SEARCH:      Monitor Keywords |  Custom RSS

Photocopying November recently filed with US Patent Office 11/09

20090290134 - Exposure method: A method for exposure is provided to avoid a rise in temperature of a lens set. First, a light beam passes through a first light-receiving region of the lens set to expose a pattern on a substrate, and the first light-receiving region has a rise in temperature. Thereafter, the first... Agent: North America Intellectual Property Corporation

20090290135 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090290136 - Measuring apparatus, exposure apparatus and method, and device manufacturing method: A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole... Agent: Fitzpatrick Cella Harper & Scinto

20090290140 - Deactivating device and method for lithographic plate: A device as well as method for deactivating without developing an exposed lithographic printing plate is disclosed. The device comprises a structure for providing a deactivating agent that is capable of deactivating without developing the plate. The plate comprises on a substrate a photosensitive layer capable of hardening upon exposure... Agent: Gary Ganghui Teng

20090290138 - Pulse motor, positioning apparatus, exposure apparatus, and device manufacturing method: A pulse motor includes a first element in which a plurality of convex portions are arranged cyclically, and a second element disposed to face the first element. The plurality of convex portions include first and second convex portions. The first convex portion forms a part of a first magnetic circuit... Agent: Fitzpatrick Cella Harper & Scinto

20090290139 - Substrate table, sensor and method: A sensor for measuring a patterned beam of radiation in a lithographic exposure apparatus includes a receiving part for receiving the patterned beam of radiation and a processing part arranged to receive at least a part of the patterned radiation beam via the receiving part. The receiving part of the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090290137 - Support structure, lithographic apparatus and method: A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090284716 - Exposure apparatus, exposure method, and device manufacturing method: In an exposure apparatus of a liquid immersion exposure method, there is a case when a wafer table holding a wafer moves, a liquid immersion area formed by liquid supplied in a space between a wafer table and a projection optical system passes over a head mounted on the wafer... Agent: Oliff & Berridge, PLC

20090284717 - Exposure apparatus, exposure method, and device manufacturing method: In an exposure apparatus of a liquid immersion exposure method, a liquid immersion area is formed on the upper surface of a wafer by liquid supplied in a space formed with a projection optical system, and on a moving table holding the wafer, a plurality of encoder heads is placed.... Agent: Oliff & Berridge, PLC

20090284718 - Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device: There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090284715 - Lithographic apparatus and a method of operating the apparatus: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090284719 - Alignment method and apparatus of mask pattern: An alignment method of mask patterns in patterning processes includes forming a first layer by transferring a first mask pattern onto a wafer or a layer formed on the wafer, and forming a second layer by transferring a second mask pattern onto the first layer. The method particularly includes a... Agent: Oliff & Berridge, PLC

20090284720 - Lithographic apparatus and device manufacturing method: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090284722 - Method for monitoring focus on an integrated wafer: A method and apparatus are provided for improving the focusing of a substrate such as a wafer during the photolithography imaging procedure of a semiconductor manufacturing process. The invention is particularly useful for step-and-scan system and the CD of two features in each exposure field are measured in fields exposed... Agent: Law Office Of Delio & Peterson, LLC.

20090284724 - Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method: A plurality of heads configuring an encoder system is arranged on a wafer table, and positional information of a wafer table in the XY plane is measured, based on an output of a head opposed to a scale plate (diffraction grating). And, a relative position (including relative attitude and rotation)... Agent: Oliff & Berridge, PLC

20090284721 - Reticle system for manufacturing integrated circuit systems: A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer... Agent: Law Offices Of Mikio Ishimaru

20090284723 - Stage device, pattern formation apparatus, exposure apparatus, stage drive method, exposure method, and device manufacturing method: A stage device is equipped with: a wafer stage that has a coarse movement stage that moves along an XY plane and a table that is finely movable in at least a direction parallel to the XY plane; and an encoder system. A plurality of encoder heads are arranged on... Agent: Oliff & Berridge, PLC

20090284725 - Lithographic apparatus: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090284726 - Stray light feedback for dose control in semiconductor lithography systems: A lithography system with a stray light feedback system is disclosed. The stray light feedback helps control critical dimension (CD) within a stray light specification limit. A stray light dose control factor is calculated as a function of the stray light measured in the exposure tool and the sensitivity of... Agent: Ira S. Matsil Slater & Matsil, L.L.P.

20090284728 - Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor: A dichroic mirror configured to separate a first type of radiation in a first wavelength range having an upper boundary from a second type of radiation in a second wavelength range having a lower boundary greater than the upper boundary of the first wavelength. The mirror includes a substrate, and... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090284729 - Illumination optical apparatus and projection exposure apparatus: An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle... Agent: Oliff & Berridge, PLC

20090284727 - Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system: An illumination optical system is one for illuminating a surface to be illuminated with light from a light source, which has a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator, and an optical attenuator arranged... Agent: Staas & Halsey LLP

20090284730 - Substrate handler, lithographic apparatus and device manufacturing method: An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090279057 - Independent upper side and lower side drive type double-sided simultaneous exposure system: A maskless type exposure system using an exposure engine on which a digital micromirror device (DMD) is mounted includes an independent upper and lower side drive type double-sided simultaneous exposure system, in which a flexible object of exposure, including a flexible board, such as a chip-on-film (COF) or a lead... Agent: Jordan And Hamburg LLP

20090279058 - Exposure apparatus: An exposure apparatus for immersing, in liquid, a space between a final lens of a projection optical system and a plate, and for exposing the plate via the liquid includes a leak reducer for reducing or preventing a leak of the liquid from an area in which the liquid is... Agent: Rossi, Kimms & Mcdowell LLP.

20090279059 - Exposure apparatus adjusting method, exposure apparatus, and device fabricating method: An adjusting method that adjusts an immersion exposure apparatus that comprises a first holder, which holds a substrate, and a second holder, which holds the substrate before the substrate is held by the first holder, and that exposes the substrate, which is held by the first holder, through a liquid.... Agent: Oliff & Berridge, PLC

20090279060 - Fluid handling structure, lithographic apparatus and device manufacturing method: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090279062 - Fluid handling structure, lithographic apparatus and device manufacturing method: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090279063 - Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090279064 - Lithographic apparatus and device manufacturing method: In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate displacement mechanism using, for example, a combination of one or more leaf springs and one or more electromagnets or... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090279061 - Lithographic apparatus and method: A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090279065 - Measurement apparatus and exposure apparatus: A measurement apparatus which measures spatial coherence in an illuminated plane illuminated by an illumination system, comprises a measurement mask which has at least three pinholes and is arranged on the illuminated plane, a detector configured to detect an interference pattern formed by lights from the at least three pinholes,... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090279066 - Lithographic apparatus and method: A lithographic apparatus is disclosed that includes an illumination system configured to condition a beam of radiation, the illumination system having a Pockels cell arranged to control the polarization of the radiation beam, and an array of individually controllable reflective elements arranged to control the pupil plane distribution of the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090279067 - Stage system and lithographic apparatus comprising such stage system: A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090279068 - Device and process for increasing the light transmission of optical elements for light having a wavelength close to the absorption edge: Described are a process and a device for increasing the light transmission of an optical element for light of a wavelength that is close to the absorption edge of the material constituting the optical element. The process involves cooling the optical element. The process is especially well suited for microlithography... Agent: Striker, Striker & Stenby

20090273766 - Apparatus and method for exposure and method of manufacturing device: An exposure apparatus includes a projection optical system that projects light from an original to a substrate, and a supply device that supplies liquid containing a hydrocarbon compound to a gap between the final surface of the projection optical system and the substrate. The exposure apparatus exposes the substrate to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090273765 - Immersion flow field maintenance system for an immersion lithography machine: The present invention provides an immersion flow field maintenance system for an immersion lithography machine, the lithography machine including a projection objective lens, at least a wafer stage for supporting the wafer, and an immersion supplying system distributed around the projection objective lens for producing an immersion flow field under... Agent: Rabin & Berdo, PC

20090273767 - Movable body apparatus, exposure apparatus and pattern formation apparatus, and device manufacturing method: A movable body apparatus is equipped with a Y measuring system equipped with an encoder and an interferometer that measure the position of a stage in one axis (Y-axis) direction. The interferometer irradiates a reflection surface arranged on the stage with a measurement light close to a measurement light of... Agent: Oliff & Berridge, PLC

20090273768 - Liquid for immersion exposure, method of purifying the same,and immersion exposure method: A saturated hydrocarbon compound is brought into contact at least with a first adsorbent and a second adsorbent to obtain a liquid for immersion exposure containing the saturated hydrocarbon compound with a purity of 99.5 wt % or more.... Agent: Buchanan, Ingersoll & Rooney PC