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Photocopying March listing by industry category 03/09

20090079948 - Developing method and developing apparatus: A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing solution or... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090079949 - Lithographic apparatus and device manufacturing method: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090079950 - Exposure apparatus, exposure method, and method for producing device: A liquid immersion exposure apparatus includes an optical member through which an exposure beam passes, a flow passage in which a liquid flows, the flow passage being in fluidic communication with a space between the optical member and an object opposite to the optical member, and an opening at which... Agent: Oliff & Berridge, PLC

20090079951 - Lithographic apparatus and device manufacturing method: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090079952 - Six-mirror euv projection system with low incidence angles: The invention relates to a projection system for guiding light with wavelengths ≦193 nm from an object plane to an image plane, comprising at least a first mirror (M1), a second mirror (M2), a third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6)... Agent: Fish & Richardson PC

20090079953 - Use of perfluoroalkanes in vacuum ultraviolet applications: This invention concerns liquid perfluoro-n-alkanes for use in applications demanding high transparency at UV wavelengths ranging from about 150 to 165 nm, especially 157 nm. Uses include optical couplants, optical cements, optical elements, optical inspection media for photolithography at 157 nm exposure wavelength.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20090073394 - Substrate processing apparatus with multi-speed drying: After a substrate is cleaned, a liquid supply nozzle moves outward from above the center of the substrate while discharging a rinse liquid with the substrate rotated. In this case, a drying region where no rinse liquid exists expands on the substrate. When the liquid supply nozzle moves to above... Agent: Townsend And Townsend And Crew, LLP

20090073399 - Exposure apparatus: An exposure apparatus of the present invention is configured to flow liquid in an area between an optical element 5 of a projection optical system and a wafer and to expose a pattern on a reticle onto the wafer via the projection optical system. The exposure apparatus includes a supply... Agent: Morgan & Finnegan, L.L.P.

20090073397 - Laminar flow gas curtains for lithographic applications: Laminar flow gas curtains can be used in a lithographic apparatus to maintain a gaseous purity level within one or more components of the lithographic apparatus such as, for example, a wafer stage and a wafer handler system. In an embodiment, a method to design a flow conditioning channel for... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090073395 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090073396 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090073398 - Microlithographic projection exposure apparatus: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an... Agent: Fish & Richardson PC

20090073400 - Device and method for manufacturing a particulate filter with regularly spaced micropores: Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize... Agent: Winstead PC

20090073407 - Exposure apparatus and exposure method: An exposure apparatus illuminates a pattern on a first object with an illuminating beam to expose an area to be exposed on a second object with a pattern image. The exposure apparatus includes a scanning apparatus that scans the first object in a prescribed scanning direction with the illuminating beam,... Agent: Miles & Stockbridge PC

20090073408 - Lithographic apparatus and device manufacturing method: Lithographic Apparatus and Device Manufacturing Method A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090073402 - Lithographic apparatus and exposure method: A lithographic apparatus includes a control unit arranged to perform a first position measurement of the patterning device, apply an asymmetric acceleration profile to the support supporting the patterning device, perform a second position measurement of the patterning device, determine a slip characteristic of the pattering device based on the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090073401 - Lithographic apparatus with rotation filter device: A lithographic apparatus including a filter device is disclosed. The filter device has a plurality of foils attached to a holder which is able to rotate around a rotation axis. The foils are arranged substantially parallel to the rotation axis. The foils comprise a uni-directional carbon-fiber composite material selected from... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090073406 - Marker structure, mask pattern, alignment method, and lithographic method and apparatus: A mask pattern for imaging a marker structure on a substrate with a lithographic apparatus, the marker structure being configured to determine optical alignment or overlay, includes constituent parts to define the marker structure. The constituent parts include a plurality of segments, each segment having substantially a size of a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090073403 - Methods of characterizing similarity or consistency in a set of entities: A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation coefficient for each of a plurality of... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090073405 - Movable body drive method and movable body drive system, and pattern formation method and pattern formation apparatus: A first positional information of a wafer stage is measured using an interferometer system such as, for example, a Z interferometer. At the same time, a second positional information of the wafer stage is measured using a surface position measurement system such as, for example, two Z heads. Moving average... Agent: Oliff & Berridge, PLC

20090073404 - Variable slit device, illumination device, exposure apparatus, exposure method, and device manufacturing method: A variable slit device for forming illumination light having a slit shape extending in a longitudinal direction and a lateral direction. A first light intensity setting unit sets a first light intensity distribution, which is the light intensity distribution of a peripheral portion, which is one of a pair of... Agent: Staas & Halsey LLP

20090073409 - Exposure system and method of manufacturing a semiconductor device: In an exposure system and semiconductor device manufacturing method relating to the present invention, an image of spatial image mark body through a reduction projection lens is projected onto a spatial image projection plate arranged on a wafer stage by irradiating the spatial image mark body arranged on a reticle... Agent: Mcdermott Will & Emery LLP

20090073410 - Illumination system particularly for microlithography: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and... Agent: Fish & Richardson PC

20090073411 - Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method: An illumination optical system which illuminates a surface to be illuminated on the basis of light from a light source has a first optical path in which a diffractive optical element can be arranged at a first position thereof; a second optical path in which a spatial light modulator with... Agent: Miles & Stockbridge PC

20090073412 - Off-axis objectives with rotatable optical element: An objective and a method for operating an objective, in particular a projection objective or an illumination objective for microlithography for imaging a reticle onto a wafer, with a plurality of optical elements that are arranged along a ray path, wherein at least one optical element of a first kind... Agent: Sughrue Mion, PLLC

20090073414 - Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.... Agent: Oliff & Berridge, PLC

20090073413 - Write-pattern determination for maskless lithography: A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the... Agent: Wilson Sonsini Goodrich & Rosati

20090073415 - Apparatus and method for mounting pellicle: An apparatus and a method for mounting a pellicle includes a pellicle compression plate formed to apply a plurality of particular pressures to a plurality of points or areas of a region of the reticle where a pellicle frame of the pellicle contacts a reticle.... Agent: Harness, Dickey & Pierce, P.L.C

20090066923 - Exposure apparatus and device manufacturing method: An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes a first stage which is movable relative to the projection optical system, a second stage which is movable relative to the projection optical system, and... Agent: Oliff & Berridge, PLC

20090066922 - Exposure method and apparatus, maintenance method and device manufacturing method: An exposure method includes holding a substrate held by a substrate holder on a substrate stage moving on an image plane side of a projection optical system; forming an immersion area the image plane side of the projection optical system by using a liquid supplied from a liquid supplying mechanism;... Agent: Oliff & Berridge, PLC

20090066924 - Lithographic apparatus, device manufacturing method, and use of a radiation collector: A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090066921 - Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method: A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090066926 - Image forming method and apparatus: An acousto-optic cell is used in a method and device for patterning a workpiece, for exposing a radiation sensitive layer on a workpiece such as a mask or a device substrate. The acousto-optic cell includes an array of transducers. The transducers may supply columns of ultrasound to the cell. They... Agent: Haynes Beffel & Wolfeld LLP

20090066925 - Measurement apparatus, exposure apparatus, and device fabrication method: The present invention provides a measurement apparatus comprising a first polarization control unit configured to control a polarization state of light which enters an optical system to be measured to at least two different polarization states, a wavefront splitting unit which is inserted between the first polarization control unit and... Agent: Morgan & Finnegan, L.L.P.

20090066927 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus comprises an illumination optical system configured to illuminate an original with exposure light from an exposure light source, a projection optical system configured to project a pattern of the original onto a substrate, and a measuring unit configured to measure a relative position between the original and... Agent: Morgan & Finnegan, L.L.P.

20090066928 - Alignment apparatus, exposure apparatus, and device manufacturing method using exposure apparatus: An alignment apparatus includes driving means having a movable element and a stator, a measurement unit which measures a position of a moving member moved by the driving means using measurement light, and a discharging unit to discharge gas existing in an optical path of the measurement light. The discharging... Agent: Cowan Liebowitz & Latman P.C. John J Torrente

20090059187 - Coating and developing apparatus, coating and developing method, and storage medium: Disclosed herein is a coating and developing apparatus 1 whose decreases in substrate-conveying accuracy can be suppressed. A processing block S2 of the coating and developing apparatus 1 includes multiple resist-film forming blocks G2, G3, and a developing block G1. A conveyance element 12 for substrate loading into the processing... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090059188 - Exposure apparatus: An exposure apparatus includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages which can be swapped between the alignment station and the exposure station. A first blowing unit blows temperature-adjusted gas toward the alignment station, and... Agent: Fitzpatrick Cella Harper & Scinto

20090059192 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090059190 - Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method: The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090059189 - Pellicle for use in a microlithographic exposure apparatus: A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle (34; 134; 234). This ensures smaller variations of the transmittance over a broad range of angles of incidence, as it... Agent: Fish & Richardson PC

20090059191 - Support plate, exposure apparatus having the support plate, and a device manufacturing method using the exposure apparatus: An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. The support plate includes a liquid-repellent structure... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090059193 - Image production apparatus: Disclosed herein is an image production apparatus, including a light source; an optical modulation apparatus of the one-dimensional type; and a projection optical system including a scanning optical system; the scanning optical system including a main scanning optical system, and a sub scanning optical system for carrying out scanning in... Agent: Robert J. Depke Lewis T. Steadman

20090059195 - Exposure device with mechanism for forming alignment marks and exposure process conducted by the same: The present invention relates to an exposure device for transferring circuit patterns of a mask to a roll-film-shaped object. The exposure device includes a supply reel rotation section that is constituted by a supply reel around which the object is wound and that feeds the object by rotating the supply... Agent: Berenato, White & Stavish, LLC

20090059194 - Position measurement system, exposure apparatus, position measurement method, exposure method and device manufacturing method, and tool and measurement method: A first grating is placed on the upper surface of wafer stage WST, and on the +Y side of the first grating, a calibration area is arranged where an auxiliary grating is formed. By performing a predetermined calibration process using the calibration area, such as calibration process related to position... Agent: Oliff & Berridge, PLC

20090059196 - Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (euv) lithography processes: Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes are described. In one embodiment, a method comprises providing a semiconductor lithography tool employing an EUV source optically coupled to a collector within a vacuum chamber, the collector providing an intermediate focus... Agent: Fulbright & Jaworski L.L.P.

20090059197 - Exposure apparatus and method of exposing a semiconductor substrate: An exposure apparatus includes a light source adapted to emit light, a photomask in a path of the light between the light source and a semiconductor substrate, the photomask being in a mask plane (MP) and having patterns to be transcribed onto the semiconductor substrate, and a spatial light modulator... Agent: Lee & Morse, P.C.

20090059198 - Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method: A controller uses two Z heads, which are positioned above a reflection surface installed on the ±X ends of the upper surf ace of a table, to measure the height and tilt of the table. According to the XY position of the table, the Z heads to be used are... Agent: Oliff & Berridge, PLC

20090059199 - Method of loading a substrate on a substrate table and lithographic apparatus and device manufacturing method: The invention relates to a method of loading a first object on a second object in a lithographic apparatus. The method includes: a) loading the first object on the second object, b) waiting a predetermined time interval and c) performing a relaxation action. The first object may be a substrate... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090059200 - Methods and apparatus for manufacturing display medium, and display medium: A manufacturing apparatus for manufacturing a display medium, the manufacturing apparatus including an image data storing unit that stores image data for text or image to be displayed on the display medium; an electrode pattern generating unit that generates an electrode pattern based on the image data stored in the... Agent: Baker Botts LLP C/o Intellectual Property Department