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Photocopying June invention type 06/09

20090161082 - Exposure apparatus and exposure method: Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first... Agent: Oliff & Berridge, PLC

20090161084 - Cleanup method for optics in immersion lithography: A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography... Agent: Oliff & Berridge, PLC

20090161083 - Lithographic apparatus and device manufacturing method: The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090161085 - Lithographic apparatus having acoustic resonator: A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090161086 - Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method: A movable body system is equipped with a stage having a stage main section which moves along an XY plane and a stage which is finely movable in a direction (a Z-axis direction) orthogonal to the XY plane and a tilt direction with respect to the XY plane, and a... Agent: Oliff & Berridge, PLC

20090161088 - Beam characterization monitor for sensing pointing or angle of an optical beam: The divergence of an optical beam is determined. An optic is configured to provide internal reflection of at least a part of a beam of radiation scanned over varying angles of incidence on the optic. The optic has a film configured to provide a surface plasmon resonance (SPR) effect. A... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090161087 - Projection optical system, aligner, and method for fabricating device: A refractive projection optical system in which a large image side numerical aperture can be ensured by interposing liquid in the optical path to the image plane, and an image having good planarity can be formed while suppressing radial upsizing. The projection optical system comprising a first image forming system... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090161089 - Immersion lithographic apparatus and device manufacturing method: A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090153812 - Positioning apparatus, exposure apparatus, and device manufacturing method: A positioning apparatus includes a movable member, a support member which supports the movable member, a driving mechanism which moves the movable member supported by the support member, a first temperature regulating unit which regulates the temperature of the driving mechanism, and a second temperature regulating unit which regulates the... Agent: Fitzpatrick Cella Harper & Scinto

20090153815 - Exposure apparatus, exposure method, method for manufacturing device: An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first... Agent: Oliff & Berridge, PLC

20090153813 - Exposure method, exposure apparatus and method for fabricating device: An exposure condition is determined in accordance with a moving condition of a substrate (P) relative to a projection optical system so that a pattern image is projected on the substrate (P) in a desired projection state, and the substrate (P) is exposed in the determined exposure condition.... Agent: Miles & Stockbridge PC

20090153814 - Self-cleaning scan head assembly: A scan head assembly for use in an imaging device for scanning media that uses fluid particles from the atmosphere for cooling an optical system, cleaning existing contamination particles in the scan head assembly and preventing contamination particles from accruing in the scan head assembly. The scan head assembly is... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090153816 - Method of transferring a substrate, transfer system and lithographic projection apparatus: The invention relates to a method of transferring a substrate from a first substrate holder to a second substrate holder in a lithographic projection apparatus by means of a transfer unit on the basis of transfer data available thereto. The second substrate holder has a surface provided with a first... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090153817 - Correction method and exposure apparatus: At Step 602, the grid of a wafer loaded into an exposure apparatus is approximated by a mathematical function fitting up to, for example, a cubic function, and at Step 612, the magnitude of a residual error between the position of a sample shot area obtained by the function and... Agent: Oliff & Berridge, PLC

20090153820 - Exposure apparatus and device manufacturing method: An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical... Agent: Oliff & Berridge, PLC

20090153819 - Exposure apparatus, exposure method and device manufacturing method: An exposure apparatus restricts reduction in throughput. The exposure apparatus controls movement such that, (1) when a substrate is moving in one direction, a first pattern is moved in a specified direction to expose a first shot region using a first exposure light, then movement of the substrate in the... Agent: Oliff & Berridge, PLC

20090153822 - Exposure apparatus, exposure method, and device manufacturing method: Two X encoder heads (X heads) and one Y head are mounted on one wafer stage, and an X scale and a Y scale corresponding to these heads are arranged on a surface facing the wafer stage so that the scales connect the exposure area and the alignment area. The... Agent: Oliff & Berridge, PLC

20090153823 - Lithographic apparatus and device manufacturing method: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090153821 - Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing method: A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090153818 - Method and apparatus for extracting dose and focus from critical dimension data: A method for monitoring a photolithography system includes defining a model of the photolithography system for modeling top and bottom critical dimension data associated with features formed by the photolithography system as a function of dose and focus. A library of model inversions is generated for different combinations of top... Agent: Scott F. Diring Williams, Morgan & Amerson, P.C.

20090153828 - Exposure apparatus, exposure method, and device fabrication method: The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a specifying unit configured to specify a first region on a pupil plane of the projection optical system based on the pattern of the reticle and a... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090153827 - Image reading apparatus: An image reading apparatus includes a light source, a plurality of light receiving elements arranged in a primary scanning direction, and an optical part having either one of the function to direct light emitted from the light source toward an object to be read as linear light extending in the... Agent: Hamre, Schumann, Mueller & Larson, P.C.

20090153825 - Lithographic apparatus and method: A lithographic alignment apparatus includes a radiation source arranged to generate radiation at a wavelength of 1000 nanometers or longer, and a plurality of non-imaging detectors arranged to detect the radiation after the radiation has been reflected by an alignment mark.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090153826 - Lithographic method and apparatus: A multiple patterning process employs a phase change material, portions of which can be converted to an amorphous state and then a remaining portion is selectively removed to provide high resolution pattern features with a feature spacing smaller than, for example, a minimum spacing available in a conventional patterning layer... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090153829 - Lithographic projection objective: Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.... Agent: Fish & Richardson PC

20090153824 - Multiple chuck scanning stage: A substrate processing system and method are disclosed. The system may include a stage, first and second chucks mounted on the stage and at least one processing head proximate the stage. The stage and processing head are configured for relative movement for a sufficient distance for the processing head to... Agent: Jdi Patent- Kla-tencor Corp. Joint Customer Number

20090153830 - Device for transmission image detection for use in a lithographic projection apparatus and a method for determining third order distortions of a patterning device and/or a projection system of such a lithographic apparatus: Embodiments of the invention relate to a device for transmission image detection for use in a lithographic projection apparatus. In an embodiment, the device includes an array of gratings and an array of radiation sensitive sensors, each of which is arranged to receive radiation coming through one of the gratings.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090153831 - Method and system for correcting image changes: The disclosure relates to a method for compensating image errors, generated by intensity distributions in optical systems, such as in projection lens arrays of microlithography systems, and to respective optical systems, such as projection lens arrays of microlithography systems.... Agent: Fish & Richardson PC

20090153832 - Apparatus and method for isolating vibrations in a lithography machine using two active control units: An apparatus and method effectively isolate vibrations in a lithography machine. The apparatus and method include a first control for actively reducing the vibrations in a first frequency range and a second control for actively reducing the vibrations in a second frequency range. The first control further includes a first... Agent: Knoble, Yoshida & Dunleavy

20090153833 - Original cover closer: An original cover closer of which the energy absorption capability can be freely adjusted by a damper is described. The development period for the original cover closer is therefore shortened. The original cover closer comprises: an attachment member to be mounted on the main body of a device; a support... Agent: Browdy And Neimark, P.l.l.c. 624 Ninth Street, Nw

20090147225 - Apparatus and method for manufacturing semiconductor device: An apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device using the apparatus may be provided. The manufacturing apparatus may include a liquid supplying portion for forming a liquid film, and a gas supplying unit that may rotate to discharge gas at a wide range... Agent: Joseph M. Stabile

20090147228 - Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus: A projection optical system PL is used to project an image of a pattern. A manufacturing method of an exposure apparatus includes: a positioning step of positioning the projection optical system at a predetermined position; and a support step of supporting the positioned projection optical system. The positioning step includes... Agent: Oliff & Berridge, PLC

20090147226 - Inner surface exposure apparatus and inner surface exposure method technical field: An apparatus and a method for exposing a photosensitive material deposited on the inner surface of a tube such as a circular or polygonal tube to light to form a predetermined exposed pattern are provided. The apparatus includes: a guide rod that is inserted into the inner space of an... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090147227 - Lithographic apparatus and device manufacturing method: A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090147230 - Lithographic apparatus and device manufacturing method: A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090147232 - Marker structure and method of forming the same: The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting surface at a second level. A separation between the first level and the second level determines a phase... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090147229 - Optical element unit and method of supporting an optical element: There is provided an optical element unit comprising an optical element, a connector element, and an optical element holder. The optical element has a plane of main extension as well as an outer circumference and defines a radial direction. The connector element connects the optical element and the optical element... Agent: Ohlandt, Greeley, Ruggiero & Perle, LLP

20090147231 - Scanning exposure apparatus and method of manufacturing device: e

20090147233 - Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses: A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis... Agent: Oliff & Berridge, PLC

20090147234 - Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses: A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis... Agent: Oliff & Berridge, PLC

20090147235 - Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses: A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis... Agent: Oliff & Berridge, PLC

20090147236 - Servo control system, lithographic apparatus and control method: A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090147237 - Spatial phase feature location: Methods for locating an alignment mark on a substrate are described. Generally, the substrate includes one or more locator marks adjacent to a substrate alignment mark. Locator marks provide the relative location of the substrate alignment mark such that the substrate alignment mark may be used in aligning a substrate... Agent: Molecular Imprints

20090141257 - Illumination optical apparatus, exposure apparatus, and method for producing device: A reflection type illumination optical apparatus, which guides an exposure light to a reticle surface via a curved mirror, a concave mirror, etc. includes a vacuum chamber which accommodates the curved mirror, the concave mirror, etc; and a subchamber which is arranged in the vacuum chamber and which accommodates the... Agent: Oliff & Berridge, PLC

20090141256 - Image recording method and device: A laser beam is detected by a photosensor and a changing quantity of the light quantity is calculated to correct the fluctuation of the status of an exposure apparatus due to lapse of time. The laser beam is also detected by a photosensor to calculate a changing quantity of a... Agent: Sughrue Mion, PLLC

20090141258 - Imaging device in a projection exposure machine: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a... Agent: Fish & Richardson PC

20090141259 - Exposure apparatus: An exposure apparatus, which forms a latent image pattern on a substrate using an exposure beam, includes a first structure which supports a projection unit which projects an exposure beam onto a substrate, a first supporting leg which includes a first actuator and supports the first structure, a first state... Agent: Fitzpatrick Cella Harper & Scinto