Photocopying inventions 09/07

20070222955 - Communication between image supply device and image display device: There is provided an image display device which is connected to a general-purpose interface connectable to a plurality of types of general-purpose devices as an interface for an image supply device and displays images sequentially based on a plurality of image data sequentially supplied from the image supply device, the... Agent: Oliff & Berridge, PLC

20070222964 - Projection-optical systems and exposure apparatus comprising same: Projection-optical systems are disclosed that reduce OoB radiation doses on the wafer while reducing deterioration of optical properties of the systems. An exemplary system includes a first reflector having a reflectance for light of a second predetermined wavelength, different from light of a first predetermined wavelength, that is less than... Agent: Klarquist Sparkman, LLP

20070222956 - Contamination barrier with expandable lamellas: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070222957 - Exposure apparatus, exposure method, and method for producing device: A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts, the... Agent: Oliff & Berridge, PLC

20070222958 - Exposure apparatus, exposure method, and method for producing device: A lithographic projection apparatus projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts,... Agent: Oliff & Berridge, PLC

20070222959 - Exposure apparatus, exposure method, and method for producing device: A lithographic projection apparatus projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts,... Agent: Oliff & Berridge, PLC

20070222960 - Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement: In a device manufacturing method and lithographic apparatus wherein a pattern is transferred from a patterning device onto a substrate, a measurement target is provided on the substrate in a process enabling execution of a substrate measurement using radiation of a first wavelength. Subsequently the measurement target is transformed in... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070222961 - Lithographic apparatus, radiation supply and device manufacturing method: A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation beam has been divided.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070222963 - Illumination apparatus, exposure apparatus having the same, and device manufacturing method: An illumination optical system for illuminating a target plane using light from a light source includes a waveplate that changes a polarization state of the light, wherein 2.5×10−7>Δn×d/λ×(sin2 θ×cos 2θ/cos3 θ)>0 is met where λ (nm) is a wavelength of the light, θ is an incident angle of the light... Agent: Morgan & Finnegan, L.L.P.

20070222962 - Illumination optical equipment, exposure system and method: An illumination optical apparatus is able to well suppress a change in a polarization state of light in an optical path and to illuminate a surface to be illuminated, with light in a desired polarization state or in an unpolarized state. The illumination optical apparatus illuminates the surface to be... Agent: Oliff & Berridge, PLC

20070222965 - Calibration methods, lithographic apparatus and patterning device for such lithographic apparatus: A calibration method to calibrate a substrate table position in a lithographic apparatus, the method including repeatedly irradiating a pattern onto a surface of the substrate so as to create a two dimensional arrangement of patterns on the surface of the substrate, the irradiating including displacing the substrate table between... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070222966 - Supporting plate, stage device, exposure apparatus, and exposure method: An exposure apparatus exposes a pattern onto a substrate. The exposure apparatus includes a supporting plate having a surface, a substrate stage which holds the substrate and is movable over the supporting plate, a liquid supply device having a supply nozzle which supplies liquid to the substrate, a first collection... Agent: Oliff & Berridge, PLC

20070222967 - Apparatus and method for providing fluid for immersion lithography: An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity in a direction that is different than a direction in which the nozzle moves. The immersion fluid can also be injected at different rates into the inner cavity at different... Agent: Oliff & Berridge, PLC

20070216892 - Integrated large xy rotary positioning table with virtual center of rotation: The present invention allows multiple mounting configurations of the X, Y stages which allows the user to control very large format substrates in an economic way using standard X,Y stages and low cost structural and sensing components. In addition the present invention allows the user to achieve extreme precision positioning... Agent: Thomas A. O'rourke Bodner & O'rourke

20070216891 - Wafer lithographic mask and wafer lithography method using the same: A wafer lithographic shielding mask for fabricating a multi-project wafer (MPW) and a wafer fabrication method using the same are disclosed. The mask including a light shielding layer and at least one transparent region is used to select the layout patterns of designated chips on an MPW reticle to be... Agent: Wpat, PC Intellectual Property Attorneys

20070216884 - Exposure apparatus and device manufacturing method: An exposure apparatus provided with an optical system that has one optical element to which at least two of three or more exposure lights are guided, and that is capable of irradiating three or more exposure lights onto exposure fields that respectively correspond to the exposure lights, with the exposure... Agent: Oliff & Berridge, PLC

20070216885 - Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements.... Agent: Oliff & Berridge, PLC

20070216881 - Lithographic apparatus and device manufacturing method: A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070216882 - Lithographic apparatus and device manufacturing method: An immersion lithographic projection apparatus is disclosed in which a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with anl element of the projection system during substrate swap. The shutter member is connected to a metrology frame which... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070216883 - Lithographic apparatus, device manufacturing method and substrate: An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070216880 - System for determining conducted radio frequency (rf) receiver senitivity and related methods: A test method for determining conducted radio frequency (RF) receiver sensitivity using an RF source coupled to an RF receiver by an RF cable may include determining a bit error rate (BER) versus traffic channel (TCH) power level function for an initial channel, determining an estimated TCH power level for... Agent: Research In Motion, Ltd

20070216886 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system configured to project a patterned beam onto a target portion of the substrate, liquid being provided to a space between the projection system and the substrate, and a shutter configured to isolate the space... Agent: Oliff & Berridge, PLC

20070216889 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus includes a projection optical system having a plurality of optical elements. A first space, which is disposed on a side of a lower surface of an optical element closest to an image plane of the projection optical system, is filled with a liquid. A second space, which... Agent: Oliff & Berridge, PLC

20070216887 - Illumination system for a microlithographic projection exposure apparatus: An illumination system for a microlithographic projection exposure apparatus comprises a light source, a first optical unit having an exit pupil, an optical raster element positioned in or in close proximity to the exit pupil of the first optical unit and a field plane that is conjugated to the exit... Agent: Fish & Richardson PC

20070216888 - Support device for positioning an optical element: Support device for positioning an optical element (2), in particular a lens, comprising a first frame unit (1.1) and a plurality of support units (1.2) for supporting said optical element (2), each of said support units (2) having a first end for fixedly engaging a part of said first frame... Agent: Ohlandt, Greeley, Ruggiero & Perle, LLP

20070216890 - Lithographic apparatus, device manufacturing method and energy sensor: An energy sensor comprises a radiation-sensitive detector, a circuit, and an analog-to-digital converter. The radiation-sensitive detector is arranged to receive a pulsed radiation beam and to generate a current in response thereto. The circuit is equivalent to an RC network and is electrically connected across the radiation-sensitive detector. The analog-to-digital... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070216893 - Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method: A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results... Agent: Oliff & Berridge, PLC

20070211231 - Exposure apparatus and device manufacturing method: An exposure apparatus for exposing a pattern of a reticle onto a substrate includes an illumination optical system configured to illuminate the reticle on a target plane to be illuminated using light from a light source, wherein the illumination optical system includes a computer-generated hologram configured to discretely form plural... Agent: Morgan & Finnegan, L.L.P.

20070211236 - Exposure apparatus and method, and device manufacturing method: An exposure apparatus for exposing a substrate by scanning a reticle and the substrate relative to each other includes a projection optical system configured to project a pattern of the reticle onto the substrate, and a field stop configured to define a slit-shaped exposure area, and to change a length... Agent: Morgan & Finnegan, L.L.P.

20070211233 - Lithographic apparatus, control system and device manufacturing method: Lithographic Apparatus, Control System and Device Manufacturing Method An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070211232 - Thermophoretic techniques for protecting reticles from contaminants: Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected... Agent: Beyer Weaver LLP

20070211234 - Exposure apparatus, and device manufacturing method: A lithographic projection apparatus includes a substrate table that holds a substrate, a projection system that projects a patterned beam of radiation onto the substrate, and a liquid confinement structure that confines a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or... Agent: Oliff & Berridge, PLC

20070211235 - Stage drive method and stage unit, exposure apparatus, and device manufacturing method: A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or... Agent: Oliff & Berridge, PLC

20070211237 - System for controlling a dual mover assembly for an exposure apparatus: A precision assembly (210) for positioning a device (226) includes a stage (260) that retains the device (226), a dual mover assembly (228) that moves the stage (260), and the device (226) along a movement axis (266), a measurement system (222) and a control system (224). The dual mover assembly... Agent: The Law Office Of Steven G Roeder

20070206167 - Exposure method and apparatus, and device manufacturing method: An exposure method for transferring a pattern on a mask onto a substrate using a catadioptric projection optical system having partial lens barrels that hold optical systems having optical axes that extend in mutually different directions. The method includes measuring an amount of rotation of the catadioptric projection optical system... Agent: Oliff & Berridge, PLC

20070206168 - Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves: An apparatus and method for the simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners is described. A reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using an aperture plate is exposed onto a resist coated wafer... Agent: Heller Ehrman LLP

20070206170 - Exposure apparatus and making method thereof: An exposure apparatus that forms a pattern by exposing a substrate is equipped with a first platform tower, a second platform tower installed at a predetermined distance, and an exposure main section arranged within the space between both platform towers that includes a plurality of high rigidity sections each including... Agent: Oliff & Berridge, PLC

20070206169 - Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method: A method of controlling a component within a lithographic apparatus is presented. The component is moved relative to a reference within the lithographic apparatus by a first actuator. A second actuator that exerts a force between the component and a reaction mass is used to adjust at least one of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070206171 - Illumination system for a microlithographic projection exposure apparatus: An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of... Agent: Sughrue Mion, PLLC

20070206172 - Lithographic apparatus and device manufacturing method: Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070206173 - Reticle protection member, reticle carrying device, exposure device and method for carrying reticle: A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP