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Photocopying October categorized by USPTO classification 10/09

20090257032 - Optical element and method: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.... Agent: Fish & Richardson PC

20090257036 - Alignment apparatus for aligning multi-layer structures: An exemplary alignment apparatus can align a first layer with a second layer. The first layer has a first alignment pattern. The second layer has a second alignment pattern. The alignment apparatus includes a supporting device for supporting the first layer and the second layer, a light pervious reference plate,... Agent: PCe Industry, Inc. Att. Steven Reiss

20090257035 - Exposure apparatus, measurement method, stabilization method, and device fabrication method: The present invention provides an exposure apparatus including a projection optical system configured to project a reticle pattern onto a wafer, a selector configured to select a dummy wafer to be placed near an image plane of the projection optical system, from a plurality of dummy wafers having the same... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090257033 - Exposure method, exposure apparatus, and method for producing device: A method for exposing a substrate includes arranging, in a direction, pattern areas to projection systems respectively arranged at an interval and each having a magnifying magnification, the pattern areas having area widths each smaller than the interval and greater than a width obtained by dividing an exposure width of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090257034 - Lithographic apparatus and device manufacturing method: In a lithographic apparatus, a control system is provided to automatically reduce throughput in the event that lens-heating aberrations exceed a certain threshold. The determination of whether lens-heating aberrations will exceed the threshold may be based upon a prediction, e.g. using a lens-heating model, or on measurements taken from a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090257037 - Measurement method, measurement apparatus, exposure apparatus, and device fabrication method: The present invention provides a measurement method of measuring imaging performance of a projection optics which projects a reticle pattern onto a substrate, including a measurement step of measuring the imaging performance of the projection optics, and a calculation step of calculating the imaging performance of the projection optics in... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090257039 - Exposure apparatus and device manufacturing method: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090257038 - Exposure apparatus and method of manufacturing device: An exposure apparatus (100) which exposes a substrate to light having a set light source shape via a mask (400) includes a plurality of light sources (201) arrayed two-dimensionally, and a light source control unit (700) which controls turning on and off of each of the plurality of light sources... Agent: Fitzpatrick Cella Harper & Scinto

20090257040 - Optical element with multiple primary light sources: The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured... Agent: Fish & Richardson PC

20090257042 - Exposure apparatus and electronic device manufacturing method: An exposure apparatus including a field stop is provided. The exposure apparatus includes an illumination optical system that guides light from a light source to a pattern forming section, a projection optical system that projects, onto an exposed surface, a pattern image formed by the pattern forming section with light... Agent: Staas & Halsey LLP

20090257043 - Illumination optical system, exposure apparatus, device manufacturing method, and exposure optical system: An illumination optical system to illuminate an illumination target surface with light from a light source comprises a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator; and a transmission filter with a transmittance characteristic varying... Agent: Staas & Halsey LLP

20090257041 - Illuminator for a photolithography device: The invention relates to an illuminator for a photolithography device. The invention comprises: a source (1′) of a light beam (10) which is used to illuminate a mask (8) and to expose an area of a wafer (W); at least one main array (4) of microlenses; and a shutter (6)... Agent: Harness, Dickey & Pierce, P.L.C

20090257044 - Lithographic apparatus and device manufacturing method: A lithographic apparatus and method for simultaneously exposing two patterning devices onto a substrate is disclosed. In an embodiment, a lithographic apparatus includes a plurality of illumination systems for receiving and conditioning a pulsed radiation beam, a beam director arranged between a source of the pulsed radiation and the illumination... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090257045 - Measuring method, adjustment method for stage movement characteristics, exposure method, and device manufacturing method: Provided is a measuring method including: transferring a measuring mark disposed on an original to a substrate at a plurality of locations; moving a substrate stage for holding the substrate so that the substrate is rotated by 90 degrees about a rotation axis parallel to an optical axis of a... Agent: Fitzpatrick Cella Harper & Scinto

20090251672 - Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method: An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and... Agent: Oliff & Berridge, PLC

20090251673 - Transmitting optical element with low foreign-element contamination: A transmitting optical element of polycrystalline material that includes crystallites of magnesium spinel MgAl2O4 or lutetium-aluminum garnet Lu3Al5O12, wherein the polycrystalline material includes an average total concentration of foreign element contamination caused by Y, Sc, Co, Ni, Zr, Mo, Sn and/or Nb of less than 50 ppm, preferably of less... Agent: Sughrue Mion, PLLC

20090251674 - Lithographic apparatus and device manufacturing method: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090251675 - Exposure device: In an exposure device having tiny light emitting elements aligned, a space required for drive circuits and wires is secured without affecting the size or alignment of the light emitting elements for arrangement and wiring of the drive circuits. In this exposure device, the drive circuits are separately arranged outside... Agent: Greenblum & Bernstein, P.L.C

20090251676 - Exposure apparatus and exposure method: An exposure image is accurately projected. An exposure apparatus includes a light source for emitting exposure light, a DMD, which includes a plurality of two-dimensionally-arranged pixel portions, and a telecentric optical system for collimating principal rays of the exposure light. The telecentric optical system is positioned in an optical path... Agent: Mcginn Intellectual Property Law Group, PLLC

20090251677 - Illuminating optical unit and projection exposure apparatus for microlithography: A projection exposure apparatus for microlithography has an illumination system with an EUV light source and an illumination optical unit to expose an object field in an object plane. A projection optical unit images the object field into an image field in an image plane. A pupil facet mirror in... Agent: Fish & Richardson PC

20090251679 - Exposure method and exposure apparatus, stage unit, and device manufacturing method having two substrate stages with one stage temporarily positioned below the other stage: By an exposure method including a process where in parallel with an exposure operation performed on a wafer on one of the wafer stages, the other wafer stage is temporarily positioned under the one wafer stage in order to interchange both wafer stages, a part of the interchange operation (exchange... Agent: Oliff & Berridge, PLC

20090251678 - Stage unit, exposure apparatus, and device manufacturing method: A stage unit includes the following elements. A stator includes a first coil array in which first coils extending in the x direction are arranged in the y direction, a second coil array in which second coils extending in the x direction are arranged in the y direction and which... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090244501 - Apparatus for real-time contamination, environmental, or physical monitoring of a photomask: An apparatus for real-time contamination, environmental, or physical monitoring of a photomask. The apparatus includes a photomask having a patterned region configured to correspond to features of an integrated circuit and a sensor physically coupled with the photomask. The sensor is configured to monitor an attribute related to the photomask.... Agent: Wood, Herron & Evans, LLP (ibm-bur)

20090244503 - Exposure apparatus, device manufacturing method, maintenance method, and exposure method: An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, and includes a liquid supply mechanism for supplying the liquid, and a measuring... Agent: Oliff & Berridge, PLC

20090244502 - Methods of compensating lens heating, lithographic projection system and photo mask: Embodiments relate to compensating for lens heating, lithographic projection system and photo mask. Accordingly, lens heating is compensated by providing a layout pattern including a regular pattern being arranged substantially symmetrical in a first region and a sub-resolution pattern including a plurality of sub-resolution structural elements, wherein the sub-resolution pattern... Agent: Slater & Matsil, L.L.P.

20090244504 - Projection exposure method: A projection exposure method that projects the shape of a hole onto a wafer by projecting a diffracted light, which is produced by applying light to a mask having a pattern for forming a hole pattern, onto the wafer through a projection optical system for exposure, wherein, in a plane... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090244505 - Positioning unit of optical element, optical system, exposure apparatus, adjustment method of optical system: A positioning unit is configured to position an optical element in a barrel, and includes a holder configured to hold the optical element, a first intermediate plate mounted with the holder, a second intermediate plate configured to support the first intermediate plate, a plurality of drivers each configured to drive... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090244508 - Method and device for connecting an optical element to a frame: A method and a device for the material-fit connection of an optical element to a frame are disclosed.... Agent: Fish & Richardson PC

20090244507 - Optical member, light routing unit, and exposure apparatus: Embodiment of the present invention is to provide an optical member composed of calcium fluoride (fluorite) and being capable of preventing deterioration and demonstrating a long life even in use under severe conditions. An optical member of a preferred embodiment has a base material having an entrance face into which... Agent: Oliff & Berridge, PLC

20090244509 - Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which... Agent: Fish & Richardson PC

20090244506 - Slm calibration: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090244510 - Process and apparatus for the production of collimated uv rays for photolithographic transfer: The present invention provides an improved process and an apparatus for producing collimated UV radiation for exposing printed circuit boards. The process consists in shortening the optical length of the downstream optics by dividing the UV radiation over many radiation sources, and in distributing the UV radiation uniformly on the... Agent: Moetteli & Associates Sarl

20090244511 - Electroactive polymers for lithography: Systems and methods for lithography include actuating an electroactive polymer member to position mask and/or substrate.... Agent: Searete LLC Clarence T. Tegreene

20090244512 - Lithography process window analyzing method and analyzing program: A lithography process window analyzing method for setting a process window based on ranges of exposure amounts and focus positions, and giving evaluation of reliability of the set process window, includes setting, based on a plurality of process conditions including exposure amounts and focus positions in the performed exposure processing,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090244513 - Position detection apparatus, position detection method, exposure apparatus, and device fabrication method: The present invention provides a position detection apparatus including a first obtaining unit configured to obtain imaging characteristics of an imaging optical system for a plurality of light beams, having different wavelength with each other, of the light having the wavelength width, a second obtaining unit configured to obtain optical... Agent: Canon U.s.a. Inc. Intellectual Property Division