Photocopying inventions 11/08

20080291406 - Assembly comprising a radiation source, a reflector and a contaminant barrier: An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080291410 - Exposure apparatus and method for manufacturing device: An immersion exposure apparatus includes an optical member, a supply outlet that supplies a liquid to a space between an upper surface of the optical member and a movable object, and an annular member at least a portion of which is arranged around the optical member, the space between the... Agent: Oliff & Berridge, PLC

20080291409 - Immersion exposure technique: It is an object of this invention to provide an exposure technique which uses immersion method and is highly practical. For example, an exposure apparatus includes a substrate stage which holds and moves a substrate, and a supply unit which has a supply nozzle and supplies a liquid to the... Agent: Fitzpatrick Cella Harper & Scinto

20080291407 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080291408 - Projection optical system, exposing method, exposure apparatus, and device fabricating method: A projection optical system projects an image of a first surface to a second surface through a liquid. The projection optical system comprises an optical element, wherein the first surface side contacts a gas and the second surface side contacts the liquid. The optical element has an incident surface, which... Agent: Oliff & Berridge, PLC

20080291411 - Devices and methods for reducing residual reticle chucking forces: Devices and methods are disclosed for holding an object, particularly a planar object. An exemplary device has a chuck and pressure-changing device. The chuck has an object-mounting surface and a deformable membrane coupled to the object-mounting surface such that conformational changes in the membrane produce corresponding changes in the object-mounting... Agent: Klarquist Sparkman, LLP

20080291412 - Lithographic apparatus and method: A lithographic method is provided that includes using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a substrate. The illumination mode is adjusted... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20080291414 - Exposure apparatus and device manufacturing method: An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured to measure a position of a surface of the substrate in an optical axis direction of the projection optical system; and... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080291413 - Lithographic apparatus having encoder type position sensor system: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080291415 - Pattern formation method and pattern formation apparatus, exposure method and exposure apparatus, and device manufacturing method: In a measurement zone that is spaced apart in a Y-axis direction from an exposure zone that is located immediately below a projection unit, a detection area of an alignment system is moved in the Y-axis direction and a plurality of marks are sequentially detected, and therefore a movement distance... Agent: Oliff & Berridge, PLC

20080291416 - Optical member-holding apparatus, method for adjusting position of optical member, and exposure apparatus: There is provided is an optical member-holding apparatus which can hold a plurality of optical members of two different optical systems, even when the optical members exist in a common barrel in a mixed manner, such that the relative positions between the optical members can be easily adjusted; and which... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080291417 - Laser beam conditioning system comprising multiple optical paths allowing for dose control: A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20080291419 - Projection objective for immersion lithography: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image... Agent: Fish & Richardson PC

20080291421 - Exposure apparatus, exposure method, and device fabrication method: The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate includes a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through... Agent: Morgan & Finnegan, L.L.P.

20080291420 - Method and device for image measurement, exposure apparatus, substrate for image measurement, and device manufacturing method: An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080291422 - Light attenuating filter for correcting field dependent ellipticity and uniformity: Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20080291418 - Method and apparatus for maskless photolithography: A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional or three dimensional structure. In an embodiment,... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association

20080284989 - Developing method and developing unit: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that... Agent: Rader Fishman & Grauer PLLC

20080284990 - Cleaning device, a lithographic apparatus and a lithographic cleaning method: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080284991 - Exposure apparatus, immersion system, exposing method, and device fabricating method: An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a liquid immersion member, which has a liquid contact surface that includes a liquid recovery area; and a porous member, which are disposed at a first side of the liquid contact surface; wherein, the... Agent: Oliff & Berridge, PLC

20080284992 - Exposures system including chemical and particulate filters containing chemically modified carbon nanotube structures: An exposure system for exposing a photoresist layer on a top surface of a wafer to light. The exposure system including: an environment chamber containing a light source, one or more focusing lenses, a mask holder, a slit and a wafer stage, the light source, all aligned to an optical... Agent: Schmeiser, Olsen & Watts

20080284995 - Lithographic apparatus and substrate edge seal: A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080284993 - Reducing contamination in immersion lithography: A wafer chuck assembly includes a first chuck section configured to hold a semiconductor wafer on a support surface thereof, and a second chuck section removably attached to the first chuck section. The first chuck section has a gap therein, the gap located adjacent an outer edge of the wafer,... Agent: Cantor Colburn LLP - IBM Fishkill

20080284994 - Reducing contamination in immersion lithography: A method for reducing contamination in immersion lithography includes retaining a semiconductor wafer on a support surface of a wafer chuck, the wafer chuck having a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein; and... Agent: Cantor Colburn LLP - IBM Fishkill

20080284999 - Device for transferring structures which are provided in a mask onto a substrate: m

20080284997 - Exposure apparatus: A scanning exposure apparatus projects a pattern of an original onto a substrate via a projection optical system and shifts the original and the substrate in synchronization with each other with respect to an optical axis of the projection optical system so as to transfer the pattern of the original... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080284998 - Lithographic apparatus and method of controlling: A system and method for controlling exposure in a lithographic apparatus are disclosed. The system can have adjustable optical elements capable of being decentered to adjust an illumination distribution. Embodiments include a lithographic apparatus structure configured to allow for spatial dose control, for example as a function of X and... Agent: Jones Day

20080284996 - Optical compensation devices, systems, and methods: Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate. A first patterned region is formed on the substrate, and a second patterned region is formed on the substrate that is proximate to the first... Agent: Schwegman, Lundberg & Woessner, P.A.

20080285000 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus is configured to provide the radiation beam with a radiation distribution in a pupil plane of an illumination system of the apparatus, the intensity of the radiation... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080285001 - Lithography aperture lenses, illumination systems, and methods: Lithography aperture lenses, illumination systems, and methods are disclosed. In a preferred embodiment, a lens includes a substantially transparent material and an electro-optical material disposed proximate the substantially transparent material, wherein the lens is a lens for an illuminator of a lithography system.... Agent: Slater & Matsil LLP

20080285002 - Projection objective for semiconductor lithography: Objectives, such as projection objectives for semiconductor lithography, are disclosed. An objective generally has an optical axis and optical elements mounted in an objective housing. Projection exposure apparatuses having an objective are also disclosed. In addition, guides and adjusting systems for an optical element in an objective are disclosed. Further,... Agent: Fish & Richardson PC

20080285003 - Linear motor driven automatic reticle blind: A reticle blind which is capable of being opened and closed at a relatively high speed and which does not cause mechanical disturbances or reaction forces. The reticle blind includes two reticle blind assemblies designed to cooperate with one another to control the passing of a laser beam of an... Agent: Roeder & Broder LLP

20080285004 - Monolithic, non-contact six degree-of-freedom stage apparatus: Methods and apparatus for controlling a stage assembly in up to six degrees of freedom using actuators which each allow for forces to be generated in a horizontal direction and a vertical direction are disclosed. According to one aspect of the present invention, a stage apparatus includes a stage assembly... Agent: Aka Chan LLP

20080285005 - System and method for measuring and mapping a sideforce for a mover: A mover (344) that moves a stage (238) along a first axis includes a magnetic component (354), a conductor component (356), and a sensor (366). The magnetic component (354) includes one or more magnets (354D) that are surrounded by a magnetic field. The conductor component (356) is positioned near the... Agent: Roeder & Broder LLP

20080285006 - Method of manfacturing semiconductor device: To attain a method of manufacturing a semiconductor device using an exposure system capable of obtaining preferable resolution while an adverse effect caused by a reduction in depth-of-focus margin is prevented, there is provided a method of manufacturing a semiconductor device comprising exposing a first portion of a wafer with... Agent: Young & Thompson

20080278695 - Exposing method, exposure apparatus, and device fabricating method: An exposure apparatus comprises: a first detection apparatus, which detects the temperature of a liquid after the liquid contacts a prescribed object; and a processing apparatus that detects the relationship between the temperature of the liquid and the temperature of the object based on the detection result of the first... Agent: Oliff & Berridge, PLC

20080278696 - Lithographic apparatus: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080278697 - Lithographic apparatus and device manufacturing method: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080278698 - Lithographic apparatus and method: A lithographic method is provided and comprises using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a plurality of substrates. The illumination mode... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080278699 - Method for distortion correction in a microlithographic projection exposure apparatus: For the correction of anamorphism in the case of a projection lens of an EUV projection exposure apparatus for wafers it is proposed to tilt the reticle bearing the pattern to be projected and preferably also the wafer by a small angle about an axis that is perpendicular to the... Agent: Factor & Lake, Ltd

20080278701 - Defocus determination method using sub-resolution feature (srf) printing: The present application is directed to apparatus and methods for determining a magnitude of defocus and a direction of defocus for a photolithography process. A sub-resolution feature on a reticle which is not printed on a wafer at the best focus offset, but is formed on a wafer at some... Agent: Texas Instruments Incorporated

20080278703 - Immersion exposure apparatus and method of manufacturing a semiconductor device: An immersion exposure apparatus includes a placement unit on which a substrate is to be placed, the substrate including a body to be processed and a resist film on the body, a projection optical system including a projection lens, a liquid supply unit including an immersion nozzle, a measurement unit... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080278702 - Lithographic apparatus and sensor calibration method: A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080278700 - Sub-resolution assist devices and methods: Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive substrate having a sub-resolution assist device that further includes a first optical attenuation region and a spaced-apart second optical attenuation region, and an optically transmissive... Agent: Schwegman, Lundberg & Woessner, P.A.

20080278704 - Illumination system for a projection exposure apparatus with wavelengths less than or equal to 193 nm: The disclosure relates to illumination systems for projection exposure apparatuses, projection exposure apparatus, and related components, systems and methods. The illumination systems can be configured to be used with wavelengths less than 193 nm.... Agent: Fish & Richardson PC

20080278705 - Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover... Agent: Roeder & Broder LLP

20080273181 - Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080273180 - Lithographic apparatus: A projection system suitable for use in a lithographic apparatus, the projection system including a transmissive optical element and a thermal profile corrector configured to change a thermal profile of the transmissive optical element, the thermal profile corrector including a transfer member and a thermal profile conditioner, the transfer member... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080273182 - Lithographic apparatus and device manufacturing method: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080273183 - Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus: The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080273184 - Apparatus and method for referential position measurement and pattern-forming apparatus: A digital exposure apparatus for forming a pattern on a topside surface of a substrate has an alignment unit, which detects a position of the substrate from image data obtained through a camera from a reference mark provided on the topside surface of the substrate. The alignment unit further has... Agent: Young & Thompson

20080273186 - Illumination system, in particular for a projection exposure machine in semiconductor lithography: An illumination system is provided with a light produced by a light source, with an optical axis and with optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one optical element for producing a pupil distribution of the light beam, and having a homogenizing... Agent: Gray Robinson, P.A.

20080273187 - Lens structure, optical system having the same, and lithography method using the optical system: Disclosed are a lens structure, an optical system including the same, and a lithography method using the optical system. The disclosed lens structure includes: a lens that has a substantially semispherical shape and includes a protruding portion having a truncated cone shape that is provided on its aspherical surface; a... Agent: Venable LLP

20080273185 - Optical system, exposing apparatus and exposing method: An optical system includes a reflecting mirror to which rays are incident across a relatively wide incidence angle range, while well suppressing a change in a polarization state in an optical path of a beam incident substantially as linearly polarized light. The optical system has a first deflecting plane mirror... Agent: Oliff & Berridge, PLC

20080273188 - Device arranged to measure a quantity relating to radiation and lithographic apparatus: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080273189 - Sheet body holding mechanism and lithography apparatus using same: Highly accurate lithography is performed by maintaining planarity without generating a suction mark on a sheet body. Since a counterbore for storing the head of a screw member for fixing a suction plate on a supporting table communicates with the atmosphere through a long hole and communicating path, inside of... Agent: Sughrue Mion, PLLC