c. Park & Associates, PLC
20100039635 - Filter device disposed in reticle library of lithography system: A filter device disposed in the reticle library of a lithography system, the lithography system comprising: a light emitting unit for providing a light source, a reticle library disposed with a plurality of reticles, a reticle stage disposed with a fastener for fastening the reticle, a substrate stage disposed with... Agent: Sinorica, LLC
20100039636 - Illumination optics for a microlithographic projection exposure apparatus: Illumination optics for a microlithographic projection exposure apparatus is used for illumination of an object field in the object plane with illumination light of a radiation source. The illumination optics has an optical beam influencing element which is divided into at least two beam influencing regions in order to generate... Agent: Fish & Richardson PC02/11/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100033694 - Exposure method, exposure apparatus and device manufacturing method: An exposure apparatus which exposes a wafer with an illumination light via a reticle includes a vortex tube which generates a cool gas and a warm gas from a compressed gas injected from a compressed gas supply tube; a flow rate control valve and a Y-shaped joint which mix the... Agent: Oliff & Berridge, PLC
20100033695 - Lithography apparatus and manufacturing method using the same: An lithography apparatus for manufacturing an organic transistor that is capable of aligning accurately in self-alignment fashion relative positions of a gate electrode and a pair of source and drain electrodes and has high productivity. In an lithography apparatus for radiating a light to a photosensitive self-assembled film and exposing... Agent: Mattingly & Malur, P.C.
20100033696 - Method and apparatus for producing an element having at least one freeform surface having a high accuracy of form and a low surface roughness: A method for producing an element having at least one arbitrarily freely formed surface (freeform surface) having a high accuracy of form and a low surface roughness. The freeform surface is obtained by at least one first processing step with a shaping material processing method in which at least an... Agent: Sughrue Mion, PLLC
20100033698 - Full wafer width scanning using steps and scan system: A system and method are provided for writing a pattern onto a substrate. A patterned beam of radiation is produced using a reticle and projected onto a substrate to expose the pattern. Reticle and substrate speeds are controlled such that respective scanning speeds of the reticle and the substrate allow... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100033697 - Optical position sensor, a position sensitive detector, a lithographic apparatus and a method for determining an absolute position of a movable object to be used in a relative position measurement system: A sensor includes a semiconductor body having a top and bottom surface, a first doped surface oriented region of a first conductivity type at the top surface, and a second doped surface oriented region of a second and opposite conductivity type at the bottom surface, wherein a sensitive area is... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100033699 - Illumination optical system, exposure apparatus, and exposure method: In an illumination optical system, a light flux from a light source is made to come into a first fly's eye optical system, and an illumination area is illuminated, via a second fly's eye optical system and a condenser optical system, with light fluxes from a plurality of mirror elements... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100033702 - Coated mirrors and their fabrication: (A1) A method of fabricating a mirror for EUV applications, comprising: (a) providing a substrate; (b) depositing a first layer on the substrate, the first layer being of nanometre scale or atomic layer thickness t1; (c) depositing a second layer on the first layer, the second layer being of nanometre... Agent: OpticusIPLaw, PLLC
20100033700 - Optical element, optical element holding device, exposure apparatus, and device manufacturing method: An optical element (LS2) has, in a side face (T6), a groove portion (50) for insertion of a portion of an optical element holding device.... Agent: Staas & Halsey LLP
20100033701 - Superlens and lithography systems and methods using same: A superlens that includes, in one example embodiment, a positive-index material adjacent to a negative-index material, wherein the negative-index material includes aluminum. In a more specific embodiment, the positive-index material includes a dielectric layer, such as Poly(Methyl MethAcrylate) (PMMA), which is less than 50 nanometers thick. The negative-index material includes... Agent: Attn: Kevin Dinniene Tanner Researach, Inc.
20100033704 - Deformable mirror, mirror apparatus, and exposure apparatus: A mirror apparatus includes a plurality of holes which are divided by partition wall portions on a back surface of a mirror, a plurality of thin film piezoelectric elements which are fixed to bottom surfaces of the plurality of holes respectively, a radiation temperature-regulating plate which has a plurality of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100033703 - Mixed polarization state monitoring: Mixed polarization state monitoring is presented. One method may include selecting a set of total dose values, and for each total dose value: exposing a location on a photoresist using illumination having an x-polarization value with an x-exposure dose ratio value of the total dose value, exposing the location on... Agent: Hoffman Warnick LLC
20100033705 - Multi nozzle proximity sensor employing common sensing and nozzle shaping: A fluid proximity sensor having one or more measurement nozzles and a reference nozzle coupled to a common chamber. Diaphragms coupled to the measurement nozzles can be sensed by optical, capacitive or inductive means so as to detect changes in pressure. In addition, the number of pressure detectors can be... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100033706 - Substrate position detection apparatus, and method of adjusting a position of an imaging component of the same: A method is disclosed for adjusting an arrangement of coordinates in an imaging area of an imaging component in a substrate imaging plane in a substrate position detection apparatus that detects a position of a substrate in accordance with an image taken of a circumferential portion of the substrate by... Agent: Ipusa, P.l.l.c02/04/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100026974 - Cooling of actuator coils: In order to effectively transfer heat from inner layers of an actuator coil to an area external to the coil, heat transfer elements, located proximate to the actuator coil, can be used. In an embodiment, a heat transfer apparatus for the actuator coil can include one or more heat transfer... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100026975 - Exposure apparatus and device manufacturing method: An exposure apparatus includes a shutter, an exposure dose sensor configured to detect an exposure dose on a substrate, and a controller configured to control an exposure operation in accordance with control modes of the shutter, which include a first mode in which an exposure time of the substrate is... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100026976 - Actuator system using multiple piezoelectric actuators: A positioning system adjusts a position of an optical element within an optical device, such as a variable-zoom lens system. A frame supports the optical element, and an elongated surface of each of one or more elongated support structures supports the frame. The frame also supports one or more piezoelectric... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100026977 - Method for measuring wavefront aberration: A method comprises determining a first processing center position to calculate a wavefront aberration of an optical system, determining a second processing center position to calculate a wavefront aberration, correcting the first processing center position in a first direction using the second processing center position in the first direction and... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100026978 - Projection objective of a microlithographic projection exposure apparatus: The disclosure relates a projection objective of a microlithographic projection exposure apparatus, as well as a related microlithographic projection exposure apparatus and method. The projection objective can include a lens of a cubically crystalline material whose crystal orientation is oriented at an angle of at most 15° relative to the... Agent: Fish & Richardson PC
20100026979 - Active spot array lithographic projector system with regulated spots: An active spot array projection system particularly for microlithographic projection includes a spatial light modulator, such as a digital micromirror device, having individually addressable elements. A focusing array, such as a microlens array, focuses elements transverse segments of the light beam into spots. Within an imaging optic between the spatial... Agent: Corning Incorporated
20100026980 - Processing apparatus and device manufacturing method: A processing apparatus of the present invention processes for a wafer 9. The processing apparatus includes an XY stage 6 which includes a wafer chuck 8 which holds the wafer 9 and an elevating device which rises relative to the wafer chuck 8 to hold the wafer 9, and a... Agent: Canon U.s.a. Inc. Intellectual Property DivisionPrevious industry: Optics: image projectors
Next industry: Optics: measuring and testing
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