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Photocopying July category listing 07/09

20090190104 - Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method: Encoder heads and Z heads are installed in order to measure the position of a stage that moves within a predetermined plane. Measurement beams emitted from these heads are irradiated to scales arranged on the upper surface of the stage. During the idling, for example, the stage continues to be... Agent: Oliff & Berridge, PLC

20090190106 - Immersion lithography apparatus: An immersion lithographic apparatus is disclosed having a projection system, a liquid supply system, and a recycling system. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, wherein a substrate table is configured to support the substrate. The liquid supply system... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090190105 - Lithographic apparatus and device manufacturing method: Contaminants may build up on surfaces of an immersion lithographic apparatus that come into contact with an immersion liquid from during exposure of a substrate. A solution containing a cleaning agent may be used to clean such surfaces. The cleaning properties of such a cleaning solution may be improved by... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090190107 - Maskless photopolymer exposure process and apparatus: A process for curing photopolymer which comprises exposing the photopolymer to an image produced by a mask-free imaging apparatus. The image may be generated by a monochromatic display screen, e.g. a liquid crystal display, light emitting diodes, a cathode ray tube or plasma screen.... Agent: Renner Kenner Greive Bobak Taylor & Weber

20090190108 - Method and system for leveling topography of semiconductor chip surface: A system and method of leveling the topography of a semiconductor wafer surface is presented. The system may induce low-order lens aberration to control the focal plane dynamically. The system may include a leveling sensor which measures the changes in topography on the surface, as well as an analyzer to... Agent: Banner & Witcoff, Ltd.

20090190112 - Exposure apparatus, and device manufacturing method: A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation... Agent: Oliff & Berridge, PLC

20090190111 - Lithographic apparatus and device manufacturing method incorporating a pressure shield: A lithographic apparatus is disclosed that has a movable article support configured to hold and move an article, a radiation control system configured to control a beam of radiation to be targeted onto the article, the article support, or both, the article to be moved relatively to the radiation control... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090190115 - Method for exposing a substrate and lithographic projection apparatus: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090190116 - Method of manufacturing a miniaturized device: A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of... Agent: Townsend And Townsend And Crew, LLP

20090190110 - Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method: A stage device is equipped with a first scale which is placed with a Y-axis direction serving as its longitudinal direction and in which a first grating whose periodic direction is in an X-axis direction is formed and a second scale which is placed with the X-axis direction serving as... Agent: Oliff & Berridge, PLC

20090190113 - Projection exposure apparatus, projection exposure method, and method for producing device: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate via a projection optical system. The projection exposure apparatus includes electricity removal units which removes electricity from a liquid supplied to a space between the projection optical system and the surface of a substrate. This makes... Agent: Oliff & Berridge, PLC

20090190114 - Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof: In immersion exposure, a resist pattern forming method suppressing resist pattern defects comprises mounting a substrate formed a resist film thereon and a reticle formed a pattern thereon onto an exposure apparatus, supplying a first chemical solution onto the resist film to selectively form a first liquid film in a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090190109 - Substrate transfer appartus: A substrate transfer apparatus that is designo provide an inclined transfer function that improves liquid saving efficiency of a process solution (developing solution) during the transfer of the substrate. The substrate transfer apparatus includes a first transfer unit for transferring a substrate, a second transfer unit spaced apart from an... Agent: Gifford, Krass, Sprinkle,anderson & Citkowski, P.c

20090190117 - Exposure apparatus, manufacturing method and supporting method thereof: An exposure apparatus includes an illumination optical system that guides illumination light to a mask; a projection optical system that projects the pattern irradiated with the illumination light, onto a substrate; and a supporting device that integrally suspendingly supports at least part of the illumination optical system and the projection... Agent: Oliff & Berridge, PLC

20090190118 - Exposure apparatus inspection mask, and method of inspecting exposure apparatus using exposure apparatus inspection mask: An exposure apparatus inspection mask has asymmetric diffraction grating regions for generating +1-order diffracted light and −1-order diffracted light having a different diffraction efficiency. The asymmetric diffraction grating region includes: a transparent substrate; semi-transparent phase shifter films selectively and periodically disposed on the transparent substrate at a predetermined pitch; and... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090185148 - Support for an optical element: The disclosure relates to a support structure for an optical element and an optical element module including such a support structure. The disclosure also relates to a method of supporting an optical element. The disclosure may be used in the context of photolithography processes for fabricating microelectronic devices, such as... Agent: Fish & Richardson PC

20090185150 - Immersion exposure apparatus and device manufacturing method: An immersion exposure apparatus which includes an original stage which moves with holding an original; a substrate stage which includes a liquid supporting plate which has a liquid repellent surface and is located around a substrate holding region which holds a substrate; and a projection optical system, and scan-exposes the... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090185149 - Immersion lithographic apparatus with immersion fluid re-circulating system: A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090185151 - Substrate processing system and substrate transfer method: A substrate processing system (100) includes a first automated substrate transfer line or main transfer line (20) configured to transfer wafers (W) over the entire system and to transfer wafers to and from respective process sections, and a second automated substrate transfer line or auxiliary transfer line (30) configured to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090185152 - Projection optical system, exposure apparatus and device fabricating method: There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090185153 - Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method: In certain aspects, catadioptric projection objectives for imaging a pattern from an object field arranged in an object surface of the projection objective onto an image field arranged in an image surface of the projection objective include a first objective part configured to image the pattern from the object surface... Agent: Fish & Richardson PC

20090185154 - Optical unit, illumination optical apparatus, exposure appartus, exposure method, and device manufacturing method: An optical unit comprises a first optical path in which a spatial light modulator with a plurality of optical elements arranged two-dimensionally and controlled individually can be arranged; a second optical path including a mechanism for insertion of an angle distribution providing element including a predetermined fixed pattern on a... Agent: Miles & Stockbridge PC

20090185156 - Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas: An exposure method and apparatus simultaneously transfer patterns with various pitches with high-resolution. On the pupil surface of an illumination system, at least first and second pairs of areas are set. The distribution of intensity of light over the pupil surface is set so that the intensities of light of... Agent: Oliff & Berridge, PLC

20090185155 - Lithography system with illumination monitor: A lithographic system including a light source configured to provide a light beam, a mask stage configured to hold a mask having a mask pattern, a wafer stage having a surface configured to hold a wafer having a plurality of dies, and an illumination monitor having a receiver disposed at... Agent: Dicke, Billig & Czaja

20090180084 - Lithographic apparatus with an encoder arranged for defining a zero level: A lithographic apparatus includes a position measuring system configured to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least one direction of an orthogonal x-y-z coordinate system of the moveable object. The position measuring system includes an optical x-z-encoder... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090180085 - System and method for large format imaging: Disclosed are systems and methods for a flat platen imaging system. The system includes, either alone or in combination, a movable book support to facilitate the segregation and imaging of individual pages of an oversize book or similar bound document, and a user interface and visual indicators to facilitate imaging... Agent: Basch & Nickerson LLP

20090180087 - Seal ring arrangements for immersion lithography systems: Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.... Agent: K & L Gates LLP

20090180086 - Substrate treating apparatus, exposing apparatus and methods of cleaning a cleaning tool: The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to... Agent: Mills & Onello LLP

20090180090 - Exposure apparatus and device fabrication method: An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member (70) having a supply outlet (12) that supplies a liquid (LQ) and... Agent: Oliff & Berridge, PLC

20090180089 - Exposure apparatus and method for producing device: A vacuum system for an immersion exposure apparatus includes a flow passage connected to a vacuum source, and a separator provided on the flow passage. The separator separates any gas from a liquid sucked into the flow passage together with the gas.... Agent: Oliff & Berridge, PLC

20090180088 - Illumination sources for lithography systems: Illumination sources, lithography systems, and methods of processing and fabricating semiconductor devices are disclosed. In a preferred embodiment, an illumination source includes a first aperture type generator and at least one second aperture type generator. The illumination source is adapted to emit energy simultaneously from the first aperture type generator... Agent: Slater & Matsil LLP

20090180092 - Combination of structure and an active damping system, and a lithographic apparatus: An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090180093 - Evaluation method, control method, exposure apparatus, and memory medium: A method of evaluating an imaging performance of a projection optical system, comprising a step of specifying a polarization change of the projection optical system, which represents a relationship between a polarization state of light impinging on the projection optical system and the polarization state of the light exiting from... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090180091 - Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method: In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090180094 - Light intensity distribution measurement apparatus and measurement method, and exposure apparatus: A measurement apparatus which illuminates a pattern inserted on the object plane of an optical system, and measures a light intensity distribution corresponding to the pattern formed on the image plane of the optical system includes a sensor. The sensor includes a light-shielding member having a slit and a plurality... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090180096 - Environmental system including vacuum scavenge for an immersion lithography apparatus: A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a... Agent: Oliff & Berridge, PLC

20090180095 - Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus: A method is provided for placing a substrate onto a surface of a substrate holder, the surface having a plurality of burls. First substrate placement data is calculated. This data enables placement of the substrate at a certain position with respect to a position of the plurality of burls on... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090180097 - Exposure method: An exposure method for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes the steps of obtaining a relationship between an exposure parameter that determines a mode to expose a plate, and an electrical characteristic of a device... Agent: Rossi, Kimms & Mcdowell LLP.

20090174870 - Cleaning apparatus and immersion lithographic apparatus: A cleaning apparatus to clean a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090174872 - Cleanup method for optics in immersion lithography: An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece,... Agent: Oliff & Berridge, PLC

20090174871 - Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus: A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090174873 - Exposure apparatus, exposure method and device manufacturing method: An exposure apparatus that exposes a substrate is provided, the exposure apparatus comprising a first exposure system that drives a movable component which holds the substrate, and that, using patterned first exposure light, exposes a first shot area where a chip which is used to create a device can be... Agent: Miles & Stockbridge PC

20090174874 - Optical projection system: An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having... Agent: Ohlandt, Greeley, Ruggiero & Perle, LLP

20090174875 - Scanning exposure apparatus and device manufacturing method: A scanning exposure apparatus is configured to project a pattern of an original onto a substrate by a projection optical system while scanning the original and the substrate, thereby scanning-exposing the substrate, the apparatus including a barycentric position adjusting unit configured to adjust, based on a target barycentric position, a... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090174876 - Optical apparatus and method for modifying the imaging behavior of such apparatus: The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and... Agent: Fish & Richardson PC

20090174877 - Lithographic apparatus and device manufacturing method: A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090168032 - Lithographic apparatus and device manufacturing method: The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090168033 - Manufacturing method of pattern formed body and pattern formed body manufacturing apparatus: A main object of the invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a target pattern form with high precision; and a... Agent: Ladas & Parry LLP

20090168034 - Methods and apparatus of manufacturing a semiconductor device: Methods and apparatus of manufacturing a semiconductor device are provided. Embodiments regard producing a first pattern in a first layer of a semiconductor substrate, producing a second pattern in a second layer of the semiconductor substrate, and matching the first pattern and the second pattern. The matching includes determining a... Agent: Slater & Matsil, L.L.P.

20090168036 - Exposure apparatus, structure, method for setting up apparatus, and device manufacturing method: An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090168035 - Exposure method and exposure apparatus for photosensitive film: An exposure apparatus for a photosensitive film includes: light-emitting diodes for generating rays to expose a photosensitive film; a light shield positioned between the light-emitting diodes to prevent noise; a stage for receiving a substrate having the photosensitive film thereon; and a parallelizer positioned between the light-emitting diodes and the... Agent: Holland & Knight LLP

20090168039 - Device manufacturing method and lithographic apparatus: A device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condition with a first pattern in its cross-section, and projecting the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090168038 - Exposure apparatus, detection method, and method of manufacturing device: An exposure apparatus according to this invention comprises an illumination optical system which illuminates an original with exposure light, a projection optical system which projects an image of the original onto a substrate, an original stage which holds and drives the original, a substrate stage which holds and drives the... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090168037 - Lithographic apparatus and device manufacturing method: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090168040 - Diffractive optical device, and aligner comprising that device: The invention relates to a pupil filter used for the illumination optical system of a semiconductor aligner or the like that can prevent a decrease in the quantity of light having transmitted through it, enhance the efficiency of semiconductor exposure, reduce loads of correction by the optical proximity effect and... Agent: Sughrue Mion, PLLC

20090168041 - Projection apparatus: A projection apparatus including an image display element for modulating illumination light, an illumination optical system for irradiating the illumination light onto the image display element, a projection optical system for projecting the modulated light by the image display element onto a projection surface, and an optical system changing section... Agent: Sidley Austin LLP

20090168042 - Lithographic apparatus and device manufacturing method: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090168043 - Exposing method using variable shaped beam, and pattern forming method using the same: Provided is an exposing method using a variable shaped beam that may minimize a critical dimension (CD) distribution and a mean to target (MTT) difference generated during a process by correcting CD linearity of the design CD of a circuit pattern, and a pattern forming method using the exposing method.... Agent: Harness, Dickey & Pierce, P.L.C

20090168044 - Lithography apparatus and lithography method: A lithography apparatus includes a generating unit configured, by receiving character information which specifies a shape of an identification figure representing identification information of a target object, to generate pattern writing data of the identification figure on the basis of the character information; a synthesizing unit configured, by receiving a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.