Photocopying inventions 09/06

20060209274 - Exposure apparatus and method of manufacturing device: At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield configured to surround an optical path space of the exposure apparatus where a gas supply system is configured to supply gas into the optical path space...

20060209275 - Exposure apparatus, and device manufacturing method: Disclosed is an exposure apparatus for exposing a substrate through a reticle, that includes a cooling device configured to cooling first water supplied from a facility by use of second water supplied fro the facility and having a temperature lower than the first water, and a supplying system for supplying...

20060209276 - Method and apparatus for self-referenced wafer stage positional error mapping: Intra-field distortion for a projection imaging tool is determined using a self-referenced rectangular grid reticle pattern, that includes at least two arrays of alignment attributes that are complementary to each other, is exposed multiple times onto a substrate with a recording media. A reference reticle pattern is exposed onto the...

20060209277 - Roll printer with decomposed raster scan and x-y distortion correction: A photolithographic machine is described for transferring fine patterns from a photomask to a flexible roll-to-roll format. It is capable of printing multiple layers in exact registry onto a distorted format. It contains 1 to 1 reflective optics, dynamic distortion and magnification correction. The optical transfer assembly scans reciprocally across...

20060209279 - Exposure apparatus and device fabricating method: An exposure apparatus including a projection optical system that projects an image of a mask onto a substrate held by a stage, and an atmosphere forming mechanism for forming a specific gas atmosphere between the projection optical system and the stage, wherein the atmosphere forming mechanism has a cushioning part...

20060209278 - Exposure apparatus and device manufacturing method: An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and a reticle. A holding mechanism that...

20060209282 - Exposure apparatus and device manufacturing method: An exposure apparatus has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and said projection optical system with a space between said projection optical system and the substrate filled with liquid. The apparatus includes...

20060209283 - Exposure apparatus and exposure method: An exposure apparatus includes a beam providing unit having a first component and second component to provide an exposure beam having pattern information to a substrate W, a measurement unit which measures a relative variation between the first component and the second component, a driving mechanism which drives at least...

20060209284 - Exposure apparatus, exposure method and device manufacturing method: Disclosed is an exposure apparatus, and exposure method and a device manufacturing method, wherein, in one preferred from of the invention, the exposure apparatus includes a projection optical system, an original stage configured to hold an original thereon and to move the original, a position measuring system configured to measure...

20060209281 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus for exposing a substrate to light via a reticle, includes a projection optical system configured to project a pattern of the reticle onto the substrate, a stage configured to hold the substrate, a light-transmitting member interposed between the stage and the end face of the projection optical...

20060209280 - Immersion exposure apparatus, immersion exposure method, and device manufacturing method: An immersion exposure apparatus projects and transfers a pattern onto a photosensitive substrate through a projection optical system with a liquid being supplied to the immersion space between the projection optical system and the photosensitive substrate. The immersion exposure apparatus includes a temperature detector which detects the temperature of the...

20060209286 - Immersion exposure technique: An exposure apparatus for exposing a substrate to light via a reticle. The apparatus includes a substrate stage configured to hold the substrate and to move, a projection optical system configured to project a pattern of the reticle onto the substrate, a flat plate having a surface whose height is...

20060209285 - Optical element and projection exposure apparatus based on use of the optical element: A liquid immersion exposure apparatus includes a projection optical system (PL) which projects an image of a pattern onto a substrate (W) and a unit (5) which supplies a liquid (7) between an optical element (4) at the end of the projection optical system (PL) and the substrate (W). A...

20060209287 - Positioning apparatus, exposure apparatus, and device manufacturing method: This invention discloses an apparatus having a base and a movable body which is driven to move along the base. The apparatus includes a generator configured to generate a driving signal for the movable body, a temperature adjusting mechanism configured to adjust temperature of the base, and a controller configured...

20060209289 - Exposure apparatus, and device manufacturing method: Disclosed is an exposure apparatus for exposing a substrate through a reticle, wherein the apparatus includes a clamp having a circumferential protrusion and a pin disposed inside the circumferential protrusion, a reticle stage configured to support the clamp, and an attraction mechanism configured to attract the reticle, placed on the...

20060209288 - Proximity type exposure apparatus: An apparatus and method for aligning a substrate and a mask are discussed. In one aspect of the present invention, the apparatus includes a mask stage, wherein the mask stage includes a mask fixing stage configured to fixedly support a mask; a base stage supporting the mask fixing stage; and...

20060203213 - Mult-spectrum image capturing device and multi-spectrum illuminating device: A multi-spectrum image capturing device includes a multi-spectrum illuminating device comprising LED's for emitting lights of different wavelengths from one another, a plurality of optical rods for relaying the lights emitted from the LED's, an optical diffusion element for diffusively reflecting the lights from the optical rods by a white...

20060203214 - Illumination optical apparatus and projection exposure apparatus: An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle...

20060203216 - Balanced positioning system for use in lithographic apparatus: A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass....

20060203215 - Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of a substrate table is arranged to be easily applied and removed and in an embodiment, reduces transmission of forces between the different parts....

20060203217 - Optical adjustment device, optical pickup apparatus provided with optical adjustment device, and method and apparatus for assembling optical adjustment device: An optical adjustment device capable of correcting spherical aberration with high accuracy in a simple configuration is provided. A second lens holder fits into a guiding portion of a first lens holder, and a grip rack is placed across the second lens holder and a feed screw member and resiliently...

20060203218 - Optical element and exposure apparatus: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the...

20060203219 - Exposure method: Disclosed is an exposure method in which high precision focus calibration is realized by measuring a tilt of an image plane in a scanning direction, so that exposure with a high resolution can be performed. The exposure method includes: a measuring step of measuring a position of an image plane...

20060203220 - Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping: The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved...

20060203221 - Lithographic apparatus and a method for determining a polarization property: A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes...

20060203223 - Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider: A stage device for positioning an object. The stage device includes a slider for holding the object, a driving section for driving the slider with respect to a base, wherein the slider is supported in a suspended state on the base by a static-pressure bearing and a pressurizing magnet, and...

20060203222 - Wafer holding mechanism: To prevent heating of a holding table that holds a wafer when using a laser beam to process a wafer, a wafer holding mechanism has a wafer holder having a holding surface that holds a wafer and a suction part formed on an outer peripheral side of the wafer holder,...

20060197928 - Image processing apparatus and its method: When a history including printed information, a date, a user, and the like is stored, a search for stored information is allowed, and the history can be referred to if information has leaked, a large-capacity storage device is required to store all images in the storage device. Hence, user authorization...

20060197927 - Lithographic apparatus and device manufacturing method: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens....

20060197929 - Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic...

20060197930 - Exposure method and apparatus: An exposure method for exposing an image of a pattern of a mask onto a plate while immersing, in liquid, a space between a final lens of a projection optical system and the plate includes the steps of obtaining temperature information of the liquid, determining a correction amount for correcting...

20060197933 - Exposure apparatus: An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a plate to be exposed, and a pupil filter that includes a first area and a second area formed outside of the first area, the first area being formed as a circular area upon...

20060197932 - Optical apparatus and method of manufacturing device: An optical apparatus including an optical element includes a holder configured to hold the optical element, and a rectifier configured to rectify a flow of gas in a space adjacent to a surface of the optical element, and to decrease the flow rate of the gas adjacent to the surface...

20060197931 - Printer and a method for recording a multi-level image: A printer and method for recording a predefined multiple intensity level image on a substrate, the method includes the steps of: converting the predetermined image to multiple intensity level associated images; converting a light beam to multiple light beam arrays; modulating each light beam array to provide modulated light beam...

20060197934 - Exposure method and apparatus: An exposure method for exposing a dense contact hole pattern onto a plate via a projection optical system includes the step of illuminating one of a binary mask and an attenuated phase shifting mask which one has the dense contact hole pattern by utilizing light from a light source and...

20060197935 - Processing unit, exposure apparatus having the processing unit, and protection unit: A processing unit includes a supply section for storing a mask having a pattern surface having a pattern to be exposed to a plate, the supply section being maintained under atmospheric pressure, a process chamber for processes the plate, the process chamber being maintained in a reduced pressure or vacuum...

20060197928 - Image processing apparatus and its method: When a history including printed information, a date, a user, and the like is stored, a search for stored information is allowed, and the history can be referred to if information has leaked, a large-capacity storage device is required to store all images in the storage device. Hence, user authorization...

20060197927 - Lithographic apparatus and device manufacturing method: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens....

20060197929 - Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic...

20060197930 - Exposure method and apparatus: An exposure method for exposing an image of a pattern of a mask onto a plate while immersing, in liquid, a space between a final lens of a projection optical system and the plate includes the steps of obtaining temperature information of the liquid, determining a correction amount for correcting...

20060197933 - Exposure apparatus: An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a plate to be exposed, and a pupil filter that includes a first area and a second area formed outside of the first area, the first area being formed as a circular area upon...

20060197932 - Optical apparatus and method of manufacturing device: An optical apparatus including an optical element includes a holder configured to hold the optical element, and a rectifier configured to rectify a flow of gas in a space adjacent to a surface of the optical element, and to decrease the flow rate of the gas adjacent to the surface...

20060197931 - Printer and a method for recording a multi-level image: A printer and method for recording a predefined multiple intensity level image on a substrate, the method includes the steps of: converting the predetermined image to multiple intensity level associated images; converting a light beam to multiple light beam arrays; modulating each light beam array to provide modulated light beam...

20060197934 - Exposure method and apparatus: An exposure method for exposing a dense contact hole pattern onto a plate via a projection optical system includes the step of illuminating one of a binary mask and an attenuated phase shifting mask which one has the dense contact hole pattern by utilizing light from a light source and...

20060197935 - Processing unit, exposure apparatus having the processing unit, and protection unit: A processing unit includes a supply section for storing a mask having a pattern surface having a pattern to be exposed to a plate, the supply section being maintained under atmospheric pressure, a process chamber for processes the plate, the process chamber being maintained in a reduced pressure or vacuum...