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Photocopying January recently filed with US Patent Office 01/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 01/28/2010 > patent applications in patent subcategories. recently filed with US Patent Office
20100020295 - Method to fabricate pattern in housing: A method to fabricate a pattern on a housing, includes following steps: placing a film having a first lightproof area and a first light-transmissible area on a housing having light-sensitive inks formed in surface; radiating light on the film and light passing through the light-transmissible area and solidifying the light-sensitive... Agent: PCe Industry, Inc. Att. Steven Reiss
20100020296 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100020297 - Method for improving surface roughness of processed film of substrate and apparatus for processing substrate: A treatment apparatus for treating a substrate on a surface of which a treatment film has been formed and subjected to exposure processing and developing treatment. The treatment apparatus includes a nozzle for supplying a solvent gas of the treatment film to the surface of the treatment film on the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100020298 - Lithography apparatus with an optical fiber module: A lithography apparatus with an optical fiber module includes: a light source, a photo mask positioned under the light source, a lens positioned under the photo mask, a wafer stage positioned under the lens for supporting the wafer, wherein the wafer includes a dry film. The lithography apparatus further includes... Agent: North America Intellectual Property Corporation
20100020301 - Exposure device and method for producing the same: There is provided an exposure device including an exposure head having a light-emitting member which has a plurality of light-emitting sections arranged in a row and a casing which holds the light-emitting member and which is elongated in a longitudinal direction orthogonal to an optical axis direction of a light... Agent: Banner & Witcoff, Ltd. Attorneys For Client No. 016689
20100020299 - Instrumentation and method for maskless photolithography: There is disclosed a maskless photolithography apparatus and method where image patterns are determined by the user during visualization of a mounted material on a substrate with a microscope, and the image patterns are dynamically changed during visualization. The maskless photolithography system provides a means for dynamically generating a custom... Agent: Syntrix Biosystems, Inc.
20100020300 - Measurement apparatus and method: According to an aspect of the present invention, a method of controlling a measurement apparatus for determining a property of an individually controllable element of an array of individually controllable elements, the array of individually controllable elements being capable of controlling a distribution of a beam of radiation, is disclosed.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100020302 - Projection exposure tool for microlithography with a measuring apparatus and method for measuring an irradiation strength distribution: A projection exposure tool (10) for microlithography with a measuring apparatus (36) disposed in an optical path (28) of the projection exposure tool (10) for the locally and angularly resolved measurement of an irradiation strength distribution. The measuring apparatus (36) includes a measuring field with an arrangement (56) of focusing... Agent: Sughrue Mion, PLLC
20100020303 - Device, method, and system for measuring image profiles produced by an optical lithography system: Measuring an aerial image with an aerial image measuring device having a light detector and a light blocking layer for separating polarization components of light incident thereon. The light blocking layer has first and second apertures structured differently from each other, wherein the different structures transmit at least one of... Agent: Fitzpatrick Cella Harper & Scinto
20100020304 - Spectral purity filters for use in a lithographic apparatus: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.01/21/2010 > patent applications in patent subcategories. recently filed with US Patent Office
20100014059 - Lithographic apparatus and device manufacturing method: A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100014061 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100014060 - Lithographic apparatus, a metrology apparatus and a method of using the apparatus: A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100014062 - Lens array plate of erecting unit magnification system, image reading apparatus and image writing apparatus using the lens array plate, as well as method for manufacturing the lens array plate: A lens array plate of long-size or large area is provided reducing deterioration of optical performance. A lengthy lens array plate (10), which is based on manufacturing process in accordance with the present invention, is formed by connecting a plurality of planar-shaped lens array plates (1) in the longer direction... Agent: Knobbe Martens Olson & Bear LLP
20100014063 - Image exposure apparatus: An image exposure apparatus includes: a spatial light modulating element, constituted by a plurality of pixel portions for individually modulating light irradiated thereon; a light source, for irradiating light on the spatial light modulating element; and a focusing optical system. The focusing optical system includes: an optical system, for focusing... Agent: Sughrue Mion, PLLC
20100014065 - Method for improving imaging properties of an optical system, and such an optical system: The disclosure relates to a method for improving optical properties of an optical system. The optical system has a plurality of optical elements for imaging a pattern onto a substrate that is arranged in an image plane of the optical system. The method includes detecting at least one time-dependent, at... Agent: Fish & Richardson PC
20100014064 - Optical printers: One aspect of this invention relates to an illumination device for an optical printer, the illumination device comprising: a first array of light sources (20) comprising a plurality of light source elements (14) that are each operable to emit light within a red band of the visible electromagnetic spectrum; a... Agent: Modern Times Legal01/14/2010 > patent applications in patent subcategories. recently filed with US Patent Office
20100007862 - Exposure apparatus and device manufacturing method: An apparatus that projects a pattern of an original, onto a substrate held by a substrate stage having a top plate, to expose the substrate, comprises a cleaning unit, the cleaning unit including a discharge nozzle configured to discharge a fluid toward the top plate, and a recovery nozzle configured... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100007865 - Coupling apparatus, exposure apparatus, and device fabricating method: An exposure apparatus fills a space between a projection optical system and a substrate with a liquid and projects a pattern image onto the substrate to expose the substrate. The projection optical system has a first group including an optical member that comes into contact with the liquid, and a... Agent: Oliff & Berridge, PLC
20100007863 - Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent. The radiation that is reflected off... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100007864 - Scanning exposure apparatus and method of manufacturing device: A scanning exposure apparatus which transfers, onto a substrate, a pattern on a reticle illuminated with pulse light whose light intensity distribution has an isosceles trapezoidal shape along a scanning direction of the substrate comprises a controller configured to obtain a relationship between a number of pulses received by the... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100007866 - Method for producing facet mirrors and projection exposure apparatus: The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.... Agent: Fish & Richardson PC
20100007867 - Lithographic apparatus and calibration method: In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100007868 - Substrate support system having a plurality of contact lands: The present invention includes a substrate support system having a chuck body. The chuck body includes a body surface with a pin extending therefrom having a contact surface lying in a plane. The pin may be movably coupled to the chuck body to move with respect to the plane. The... Agent: U.t. Systems Board Of Regents C/o Mii
20100007869 - Reticle handler: The present invention provides an apparatus and method for handling a reticle during manufacturing processes of semiconductor devices in the fabrication line. The apparatus includes a holder for the reticle, the holder is configured to securely hold the reticle and a level indicator attached to and operative with the holder... Agent: Townsend And Townsend And Crew, LLP01/07/2010 > patent applications in patent subcategories. recently filed with US Patent Office
20100002205 - Printing apparatus, lens sheet, and printing method: Provided is a printing apparatus for performing printing on a lens sheet on which a plurality of lenses is arranged with a longitudinal direction thereof in one direction, and a print image corresponding to a plurality of parallaxes is formed on one surface thereof. A test pattern configured to provide... Agent: Edwards Angell Palmer & Dodge LLP
20100002206 - Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method: The situation of a liquid immersion region (LR) formed on the surface of a substrate (P) is detected while changing at least one of the movement condition of the substrate (P) and the liquid immersion condition when forming the liquid immersion region (LR), and an exposure condition is determined based... Agent: Staas & Halsey LLP
20100002208 - Exposure method, exposure apparatus, and device manufacturing method: At least one exemplary embodiment is directed to a method of exposing a substrate to light, including a measurement step of measuring position of a mark arranged on one of a substrate and a stage configured to hold the substrate and to move; a detection step of detecting a foreign... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100002207 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100002209 - Exposure apparatus and method of manufacturing device: An exposure apparatus comprises an optical system configured to illuminate a reticle, including an imaging optical system having an optical element, a reflecting surface which reflects light toward the optical element, and a processor which extracts information from a first signal based on first light which is incident on the... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100002210 - Integrated interference-assisted lithography: A lithography scanner and track system is provided that includes an interference lithography system according to one embodiment. The scanner provides a first optical exposure of a wafer. The track system provides pre and post-processing functions on a wafer. The interference lithography system may be included within the scanner and... Agent: Townsend And Townsend And Crew LLP
20100002211 - Lithographic apparatus: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100002212 - Scanning exposure apparatus, exposure method, and device manufacturing method: An apparatus includes a control unit configured to control an exposure unit and a driving unit such that exposure of a first region of a substrate starts and ends while a substrate stage is accelerated in a first direction parallel to a scanning direction, an absolute value of maximum acceleration... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100002214 - In-die focus monitoring with binary mask: Focus monitoring for a photolithographic applications is provided by illuminating a photoresist layer with a light beam transmitted through a first binary mask to define a circuit pattern on an underlying substrate and then illuminating the photoresist layer with an unbalanced off-axis light beam transmitted through a second binary mask.... Agent: Ditthavong Mori & Steiner, P.C.
20100002213 - Photolithography system using an optical microscope: A photolithography system using an optical microscope is provided that can form various types of selective patterns at a low cost in small-scale research using unit-size silicon substrates which is not targeted for mass production, without requiring an expensive photomask.... Agent: Lrk Patent Firm
20100002218 - Exposure apparatus and method for manufacturing device: An exposure apparatus for exposing a shot region on a substrate includes a stage configured to hold and move the substrate, a projection optical system configured to project light onto the substrate, a measuring unit configured to measure a position of a partial region of a surface of the substrate,... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100002217 - Illumination system of a microlithographic projection exposure apparatus: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination... Agent: Fish & Richardson PC
20100002216 - Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby: Spectral purity of a radiation beam of a first wavelength may be improved by providing an optical element that includes a structure having at least first layer including a first material, which structure is configured to be substantially reflective for a radiation of the first wavelength and substantially transparent or... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100002219 - Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method: There is disclosed an evaluation method for evaluating a one-dimensional illumination distribution using polynomials, the method comprising steps of: setting up, as the polynomials, one-dimensional power polynomials which are orthogonal in a closed interval; and approximating the one-dimensional illumination distribution with the power polynomials to obtain the coefficients of respective... Agent: Oliff & Berridge, PLC
20100002220 - Light shielding unit, variable slit apparatus, and exposure apparatus: A light shielding unit, which shields a part of an exposure light with a light shielding member, includes a sensor which detects displacement of the light shielding member, a driving device which drives the light shielding member based on a detection result obtained by the sensor, a case which accommodates... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100002221 - Systems and methods for minimizing scattered light in multi-slm maskless lithography: A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.Previous industry: Optics: image projectors
Next industry: Optics: measuring and testing
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