Photocopying inventions 10/07

20070247602 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece... Agent: Oliff & Berridge, PLC

20070247601 - Cleanup method for optics in immersion lithography: An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination... Agent: Oliff & Berridge, PLC

20070247603 - Environmental system including vacuum scavenge for an immersion lithography apparatus: An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion... Agent: Oliff & Berridge, PLC

20070247600 - Exposure apparatus and method for producing device: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the... Agent: Oliff & Berridge, PLC

20070247604 - Optimized mirror design for optical direct write: The present invention provides an optimized direct write lithography system using optical mirrors. That is, a maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array... Agent: Lsi Corporation

20070247605 - Optical element for correction of aberration, and a lithographic apparatus comprising same: An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070247606 - Illumination system: A system and method are used to substantially homogenize and remove at least some coherence from a beam of radiation.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070247607 - Stage drive method and stage unit, exposure apparatus, and device manufacturing method: When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage-is positioned at the first area, both stages are simultaneously driven while a state where both stages are... Agent: Oliff & Berridge, PLC

20070247609 - Assembly of a reticle holder and a reticle: A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070247608 - Tesselated patterns in imprint lithography: The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats.... Agent: Molecular Imprints

20070247610 - Method of predicting and minimizing model opc deviation due to mix/match of exposure tools using a calibrated eigen decomposition model: A method for generating models for simulating the imaging performance of a plurality of exposure tools. The method includes the steps of: generating a calibrated model for a first exposure tool capable of estimating an image to be produced by the first exposure tool for a given photolithography process, where... Agent: Mcdermott Will & Emery LLP

20070242241 - Exposure apparatus and device manufacturing method: An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and... Agent: Oliff & Berridge, PLC

20070242247 - Exposure apparatus and device manufacturing method: There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and... Agent: Miles & Stockbridge PC

20070242244 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus includes a projection optical system that has a first object field area and a second object field area different from the first object field area and that projects an image of a pattern onto a first image field and a second image field. The image of the... Agent: Oliff & Berridge, PLC

20070242242 - Exposure apparatus, exposure method, method for producing device, and optical part: An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30)... Agent: Oliff & Berridge, PLC

20070242243 - Lithographic apparatus and device manufacturing method: A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070242245 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070242246 - Lithographic apparatus and device manufacturing method: A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070242248 - Substrate processing method, exposure apparatus, and method for producing device: A device manufacturing method includes applying, in a lithographic apparatus, a prewetting liquid on top of a layer of radiation sensitive material of a substrate, on a substrate table, or on both; providing an immersion liquid for use in projecting a patterned beam of radiation on the prewet substrate and/or... Agent: Oliff & Berridge, PLC

20070242249 - Exposure apparatus, exposure method, and method for producing device: The present invention provides an exposure method which illuminates each of patterns, to be subjected to double exposure, on entire surfaces thereof in optimal illumination conditions respectively, and which performs the exposure with high throughput. Upon transferring a pattern of a reticle onto a wafer by the scanning exposure method,... Agent: Oliff & Berridge, PLC

20070242250 - Objective with crystal lenses: Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the... Agent: Fish & Richardson PC

20070242254 - Exposure apparatus and device manufacturing method: An exposure apparatus that includes a first optical system having an optical element that separates incident exposure light into a first exposure light and a second exposure light and emits the first exposure light in a first direction and emits the second exposure light in a second direction that differs... Agent: Oliff & Berridge, PLC

20070242251 - Lithographic apparatus and device manufacturing method: A method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The lithographic apparatus includes an illumination system configured to provide an illumination configuration and a projection system. In an embodiment of the invention, the method includes illuminating a mask pattern with... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070242252 - Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath slm interface to dose uniformity: A lithography method and system comprise an array of individually controllable elements, a first datapath section, a second datapath section, and a quantization device. The array of individually controllable elements modulates a beam of radiation.. The first datapath section converts data defining a requested dose pattern into a stream of... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070242253 - Moving beam with respect to diffractive optics in order to reduce interference patterns: A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element directs the partially coherent beam to reflect from an angular distribution changing element to form an incoherent beam. The partially... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070242255 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus includes a light source unit which emits an exposure light beam; and an illumination system which includes a splitting optical system splitting the exposure light beam emitted from the light source unit into a first exposure light beam and a second exposure light beam, and which illuminates... Agent: Oliff & Berridge, PLC

20070242256 - Lithographic apparatus, lens interferometer and device manufacturing method: Lithographic Apparatus, Lens Interferometer and Device Manufacturing Method A lithographic apparatus includes an illumination system that is configured to condition a radiation beam; a projection system that is configured to project at least a portion of the radiation beam as a projected radiation beam; and a lens interferometer for sensing... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070242257 - Reticle stages for lithography systems and lithography methods: Reticle stages for lithography systems and lithography methods are disclosed. In a preferred embodiment, a lithography reticle stage includes a first region adapted to support a first reticle, and at least one second region adapted to support a second reticle.... Agent: Slater & Matsil LLP

20070236673 - Exposure method and apparatus, and device manufacturing method: An exposure apparatus includes an illumination optical system configured to illuminate a reticle using extreme ultraviolet light, a projection optical system configured to project a pattern of the reticle onto a substrate, a diaphragm that defines a first space that accommodates the projection optical system, a first gas supplier configured... Agent: Morgan & Finnegan, L.L.P.

20070236674 - Catadioptric projection objective: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including... Agent: Sughrue Mion, PLLC

20070236675 - Lithographic apparatus and device manufacturing method utilizing a mems mirror with large deflection using a non-linear spring arrangement: An array of individually controllable elements for a lithographic apparatus comprise reflectors that can be actuated by an actuator and are biased to return to a given position by a force that varies non-linearly with the displacement of the reflector from that position.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070236676 - Scanning type exposure apparatus, method of manufacturing micro-apparatus, mask, projection optical apparatus, and method of manufacturing mask: It is disclosed a mask on which a pattern for transfer is formed. The mask comprising a first row pattern part and a second row pattern part which are arranged along a first direction on the mask The whole region of the first row pattern part and the whole region... Agent: Oliff & Berridge, PLC

20070229787 - Exposure apparatus: An exposure apparatus, which exposes a pattern on an original onto a substrate while a liquid fills a gap between a projection optical system and the substrate, includes a liquid holding plate which sets the substrate held on a substrate stage and the peripheral area around the peripheral portion of... Agent: Fitzpatrick Cella Harper & Scinto

20070229788 - Exposure apparatus and device manufacturing method: An exposure apparatus is configured to expose a substrate to light while the substrate is scanned. The apparatus comprises a stage configured to hold the substrate and to move, a measuring device configured to measure a position of a surface of the substrate held by the stage, a controller configured... Agent: Fitzpatrick Cella Harper & Scinto

20070229793 - Filtered device container assembly with shield for a reticle: A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the device container (246) includes a fluid port (254) that allows for the flow of fluid (276) into and out of... Agent: The Law Office Of Steven G Roeder

20070229794 - Stage apparatus, method for controlling the same, exposure apparatus, and method for manufacturing device: A stage apparatus includes a base, a stage that can move along the surface of the base that serves as a movement plane, and an imparting mechanism that gives an inertia force to the base using a mass body that moves in a direction vertical to the movement plane. The... Agent: Fitzpatrick Cella Harper & Scinto

20070229783 - Immersion exposure technique: It is an object of this invention to provide an exposure technique which uses immersion method and is highly practical. For example, an exposure apparatus includes a substrate stage which holds and moves a substrate, and a supply unit which has a supply nozzle and supplies a liquid to the... Agent: Fitzpatrick Cella Harper & Scinto

20070229784 - Immersion exposure technique: It is an object of this invention to provide an exposure technique which uses immersion method and is highly practical. For example, an exposure apparatus includes a substrate stage which holds and moves a substrate, and a supply unit which has a supply nozzle and supplies a liquid to the... Agent: Fitzpatrick Cella Harper & Scinto

20070229785 - Lithographic apparatus and device manufacturing method using overlay measurement: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070229790 - Arrangement for the transfer of structural elements of a photomask onto a substrate and method therefor: An arrangement for the transfer of structural elements of a photomask onto a substrate includes an illumination device, a photomask with a plurality of structural elements, wherein radiation from the illumination device transfers the structural elements of the photomask onto a photoresist placed on a substrate, and an optical element,... Agent: Slater & Matsil, L.L.P.

20070229786 - Lithographic apparatus and device manufacturing method: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070229789 - Method of manufacturing semiconductor device and liquid immersion lithography system: A method of manufacturing a semiconductor device is disclosed. The manufacturing method includes the following steps in a period from a liquid immersion lithography step to a step in which a film structure of at least an edge of a wafer changes from a timing of the liquid immersion lithography... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070229792 - Lithographic processing cell and device manufacturing method: A double processing technique for device manufacture is disclosed that includes performing a first patterning step to form apertures in a resist layer which apertures are filled before the first resist layer is stripped and replaced by a second resist layer to be used in the second exposure. In an... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070229791 - Step measuring device and apparatus, and exposure method and apparatus: A step measuring method by which height distribution can be accurately measured in the case of exposing an object by a scanning exposure method, even when a plurality of areas having different heights due to steps exist in an asymmetrical distribution in a scanning direction on a surface of the... Agent: Oliff & Berridge, PLC

20070229795 - Immersion lithography fluids: Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating... Agent: Air Products And Chemicals, Inc. Patent Department