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Photocopying May archived by USPTO category 05/09

20090135381 - Apparatus for processing substrate and method of doing the same: An apparatus for processing a substrate includes a substrate carrier for carrying a substrate, a chemical-applying unit for applying chemical to the substrate, and a development unit for developing the substrate.... Agent: Sughrue Mion, PLLC

20090135383 - Exposure apparatus: An exposure apparatus including a moving member movable with a substrate, an interferometer configured to measure a position of the moving member, a blower device for blowing temperature-conditioned air, a plurality of supply openings communicating with the blower device, and a flow rate adjusting device configured to adjust a gas... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090135382 - Exposure method, exposure apparatus, and method for producing device: An exposure method includes a first step filling a liquid in a predetermined optical path space for exposure light (EL) in an optical system (PL), or for exchanging the liquid (LQ) filled in the space; a second step for successively exposing a predetermined number of substrates (P) through the liquid... Agent: Oliff & Berridge, PLC

20090135386 - Illumination optical apparatus, exposure apparatus, and method for producing device: An illumination optical apparatus which illuminates an illumination objective surface with an exposure light includes: an illumination optical system having a curved mirror and a concave mirror and defining a position substantially conjugate with the illumination objective surface between the curved and concave mirrors; and a second aperture plate separating... Agent: Oliff & Berridge, PLC

20090135385 - Optical imaging device with thermal attenuation: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the... Agent: Fish & Richardson PC

20090135384 - Substrate processing apparatus: A substrate processing apparatus includes a substrate holding stage to hold a substrate having a surface facing up, the substrate having an exposed and developed resist pattern over the surface, a rotation driving mechanism to rotate the substrate holding stage around a vertical axis, a solvent vapor discharge nozzle having... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090135387 - Laser irradiation: The invention relates to an optical arrangement for transmitting a structure from a mask (4), and for the corresponding irradiation of a substrate (7). Said optical arrangement comprises a region for expanding a light beam (13) upstream of the mask (4), and a region for converging the light (15) downstream... Agent: Antonelli, Terry, Stout & Kraus, LLP

20090135388 - Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method: A moving grating is arranged on a side of a wafer stage, a light source irradiates a light to the moving grating, diffracted lights generated from the moving grating are interfered by fixed scales and an index scale of which positional relation with the light source is fixed, and a... Agent: Oliff & Berridge, PLC

20090135389 - Method of measuring focus of a lithographic projection apparatus: A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset FO. After developing, an... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090135393 - Illumination optical apparatus, exposure apparatus, and device manufacturing method: An illumination optical apparatus is configured to irradiate a light beam from a light source onto a surface to be irradiated. The illumination optical apparatus includes a first group of prisms which has a plurality of prisms, a second group of prisms which has a plurality of prisms, and a... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090135390 - Lithographic alignment marks: Precise and repeatable alignment performance using asymmetric illumination is achieved by properly structuring, as by segmenting, an alignment mark on a reticle of a photolithographic exposure apparatus as a function of the type of asymmetric illumination, thereby improving resolution and repeatability of an alignment mark formed on a target substrate.... Agent: Ditthavong Mori & Steiner, P.C.

20090135394 - Lithographic apparatus and method: A lithographic apparatus is disclosed that is configured to project a patterned beam of radiation onto a target portion of a substrate, the lithographic apparatus including an illumination system configured to condition a beam of radiation, the illumination system having a uniformity correction system located in a plane which, in... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090135391 - Method of forming a locally periodic 3d structure with larger-scale variation in periodic properties and applicaitons thereof: An optical structure is provided. The optical structure includes a substrate structure. A photosensitive material layer is positioned on said substrate structure. The photosensitive material layer having uniform periodic geometry and a period length throughout associated with a 2D periodic pattern. The 2D periodic pattern includes a period length greater... Agent: Gauthier & Connors, LLP

20090135395 - Optical system for semiconductor lithography: An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The... Agent: Fish & Richardson PC

20090135392 - Spatial light modulation unit, illumination optical apparatus, exposure apparatus, and device manufacturing method: This invention relates to an illumination optical apparatus capable of forming a pupil intensity distribution of a desired shape and desired illuminance and, in turn, capable of realizing illumination conditions of great variety. The illumination optical apparatus has a spatial light modulation unit composed of a first spatial light modulator... Agent: Miles & Stockbridge PC

20090135398 - Exposure apparatus and device manufacturing method: An exposure apparatus includes an illumination optical system configured to illuminate an original by a luminous flux from a light source and a projection optical system configured to project a pattern of the original onto a substrate. The illumination optical system includes a generator configured to form an effective light... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090135396 - Illuminating optical apparatus, exposure apparatus and device manufacturing method: An illumination optical apparatus is able to individually illuminate two regions separate from each other, under required illumination conditions. The illumination optical apparatus comprises a first illumination system to illuminate a illumination region and a second illumination region to illuminate a second illumination region. The first illumination system includes a... Agent: Oliff & Berridge, PLC

20090135397 - Illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus, as well as related systems, methods and components are disclosed. The illumination system can include a polarization manipulator configured to variably adjust a change in the polarization state of light impinging thereon. The illumination system can also include a mirror arrangement... Agent: Fish & Richardson PC

20090135399 - Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method: A drive system determines a combination of basic patterns (type of basic patterns to be generated and the number of pulses of each basic pattern) based on design data of patterns and pattern combination information stored in a memory. Then, based on the determined result, each micro mirror of a... Agent: Staas & Halsey LLP

20090135400 - Method and apparatus for lithographic imaging using asymmetric illumination: According to one aspect of the present invention, a method and apparatus for processing a substrate may be provided. A reticle may be positioned relative to a substrate. The reticle may have a plurality of features with dimensions extending in a first and a second direction and being asymmetric in... Agent: Intel/bstz Blakely Sokoloff Taylor & Zafman LLP

20090128787 - Substrate processing apparatus: A substrate processing apparatus enables an efficient collection of a solvent vapor discharged via a nozzle onto a wafer on which a resist pattern is formed. A retaining base that retains the wafer is moved relative to the nozzle, which includes a nozzle head. A pair of leakage preventing portions... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090128788 - System and method for making photomasks: The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum spacing between photomask patterns. The method further comprises determining the position of a first photomask pattern relative to an... Agent: Texas Instruments Incorporated

20090128790 - Exposure apparatus, exposure method, and device manufacturing method: When a transition is performed from a state where one wafer stage is positioned in an area including a liquid immersion area to a state where the other wafer stage is positioned in the area including the liquid immersion area, eaves sections arranged in both wafer stages are to be... Agent: Oliff & Berridge, PLC

20090128793 - Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method: A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the... Agent: Oliff & Berridge, PLC

20090128792 - Lithographic apparatus and method: A method is disclosed that includes introducing a substrate into a pre-aligner of a lithographic apparatus, using a detector to measure the location of an alignment mark provided on a side of the substrate which is opposite to the location of the detector, and after measurement, putting the substrate onto... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090128789 - Projection exposure device, and exposure process performed by the device: The present invention relates to provide a projection exposure device having a small volume, thereby not occupying a large installation space. The projection exposure device is configured to transfer patterns formed on a mask to a surface of film-shaped tape on an upright exposure stage by projecting the patterns onto... Agent: Dilworth & Barrese, LLP

20090128791 - Stage system, lithographic apparatus including such stage system, and correction method: A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090128794 - Interrupter: An interrupter includes: a light emitting device; a light receiving device placed at a position on which light emitted from the light emitting device can be incident; and a mold member made of a material that transmits part of the light and absorbs the rest, including a section enclosing the... Agent: Amin, Turocy & Calvin, LLP

20090128795 - Exposure apparatus: An exposure apparatus is configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light. The exposure apparatus includes a stage configured to move at the time of exposure, an electrostatic chuck which is provided on the stage and is configured to hold the original,... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090128796 - Illumination optics apparatus, exposure method, exposure apparatus, and method of manufacturing electronic device: An illumination optical apparatus which constantly controls a plurality of polarization states with high accuracy. An illumination optical system, which illuminates a pattern surface of a mask with illumination light, includes a polarization optical system and a depolarizer. The polarization optical system includes a half wavelength plate and PBS, which... Agent: Klarquist Sparkman, LLP

20090122281 - Silica glass containing tio2 and process for its production: A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090122282 - Exposure apparatus, liquid immersion system, exposing method, and device fabricating method: An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a first surface, which is disposed around an optical path of the exposure light; a second surface, which is disposed adjacent to an outer edge of the first surface, that includes a first area,... Agent: Oliff & Berridge, PLC

20090122288 - Device for the low-deformation replaceable mounting of an optical element: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at... Agent: Fish & Richardson PC

20090122283 - Exposure apparatus and device manufacturing method: An exposure apparatus (1) has a projection optical system (30) for projecting a pattern of a reticle onto a substrate, and exposes the substrate (40) via a liquid supplied in a space between the projection optical system (30) and the substrate (40). The exposure apparatus includes a gas curtain producer... Agent: Morgan & Finnegan, L.L.P.

20090122284 - Lithographic apparatus having an active damping subassembly: A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090122285 - Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method: On the +X and −X sides of a projection unit, a plurality of Y heads are arranged in parallel to the X-axis by a predetermined distance half or less than half the effective width of the scale, so that two heads each constantly form a pair and face a pair... Agent: Oliff & Berridge, PLC

20090122286 - Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method: On the +X and −X sides of a projection unit, a plurality of Z heads are arranged in parallel to the X-axis, by a distance half or less than half the effective width of the Y scale so that two Z heads each constantly form a pair and face a... Agent: Oliff & Berridge, PLC

20090122287 - Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method: On the +X and −X sides of a projection unit, a plurality of Y heads are arranged in parallel to the X-axis by a distance half or less than half the effective width of the scale, so that two heads each constantly form a pair and face a pair of... Agent: Oliff & Berridge, PLC

20090122290 - Device manufacturing method and lithographic apparatus,and computer program product: In a lithographic printing process a substrate is moved, in the scanning direction, relative to a patterned beam of radiation being projected onto it during a scanning exposure of a pattern feature. An image of the pattern feature is blurred in the scanning direction. The effect of the blurring is... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090122289 - Thin film continuous spatially modulated grey attenuators and filters: A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090122292 - Illumination optical apparatus and projection exposure apparatus: An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle... Agent: Oliff & Berridge, PLC

20090122291 - Projection optical system and image projector: A projection optical system for projecting an image of an image display element, includes a holder for holding a lens and disposed at an image-display-element side of a stop, wherein at least a portion of an image-display-element side face of the holder or at least a portion of an image-display-element... Agent: Fitzpatrick Cella Harper & Scinto

20090122293 - Stage device, exposure apparatus, and method of manufacturing devices: A stage device includes a stage and a frame-shaped member that move in three degrees of freedom directions in a two-dimensional plane while floating above a surface plate. The stage also holds an object. First fixed elements and second fixed elements are fitted to the frame-shaped member, and cooperate with... Agent: Oliff & Berridge, PLC

20090115977 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member... Agent: Oliff & Berridge, PLC

20090115980 - Illumination system and filter system: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090115979 - Immersion lithography apparatus: A sampler, sample holder and an immersion lithographic apparatus comprising a sampler is disclosed. In an embodiment, a sampler is provided to collect particles in an immersion system of a lithographic apparatus. The sampler comprises a holder base having a collector surface. The collector surface is configured to collect and... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090115978 - Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate: A method for treating a substrate before exposing the substrate to which a resist is applied, includes, rinsing the substrate to which a resist is applied, and holding the rinsed substrate in an atmosphere. The atmosphere substantially contains no moisture until conveying the substrate to an exposure apparatus.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090115981 - Drawing point data obtainment method and apparatus and drawing method and apparatus: A drawing point data obtainment method is a method for obtaining drawing point data that is used when an image is drawn on a drawing object by relatively moving a drawing point formation area, in which a drawing point is formed based on the drawing point data, with respect to... Agent: Sughrue Mion, PLLC

20090115983 - Immersion lithography apparatus: An immersion lithographic apparatus is disclosed that includes a detector to measure a distance between a substrate support structure and/or a substrate and a fluid handling system and/or to detect when an item is present between the fluid handling system and a top surface of the substrate and/or substrate support... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090115984 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090115982 - Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method: On the +X and −X sides of a projection unit, a plurality of Z heads are arranged in parallel to the X-axis, by a predetermined distance half or less than half the effective width of the Y scale so that two Z heads each constantly form a pair and face... Agent: Oliff & Berridge, PLC

20090115985 - Position detector, position detection method, exposure apparatus, and method of manufacturing device: A position detector (16), configured to detect a position of a mark on an object to be detected, comprises an image pickup unit (34), an optical system, a noise obtaining unit (36) and a correction unit (38). The image pickup unit picks up an image of the object to be... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090115986 - Microlithography projection objective: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.... Agent: Fish & Richardson PC

20090115988 - Exposure apparatus and device fabrication method: The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a driving unit configured to drive a plurality of optical elements which form the projection optical system so as to adjust an imaging state of light which... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing

20090115987 - Position measurement system and lithographic apparatus: A measurement system includes a sensor arranged to co-operate with a first pattern arranged on a structure of the measurement system to determine a first position quantity of the sensor relative to the structure, and arranged to co-operate with a second pattern arranged on the structure to determine a second... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090115990 - Illumination optical apparatus, exposure apparatus, and device manufacturing method: An illumination optical system with a simple structure reduces the effects of illumination variations caused by a spatial coherency of illumination light, while maintaining a high usage efficiency of illumination light that is emitted in pulses. The illumination optical system illuminates an irradiated plane with pulse-emitted illumination light and includes... Agent: Miles & Stockbridge PC

20090115991 - Illumination system of a microlithographic projection exposure apparatus: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus, such as a an illumination system with which it is possible to set up an illumination angle-dependent polarisation state of the projection light incident on a mask, as well as related systems, components and methods.... Agent: Fish & Richardson PC

20090115989 - Lighting optical system, exposure system, and exposure method: There is disclosed an illumination optical apparatus which illuminates a surface to be illuminated on the basis of light from a light source, comprising, a first polarizing member arranged as rotatable around an optical axis of the illumination optical apparatus or around an axis substantially parallel to the optical axis;... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP