Photocopying inventions 03/08

20080068571 - Immersion exposure apparatus and immersion exposure method, and device manufacturing method: An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined region including a first region including a position facing the optical member and a second region different from the first... Agent: Oliff & Berridge, PLC

20080068570 - Lithographic apparatus and device manufacturing method: A path which a substrate should take under the projection system during immersion lithography imaging of a plurality of dies on the top surface of the substrate is disclosed.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080068569 - Lithographic system, device manufacturing method, and mask optimization method: A lithographic system comprises an array of individually controllable elements, a projection system, datapath hardware, and a conversion system. The array of individually controllable elements is capable of modulating a radiation beam. The projection system is configured to project the modulated radiation beam onto a target portion of a substrate.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20080068579 - Aperture unit and exposure system including the same, and method for replacing apertures of the aperture unit: Provided are an aperture unit, an exposure system including the aperture unit, and a method for replacing an aperture of the aperture unit. The aperture unit rotates a revolver on which a plurality of apertures is installed, in order to selectively dispose an aperture in an optical path and convert... Agent: Marger Johnson & Mccollom, P.C.

20080068578 - Projection aligner including correction filters: A projection aligner includes an illumination optical system which irradiates a mask pattern with an exposure light, an exposure optical system which irradiates a substrate on a stage with the exposure light passed by the illumination optical system, and a correction optical system including two correction filters for correcting the... Agent: Hayes Soloway P.C.

20080068580 - Substrate-retaining unit: A wafer chuck includes a plurality of supporting pins protruding upward. The rigidity of the supporting pins in the horizontal direction is lower than that in the vertical direction in a central area of the wafer chuck. The supporting pins deform in response to a force for returning a central... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080068567 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus has a projection optical system. The projection optical system has a first optical element closest to an image plane thereof and a second optical element which is second closest to the image plane with respect to the first optical element. The first optical element has a lower... Agent: Oliff & Berridge, PLC

20080068568 - Projection optical device and exposure apparatus: A projection optical device includes a projection optical system which projects an image of a pattern, a support device having a flexible structure to support the projection optical system, and a positioning device having an actuator to position the projection optical system. The projection optical device can include a frame... Agent: Oliff & Berridge, PLC

20080068572 - Exposure method and apparatus, and method for fabricating device: An exposure method and apparatus simultaneously transfer patterns with various pitches with high resolution. On the pupil surface of an illumination system, nine areas are set. The nine areas are a first area including the optical axis, four second areas each smaller than the first area and arranged along a... Agent: Oliff & Berridge, PLC

20080068574 - Helical optical pulse stretcher: A pulse stretcher includes a single pass pulse stretcher. An optical system is arranged around the single pass pulse stretcher. A beam enters the single pass stretcher and is reflected in a helical path using the optical system for multiple passes through the single pass pulse stretcher. The single pass... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20080068573 - Projection optical system and method for photolithography and exposure apparatus and method using same: A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate using a projection system and has a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection... Agent: Oliff & Berridge, PLC

20080068575 - Euv light source, euv exposure equipment, and semiconductor device manufacturing method: A liquid in which fine solid Sn particles are dispersed in a resin is accommodated inside the heated tank 4. The resin pressurized by a pressurizing pump is conducted to a nozzle 1, so that a liquid-form resin is caused to jet from the tip end of the nozzle 1... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080068576 - Projection optical system and method for photolithography and exposure apparatus and method using same: A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image plane is adjustably positioned such... Agent: Oliff & Berridge, PLC

20080068577 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus and method are disclosed in which measures are taken to account for dissolution of resist components, such as photo-acids or photo-acid generators, in immersion liquid. This may involve ensuring that each relevant part of the substrate is covered by liquid the same amount of time and/or... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080068581 - Positioning stage, bump forming apparatus equipped with the positioning stage, and bump forming method performed using the positioning stage: A positioning stage that can prevent an excessive force from being imparted to a positioned wafer, a bump forming apparatus equipped with such a positioning stage, and a bump forming method performed using such a positioning stage are provided. A biasing member that biases a wafer towards a positioning member... Agent: Ostrolenk Faber Gerb & Soffen

20080068582 - Apparatus for supporting a wafer, apparatus for exposing a wafer and method of supporting a wafer: In an apparatus for supporting a wafer, the apparatus may remove particles thereon. The apparatus may include a conductive support configured to support the wafer, and a power source electrically connected to the conductive support, the power source configured to provide at least one current to the conductive support to... Agent: Harness, Dickey & Pierce, P.L.C

20080062388 - Lithographic apparatus with gas bearing supply mechanism and device manufacturing method: A lithographic apparatus is disclosed that has a track comprising a plurality of gas outflow openings positioned along the track. A gas conduit is configured to feed pressurized gas to the gas outflow openings to form a gas bearing configured to moveably bear an object along the track. Further, a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080062390 - Customizing equipment for individualized contact lenses: A customizing equipment for individualized contact lenses comprises an uniform illumination system, a gray image generation system, a projection optical system, a stage system and an alignment system, among which the uniform illumination system generates uniform parallel illuminative light, which generates gray images through the gray image generator controlled by... Agent: Lau & Associates, LLC Michael N. Lau

20080062392 - Exposure apparatus and device manufacturing method: An exposure apparatus includes a projection optical system, an original stage having a first reference mark, a substrate stage, and a measurement instrument configured to measure first image properties of a mark formed on the original with the projection optical system, via the original and the projection optical system. The... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080062391 - Exposure apparatus and method of manufacturing device: An exposure apparatus which exposes a substrate to light is disclosed. The exposure apparatus for exposing a substrate to light, the apparatus comprises: a projection optical system configured to project light from a reticle onto the substrate, the projection optical system including at least one optical element driven to adjust... Agent: Fitzpatrick Cella Harper & Scinto

20080062393 - Lithographic apparatus and device manufacturing method: A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080062395 - Exposure apparatus: With respect to each of a plurality of shots on a substrate, a line or surface is calculated which approximates a plurality of positions of the surface of the substrate detected by a detector with respect to a plurality of places, and the difference between the position of the surface... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080062394 - Lithographic apparatus and device manufacturing method: A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged next to the operation area, a second coil assembly arranged at an opposite side of the operation area, one or... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080062397 - Photolithography apparatus having mirror for correcting aberrations in optical illumination system and mirror having aberration correcting part: A photolithography apparatus includes an optical illumination system. The optical illumination system includes a light source, an illumination system, a photomask, and a projection system. The light source generates light. The illumination system transmits the light generated by the light source. The photomask receives the light transmitted by the illumination... Agent: F. Chau & Associates, LLC

20080062398 - Pattern writing apparatus and pattern writing method: Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror group of a DMD is directed and light is applied to a plurality of strip regions partially overlapping in a... Agent: Mcdermott Will & Emery LLP

20080062399 - Image forming apparatus and control method thereof: An image forming apparatus is capable of controlling an exposure in accordance with sensitivity variations of a photosensitive body. An actual exposure position (Pr) sometimes precedes an exposure position (Pc) recognized based on the count value (C). In this case, the correction value (Dc) of the exposure position (Pc) recognized... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080062389 - Method and apparatus for personalization of semiconductor: A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done... Agent: Harness, Dickey & Pierce, P.L.C

20080062396 - Auto focus system: Embodiments relate to a wafer stage moved in all directions by means of an actuator. A wafer holder installed on the upper side of the wafer stage mounts a wafer on the wafer stage. An auto focus sensor block measures the focus simultaneously with exposure of the wafer using auto... Agent: Sherr & Nourse, PLLC

20080055574 - Exposure apparatus and device manufacturing method: An exposure apparatus includes a projection optical system configured to project light from an original, wherein the apparatus exposes a substrate to light through liquid filled in a gap between the last surface of the projection optical system and the substrate; and a detecting device configured to detect a droplet... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080055575 - Exposure apparatus, device manufacturing method, cleaning method, and cleaning member: An exposure apparatus is provided with a first member that can form liquid immersion with a first liquid so as to fill an optical path for exposure light with the first liquid, a second member that can form liquid immersion with a second liquid in a position distanced from the... Agent: Oliff & Berridge, PLC

20080055577 - Lithographic apparatus and method: According to an aspect of the present invention, there is provided a method of projecting a pattern onto a substrate. The method includes rotating a mask having a plurality of patterns provided thereon, to select a pattern to be projected onto a substrate, using the selected pattern to impart a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080055576 - Lithographic apparatus, and motor cooling device: A lithographic device includes a cooling device for removing heat from a motor. The cooling device has a cooling element provided in thermal contact with at least part of the motor. The cooling device further has a cooling duct assembly with a supply duct to supply a cooling fluid to... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080055579 - Optical power modulation at high frequency: An apparatus for providing a pulsed radiation beam has a radiation source providing a pulsed radiation beam at a constant pulse repetition frequency. A beam deflector in the path of the pulsed radiation beam is actuable to redirect the pulsed radiation beam cyclically towards each of a plurality of beam... Agent: Corning Incorporated

20080055580 - Subsystem of an illumination system of a microlithographic projection exposure apparatus: In general, in one aspect, the disclosure features an illumination system for a microlithographic projection exposure apparatus configured so that during operation the illumination system illuminates a reticle plane of the microlithographic projection exposure apparatus with light of a desired polarization distribution. The illumination system includes a first polarization-influencing optical... Agent: Fish & Richardson PC

20080055578 - Roll printer with decomposed raster scan and x-y distortion correction: A reflecting Offner-like optical system is described which is suitable for use in a photolithographic system in which the magnification is approximately 1 to 1, and where the format is flexible. The primary mirror is split into two halves, which are movable with respect to each other. Magnification is slightly... Agent: Theodore R. Whitney

20080055581 - Devices and methods for pattern generation by ink lithography: The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions and including relief and recess features with variable height, depth or height and depth. Composite patterning devices... Agent: Greenlee Winner And Sullivan P C