Photocopying inventions 11/07

20070273856 - Apparatus and methods for inhibiting immersion liquid from flowing below a substrate: A substrate stage is provided with an immersion liquid collection member that surrounds at least an alignment feature of the substrate stage used to align the substrate on the stage by engaging alignment structure of the substrate. The collection member is located at least partly below the periphery of the... Agent: Oliff & Berridge, PLC

20070273861 - Stage device, exposure apparatus, and microdevice manufacturing method: A stage device including a base, a stage movable portion being movable along said base without contact thereto, an interferometer configured to measure a position of the stage movable portion, at least one of a piping element and a wiring element connected to the stage movable portion, and at least... Agent: Fitzpatrick Cella Harper & Scinto

20070273850 - Extreme ultra violet lithography apparatus: Lithography apparatus comprises a lithography tool housed in a first chamber, and a source of radiation at or below ultra violet wavelengths housed in a second chamber connected to the first chamber to enable radiation generated by the source to be supplied to the tool. A cryogenic vacuum pump is... Agent: The Boc Group, Inc.

20070273851 - Lithographic apparatus and method of reducing thermal distortion: A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the patterning device and a controller configured to effect an optical correction in the apparatus corresponding to the desired thermal... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070273852 - Exposure apparatus, exposure method, device manufacturing method, and system: An exposure apparatus is equipped with a laser unit that emits a laser beam, a memory that stores a first information which shows a first relation indicating a relation between a linewidth error of a pattern formed on a wafer and a spectral characteristic of the laser beam emitted from... Agent: Oliff & Berridge, PLC

20070273854 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus includes a projection optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area; and an adjusting device which adjusts a surface positional relationship between a surface of the... Agent: Oliff & Berridge, PLC

20070273853 - Lithographic apparatus and device manufacturing method: A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070273857 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: A liquid immersion exposure apparatus in which a substrate is exposed to an exposure beam, includes an optical member through which the substrate is exposed to the exposure beam, a cover member having a surface, a first holding system that detachably holds the cover member, and a second holding system... Agent: Oliff & Berridge, PLC

20070273855 - Patterning systems using protomasks including shadowing elements therein: A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking regions, and an array of shadowing elements. The transparent substrate may have first and second opposing surfaces, and the pattern of radiation... Agent: Myers Bigel Sibley & Sajovec

20070273858 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus includes: an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and... Agent: Oliff & Berridge, PLC

20070273859 - Illumination optical apparatus, exposure apparatus, and device manufacturing method: An illumination optical apparatus includes a first fly-eye optical system having first optical components and a second fly-eye optical system having second optical components arranged in one-to-one correspondence to the first optical components. An illumination surface is illuminated with light from each of the second optical components in an overlapping... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070273860 - Movable-body apparatus, exposure apparatus and methods comprising same, and device-manufacturing methods: Movable-body apparatus, notably configured as stages, are disclosed that include at least one movable body and at least one respective actuator. The actuator drives the movable body in the direction of at least one axis in a predetermined plane. A waste-heat member is situated in a non-contacting manner with the... Agent: Klarquist Sparkman, LLP

20070268467 - Exposure apparatus and semiconductor device manufacturing method: According to an aspect of the invention, there is provided an exposure apparatus including a chemical filter disposed in an air conditioning system to reduce a concentration of impurities in a gas, an optical component arranged to be exposed to the gas on a downstream side of the chemical filter,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070268466 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070268469 - Apparatus and method for particle monitoring in immersion lithography: The present disclosure provides an immersion lithography system. The system includes an imaging lens having a front surface; a substrate stage positioned underlying the front surface of the imaging lens; an immersion fluid retaining structure having a fluid inlet and a fluid outlet, configured to hold a fluid from the... Agent: Haynes And Boone, LLP

20070268475 - System and method for controlling a stage assembly: A stage assembly (220) that moves a work piece (200) a movement step (257) includes a first stage (238), a first mover assembly (242), a second stage (240) that retains the work piece (200), and a second mover assembly (244). The first mover assembly (242) moves the first stage (238)... Agent: The Law Office Of Steven G Roeder

20070268468 - Immersion lithography fluid control system: An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates a magnetic field or an electric field such that the... Agent: Oliff & Berridge, PLC

20070268472 - Exposure apparatus and method, and device manufacturing method: An exposure apparatus for exposing a substrate, includes a substrate stage configured to hold the substrate and to move, a measuring device configured to measure a positional deviation amount of a mark on the substrate held by the substrate stage, a computing device configured to determine a linear expression for... Agent: Fitzpatrick Cella Harper & Scinto

20070268471 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070268470 - Support method and support structure of optical member, optical unit, exposure apparatus, and device manufacturing method: A spacer members is placed between a lens that is located at the lowermost end among a plurality of lenses and a parallel flat plate that is placed below the lens, and the lens is made to support by suspension the parallel flat plate by sucking a part of the... Agent: Oliff & Berridge, PLC

20070268473 - Light blocking device and exposure apparatus: A light blocking device includes a deformable member being deformable in a first direction, a plurality of light blocking plates connected to the deformable member and movable independently of each other, and an actuator configured to apply a force to the deformable member to change a light blocking region defined... Agent: Fitzpatrick Cella Harper & Scinto

20070268474 - Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices: A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical... Agent: Oliff & Berridge, PLC

20070268476 - Kinematic chucks for reticles and other planar bodies: Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a movable support surface. A proximal region of a first membrane is mounted to the support surface.... Agent: Klarquist Sparkman, LLP

20070263187 - Backside lithography and backside immersion lithography: The present disclosure relates to formation of latent images in a radiation sensitive layer applied to a substrate that is transparent to or transmissive of radiation at the exposing wavelength. In particular, it relates to so-called backside lithography, in which the final lens of an exposing system is positioned to... Agent: Haynes Beffel & Wolfeld LLP

20070263192 - Illumination system and a photolithography apparatus employing the system: An illumination system includes a device for generating an illumination distribution, the illumination distribution having a center point and an outer edge. The illumination distribution includes a first opaque portion defined about the center point, a second opaque portion defined adjacent to the outer edge, and a radiation transmittant portion... Agent: Mayback & Hoffman, P.A.

20070263182 - Exposure apparatus and device manufacturing method: Provided is an exposure apparatus that is able to prevent liquid from on a measuring part. An exposure apparatus comprises a measuring system (60), which has a first pattern (61) formed on the upper surface of a substrate stage, and a second area (S2) specified on the upper surface in... Agent: Oliff & Berridge, PLC

20070263183 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus successively exposes a plurality of shot areas on a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, and a liquid supply mechanism... Agent: Oliff & Berridge, PLC

20070263185 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, and a liquid supply mechanism which supplies the liquid onto the substrate... Agent: Oliff & Berridge, PLC

20070263186 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which has a supply flow passage through which... Agent: Oliff & Berridge, PLC

20070263184 - Immersion lithography fluid control system: An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from... Agent: Oliff & Berridge, PLC

20070263188 - Exposure apparatus and device fabrication method: An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member (70) having a supply outlet (12) that supplies a liquid (LQ) and... Agent: Oliff & Berridge, PLC

20070263196 - Exposure apparatus and device manufacturing method: A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.... Agent: Oliff & Berridge, PLC

20070263193 - Exposure apparatus and method for manufacturing device: An exposure apparatus which exposes a substrate by projecting an image of a pattern, via an projection optical system and a liquid of a liquid immersion area formed on the substrate, onto the substrate, includes a liquid supply mechanism having supply ports for supplying the liquid on both sides of... Agent: Oliff & Berridge, PLC

20070263195 - Exposure apparatus, exposure method, and method for producing device: A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.... Agent: Oliff & Berridge, PLC

20070263189 - Lithographic apparatus and device manufacturing method: Data from the piezo-electric sensors in the mounts for the projection system can be used in the control loops for other parts of the lithographic apparatus, for example the mask table, the substrate table or the air mounts for the frame bearing the projection system. Information from, for example, a... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070263190 - Method for patterning a radiation beam, patterning device for patterning a radiation beam: A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070263194 - Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same: A method of exposing a wafer to a light comprises transferring an image onto a plurality of shot areas by irradiating a projection light, each of the plurality of shot areas including at least one die area defined on the wafer on which a photoresist film is formed, and scanning... Agent: F. Chau & Associates, LLC

20070263191 - Pattern forming apparatus and pattern forming method, movable member drive system and movable member drive method, exposure apparatus and exposure method, and device manufacturing method: A partial section of an aerial image measuring unit is arranged at a wafer stage and part of the remaining section is arranged at a measurement stage, and the aerial image measuring unit measures an aerial image of a mark formed by a projection optical system. Therefore, for example, when... Agent: Oliff & Berridge, PLC

20070263197 - Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method: A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070263198 - System and method for projecting a pattern from a mask onto a substrate: A system for projecting a pattern from a mask onto a substrate comprises a radiation source for emitting a light beam in the extreme ultraviolet wavelength range, a mask including absorbent and reflective structures forming the pattern, a collector mirror and an illumination optical system forming a first part of... Agent: Edell, Shapiro & Finnan, LLC

20070263199 - Illumination system for a microlithography projection exposure installation: An illumination system for a microlithography projection exposure installation for illuminating an illumination field (7) with the light of an assigned light source (10) has at least one polarization compensator (11) in a pupil plane (23) of the illumination system. The latter can be used for the at least partial... Agent: Sughrue Mion, PLLC

20070263200 - Lithographic apparatus and device manufacturing method: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070263201 - Lithographic apparatus and device manufacturing method: An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070258060 - Hood for immersion lithography: A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating... Agent: Haynes And Boone, LLP

20070258075 - Apparatus for processing a semiconductor wafer and method of forming the same: A semiconductor wafer processing apparatus may include a chuck and/or a focus ring. The chuck may be configured to hold a wafer. The focus ring may be disposed surrounding a rim of the chuck. The focus ring may include a first section formed of a first material and a second... Agent: Harness, Dickey & Pierce, P.L.C

20070258062 - Environmental system including a transport region for an immersion lithography apparatus: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system... Agent: Oliff & Berridge, PLC

20070258064 - Exposure apparatus and device manufacturing method: An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. The apparatus also includes a supply... Agent: Oliff & Berridge, PLC

20070258063 - Exposure apparatus, exposure method, and method for producing device: In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting the image of a pattern onto the substrate (P) via the projection... Agent: Oliff & Berridge, PLC

20070258065 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to... Agent: Oliff & Berridge, PLC

20070258066 - Exposure apparatus, exposure method, and method for producing device: An exposure method exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate by using a projection optical system. The exposure method includes supplying the liquid onto a part of the substrate including a projection area of the projection optical system to form... Agent: Oliff & Berridge, PLC

20070258067 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to... Agent: Oliff & Berridge, PLC

20070258061 - System and method for using a two part cover and a box for protecting a reticle: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070258071 - Advanced exposure techniques for programmable lithography: Advanced techniques for programmable photolithography provide enhanced resolution and can image features smaller than the single shutter intensity profile, i.e., sub-pixel resolution. Patterns are built up by multiple exposures with relative movement of the mask and resist so as to place each shape from the library where it is needed... Agent: Nixon & Vanderhye, PC

20070258073 - Enhanced lithographic resolution through double exposure: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070258068 - Exposure apparatus, exposure method, and device fabricating method: The present invention provides an exposure apparatus that can satisfactorily perform a measurement process and can accurately perform an exposure process, even if a liquid immersion method is applied to a twin stage type exposure apparatus. An exposure apparatus (EX) comprises: two substrate stages (PST1, PST2) each capable of holding... Agent: Oliff & Berridge, PLC

20070258072 - Exposure apparatus, method for cleaning memeber thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device: An exposure apparatus EXS forms an immersion area AR2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure... Agent: Oliff & Berridge, PLC

20070258069 - Gas bearing, and lithographic apparatus provided with such a bearing: A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing surface there is a gap. A gas supply device supplies a gas to the gap. The first bearing... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070258070 - Method for determining exposure condition, exposure method, exposure apparatus, and method for manufacturing device: Pattern images are projected under various conditions of liquid prior to exposing a substrate, and exposure conditions for exposing a pattern image on the substrate is determined based on each projection condition of the pattern images. When a pattern image is projected through liquid, a substrate can be excellently exposed... Agent: Oliff & Berridge, PLC

20070258074 - Reduction of fit error due to non-uniform sample distribution: A weighted fit based on a sample density of a plurality of samples is used to determine an alignment curve. A scan that produces the samples may include portions having greater and lesser sample density. While performing an interpolation to produce a best fit curve, a plurality of neighboring samples... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070258076 - Lithographic apparatus and device manufacturing method: A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070258077 - Illumination optical apparatus, exposure apparatus, and device manufacturing method: An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination... Agent: Oliff & Berridge, PLC

20070258079 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a movable object and a control system to control the position of the movable object. The control system includes a position measurement system configured to measure the position of the movable object, a comparative unit configured to generate a servo error signal by subtracting a position... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070258078 - Lithographic apparatus and device manufacturing method using interferometric and other exposure: A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070258080 - Lithographic apparatus and method: According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070258081 - Lithographic apparatus and device manufacturing method: A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070252968 - Exposure apparatus: An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central part of each of the... Agent: Morgan & Finnegan, L.L.P.

20070252959 - Device for controlling the temperature of elements: The invention relates to a device for adjusting the temperature of elements, especially adjusting the temperature of a projection lens (1) or of parts of a projection lens (1) for use in semiconductor lithography. Said device comprises a temperature-adjusting jacket (18) which is provided with at least one temperature-adjusting line... Agent: Gray Robinson, P.A.

20070252961 - Environmental system including a transport region for an immersion lithography apparatus: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system... Agent: Oliff & Berridge, PLC

20070252962 - Environmental system including a transport region for an immersion lithography apparatus: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system... Agent: Oliff & Berridge, PLC

20070252960 - Exposure apparatus, exposure method, and device producing method: An exposure apparatus is provided with a measuring unit which measures at least one of property and components of a liquid in a state that a liquid immersion area is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can... Agent: Oliff & Berridge, PLC

20070252965 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece... Agent: Oliff & Berridge, PLC

20070252964 - Exposure apparatus and method for producing device: A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including a chamber... Agent: Oliff & Berridge, PLC

20070252963 - Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufacturing thereby: A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070252966 - Exposure apparatus, operation decision method, substrate processing system, maintenance management method, and device manufacuring method: An exposure apparatus is equipped with a main controller that decides an operation of the exposure apparatus based on information on maintenance from a C/D. Therefore, the main controller can decide to perform a specific operation, which is necessary for maintaining performance of the exposure apparatus and requires stop of... Agent: Staas & Halsey LLP

20070252967 - Lithographic apparatus and device manufacturing method: Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070252969 - Stage apparatus and exposure apparatus: A stage apparatus for driving and moving a target object comprises: a movable slider for mounting and moving the target object; a movable-slider driving unit for driving the movable slider; a feedforward compensator for calculating the driving amount to be generated by the movable slider driving unit over the period... Agent: Osha Liang L.L.P.

20070252971 - Substrate holder and exposure apparatus having the same: A substrate holding apparatus includes a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate; and a forcing member for forcing the first holding member toward said second holding member.... Agent: Fitzpatrick Cella Harper & Scinto

20070252970 - Substrate holder, stage apparatus, and exposure apparatus: An object of the invention is to hold a substrate with satisfactory flatness, even at a circumferential edge part that surrounds a suction space. The invention is equipped with a circumferential edge part (33) that surrounds a suction space (38), and a first support part (34) that is provided in... Agent: Oliff & Berridge, PLC