Photocopying inventions 01/07

20070019170 - Projection objective for a microlithographic projection exposure apparatus: A projection objective of a microlithographic projection exposure apparatus has a last optical element on the image side which is plane on the image side and which, together with an image plane of the projection objective, delimits an immersion space in the direction of an optical axis of the projection... Agent: Fish & Richardson PC

20070019171 - Apparatus for aberration detection and measurement: Aberrations in an optical system can be detected and measured using a method comprised of a test target in the object plane of a projection system and imaging a photoresist film with the system. The test target comprises at least one open figure which comprises a multiple component array of... Agent: Hiscock & Barclay, LLP

20070019173 - Photolithography arrangement: A photolithography arrangement including an illumination source, which emits radiation with a predetermined wavelength directed towards a substrate, a projection mask for modulating the radiation of the illumination source, an optical system for imaging the radiation modulated by the projection mask onto the substrate, and a metal mask, which includes... Agent: Dickstein Shapiro LLP

20070019172 - Systems and methods for retrieving residual liquid during immersion lens photolithography: Systems and methods for retrieving residual liquid during immersion lens photolithography are disclosed. A method in accordance with one embodiment includes directing radiation along a radiation path, through a lens and through a liquid volume in contact with the lens, to a microfeature workpiece in contact with the liquid volume.... Agent: Perkins Coie LLP Patent-sea

20070019175 - Exposure apparatus and device manufacturing method using the apparatus: An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20070019176 - Exposure apparatus and method: An exposure apparatus for exposing a pattern of a reticle onto a plate while synchronously scanning the reticle and the plate, said exposure apparatus includes a projection optical system for projecting the pattern of the reticle onto the plate, a measuring part for measuring a position of a surface of... Agent: Morgan & Finnegan, L.L.P.

20070019174 - Lithographic apparatus and device manufacturing method utilizing a continuous light beam in combination with pixel grid imaging: A continuous source of radiation, for example a lamp, is used in conjunction with pixel grid imaging. In one example, the individually controllable elements operate at a frequency of at least about 50 kHz. To compensate for any distortion of an exposed spot a point spread function is adjusted to... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20070019177 - Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method: A method of pre-aligning a substrate in a lithographic apparatus is described. The substrate has at least one alignment mark provided on a side of the substrate. The method includes determining a relationship between a position of the at least one alignment mark, at least part of an edge of... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070019178 - Methods and apparatuses for configuring radiation in microlithographic processing of workpieces: Methods and apparatuses for configuring radiation used in microlithographic processing of workpieces are disclosed herein. One particular embodiment of such a method comprises directing a radiation beam along a radiation path from a reticle to an adjustment structure. The radiation beam has a wavefront with a first configuration in an... Agent: Perkins Coie LLP Patent-sea

20070019179 - Polarization-modulating optical element: The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a... Agent: Fish & Richardson PC

20070019180 - Image-forming device having brush/drum processor: An image-forming device includes a processing member in the form of a brush/drum processor. The processing member includes a rotatable vacuum drum with a surface that is adapted to receive an exposed photosensitive medium. Vacuum applied to the drum is effective to hold a medium on the drum. The processing... Agent: Mark G. Bocchetti Patent Legal Staff

20070013883 - Semiconductor manufacturing device and particle monitoring method: An embodiment of a semiconductor manufacturing device includes a chamber to perform a predetermined semiconductor process, a light source to emit light into the chamber, a light receiver to sense scattered light emitted from the light source and to measure an intensity of the scattered light, a first controller to... Agent: Marger Johnson & Mccollom, P.C.

20070013886 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070013884 - Method for exposing an object to light and exposure apparatus for performing the same: In a method for exposing an object to light and an exposure apparatus for performing the method, projection lights having image information may be produced. The projection lights may be projected onto the film on the substrate and travel along separately advancing paths. The advancing paths may not intersect with... Agent: Harness, Dickey & Pierce, P.L.C

20070013885 - Stage apparatus, lithographic apparatus and device manufacturing method: In order to improve the productivity of a lithographic apparatus, a stage apparatus to hold two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070013887 - Methods and systems for improved optical lithographic processing: Methods and systems are described for improving optical lithographic processing of a substrate by selecting appropriate system parameters in order to obtain a good image or print of the pattern to be obtained in a resist layer, which includes selecting a set of system parameters for an optical lithographic system... Agent: Mcdonnell Boehnen Hulbert & Berghoff LLP

20070013889 - Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus: A lithographic apparatus comprises an illumination system for supplying a beam of radiation, an array of individually controllable elements serving to impart the beam with a pattern in its cross-section, a substrate table for supporting a substrate, and a projection system for projecting the patterned beam onto a target portion... Agent: Sterne, Kessler, Goldstein & Fox PLLC

20070013888 - Variable illumination source: An apparatus and method for providing a variable illumination field for use in lithographic imaging for semiconductor manufacturing includes providing a an illumination system including a variable optical element having an array of addressable elements, each addressable element constructed and arranged to have a variable transmittance.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070013891 - Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light: An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage... Agent: Sterne, Kessler, Goldstein & Fox PLLC

20070013890 - Stage apparatus, lithographic apparatus and device manufacturing method: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070013892 - Exposure apparatus: An exposure apparatus for exposing a pattern of an mask onto a plate to be exposed, said exposure apparatus includes a cleaning apparatus for cleaning the mask, wherein said cleaning apparatus includes an irradiating part for irradiating a laser beam to the mask, and a polarization controller for controlling a... Agent: Morgan & Finnegan, L.L.P.

20070013895 - Driving device, exposure apparatus using the same, and device manufacturing method: A driving device includes an electromagnetic actuator including a first coil and a second coil which detects a change in magnetic flux generated by the first coil, and an electromagnetic actuator controller which feedback-controls the electromagnetic actuator. The electromagnetic actuator controller includes a modulator which gives a modulated signal to... Agent: Fitzpatrick Cella Harper & Scinto

20070013893 - Stage apparatus, lithographic apparatus and device manufacturing method: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070013894 - Stage apparatus, lithographic apparatus and device manufacturing method: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070013896 - Exposure method: An exposure method for exposing a pattern of a reticle which includes a first pattern and a second pattern by using a light from a light source and an optical system includes the steps of obtaining information relating to the first pattern and plural types of representative patterns that can... Agent: Morgan & Finnegan, L.L.P.

20070008507 - Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium: This invention discloses an immersion exposure method which executes immersion exposure for an exposure target film by transferring an image of a pattern formed on a mask onto the exposure target film through an immersion medium. A first vapor pressure as the target value in an immersion exposure atmosphere which... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070008508 - Seal ring arrangements for immersion lithography systems: Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.... Agent: Howard Chen, Esq. Preston Gates & Ellis LLP

20070008509 - Exposure apparatus: An exposure apparatus that exposes an object to be exposed with light from an EUV light source. The light has an exposure wavelength component and a non-exposure wavelength component. The exposure apparatus has a detector that independently detects the quantity of light of the exposure wavelength component and the quantity... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070008510 - Optical aligner using a compensation light: An optical aligner includes a light source for generating an exposure light, an irradiation optical system for irradiating the exposure light onto a reticle, a projection optical system for transmitting the exposure light passed by the reticle to project the image of the reticle onto a photoresist mask, and a... Agent: Mcginn Intellectual Property Law Group, PLLC

20070008511 - Polarized radiation in lithographic apparatus and device manufacturing method: A lithographic apparatus comprises an illumination system having optical elements capable of conditioning a radiation beam to comprise in cross-section a first portion of linearly polarized radiation and a second portion of unpolarized or circularly polarized radiation. The apparatus further comprises a support constructed to support a patterning device is... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070008513 - Exposing apparatus having substrate chuck of good flatness: An exposing apparatus comprises a mask stage, a supporter that supports the mask stage, a substrate below the mask stage, and a substrate chuck that supports the substrate. The exposing apparatus further comprises a substrate chuck moving mechanism that moves the substrate chuck, a gap motor unit installed on the... Agent: Brinks Hofer Gilson & Lione

20070008512 - Substrate handler, lithographic apparatus and device manufacturing method: Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070002291 - Image forming apparatus adjusting color taste of toner image: An image forming apparatus includes an image bearing member, first toner image forming device of forming a first toner image by a first toner, second toner image forming device of forming a second toner image by a second toner, transferring device of transferring the first toner image on the image... Agent: Fitzpatrick Cella Harper & Scinto

20070002292 - Laminar flow gas curtains for lithographic applications: Laminar flow gas curtains for use in lithographic applications. In an embodiment, a gas curtain system includes a nozzle that enhances the fluidic purge process. The nozzle includes a first housing, a second housing, a flow distribution plate, and a plurality of flow conditioning channels. The first housing has an... Agent: Sterne, Kessler, Goldstein & Fox PLLC

20070002293 - Method measuring distortion using exposure equipment: A method of measuring distortion for an exposure apparatus is disclosed and comprises; aligning a reticle comprising a plurality of measuring patterns over a first wafer, wherein the plurality of measuring patterns are separated by a first pitch in a first direction and a second pitch in a second direction... Agent: Volentine Francos, & Whitt PLLC

20070002296 - Immersion lithography defect reduction: A method of performing immersion lithography on a semiconductor substrate includes providing a layer of resist onto a surface of the semiconductor substrate and exposing the resist layer using an immersion lithography exposure system. The immersion lithography exposure system utilizes a fluid during exposure and may be capable of removing... Agent: Haynes And Boone, LLP

20070002294 - Lithographic apparatus immersion damage control: A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to supply an immersion... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070002295 - System and method of monitoring and diagnosing system condition and performance: The invention is directed to a system and method of monitoring and/or diagnosing tool performance in real-time for system degradation. The invention issues alerts and provides a structured process for identifying the source of the problem and enabling action to be taken before defects are detected on the final product.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070002299 - Exposure apparatus, exposure method, and device fabrication method: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference... Agent: Oliff & Berridge, PLC

20070002297 - Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination: A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply... Agent: Sterne, Kessler, Goldstein & Fox PLLC

20070002298 - Lithographic apparatus substrate alignment: A method for aligning a substrate in a lithographic apparatus includes determining from a geometric reference of the substrate a position of a window on the substrate. The window indicates an area in which an alignment mark of the substrate may be expected. Then, a position of the alignment mark... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070002300 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070002301 - Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing method: A lithographic apparatus having a radiation beam inspection device comprising a barrier to the beam of radiation, the barrier having an aperture through which a portion of the beam of radiation passes; and a radiation sensor that determines the intensity of the radiation passing through the aperture and the position,... Agent: Sterne, Kessler, Goldstein & Fox PLLC

20070002302 - Exposure device and method of exposure: The exposure device includes a polarizing plate and an illumination diaphragm. The polarizing plate is located in an optical path between a light source and a photomask, serving as a polarizing unit that polarizes an illuminating light from the light source in the first and the second direction orthogonal to... Agent: Young & Thompson

20070002303 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a second substrate of... Agent: Pillsbury Winthrop Shaw Pittman, LLP