Photocopying inventions 07/06

20060164613 - Coating and developing system and coating and developing method: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and...

20060164614 - Exposing machine for a printed circuit board: An exposing machine of the present invention consists of a plurality of ultraviolet light tubes arranged on light generation assemblies. Each tube of the ultraviolet tubes is mutually parallel and is in parallel with a printed circuit board. Accordingly, a uniformly parallel projection light can be generated for the entire...

20060164615 - Exposure apparatus and device manufacturing method: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam onto a target...

20060164616 - Liquid immersion type lens system, projection exposure apparatus, and device fabricating method: A liquid immersion type lens system includes: an optical system main body that has an optical surface at one end along an optical axis, the optical surface contacting a first immersion liquid; a light transmitting member that has two surfaces, one on each end along the optical axis, is disposed...

20060164617 - Projection exposure apparatus, projection exposure method, and method for producing device: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate via a projection optical system. The projection exposure apparatus includes electricity removal units which removes electricity from a liquid supplied to a space between the projection optical system and the surface of a substrate. This makes...

20060164618 - Method and apparatus for measurement of exit pupil telecentricity and source boresighting: Exit pupil and source telecentricity of a projection imaging tool system is determined. The system contains a light source, an optical imager, a reticle, a substrate, and a positioner. The light source is optically coupled to the optical imager, the optical imager having an exit pupil. The combination of the...

20060164620 - Exposure apparatus and optical component for the same: In an exposure apparatus, a light source emits ultraviolet light having a wavelength of 300 nm or less, a homogenizer reduces energy density inhomogeneity of the ultraviolet light in a plane perpendicular to an optical axis, and an exposure object is exposed by applying the ultraviolet light passed through a...

20060164619 - Imaging device in a projection exposure machine: An imaging device in a projection exposure machine for microlithography comprises at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. Said linear drive has at least one moving element, said moving element having a shearing part and a...

20060164621 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target...

20060164622 - Illumination apparatus, projection exposure apparatus, and device fabricating method: An exposure apparatus having an exposure mode that transfers a pattern on a reticle onto an object, and a standby mode that waits for exposure includes an optical system for introducing the exposure light to the object in the exposure mode, and a mechanism for allowing the exposure light to...

20060158624 - Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method: There is disclosed a beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam, comprising: a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution...

20060158625 - Four-bar transmission mechanism: A transmission mechanism that can be applied in a document camera is disclosed. The transmission mechanism includes a first roller, a second roller, a first lever and second lever. The first roller and the second roller rotate about individual axes. Ends of the first lever are pivoted about the axis...

20060158629 - Exposure apparatus and method: An exposure method immerses, in liquid, a surface of an object to be exposed, and a surface of a projection optical system closest to the object, and projects a repetitive pattern formed on a mask via the projection optical system onto the object. The exposure method forms on a pupil...

20060158630 - Exposure apparatus, device manufacturing method, stage apparatus, and alignment method: An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the original by projecting and...

20060158628 - Lithographic apparatus and device and device manufacturing method: A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in...

20060158626 - Lithographic apparatus and device manufacturing method: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a...

20060158627 - Lithographic apparatus and device manufacturing method: A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between...

20060158631 - Method and apparatus for irradiating a microlithographic substrate: A method and apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation. The method can include directing the radiation along a radiation path in a first direction toward a reticle, passing the radiation from the reticle and to the microlithographic substrate along the radiation path...

20060158632 - Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method: A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results...

20060158635 - Exposure device: A light beam emitted from a light source passes through a spatial light modulation device, at which a plurality of unit elements for respectively modulating incident light beam are two-dimensionally arrayed, and a microlens array, at which a plurality of microlenses corresponding to the unit elements are arrayed, and is...

20060158634 - Lithographic apparatus and device manufacturing method utilizing a substrate handler: A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate...

20060158633 - Optimized optical lithography illumination source for use during the manufacture of a semiconductor device: A method and structure for optimizing an optical lithography illumination source comprises a shaped diffractive optical element (DOE) interposed between the illuminator and a lens during the exposure of a photoresist layer over a semiconductor wafer. The DOE may, in some instances, increase depth of focus, improve the normalized image...

20060158636 - Exposure apparatus and optical component for the same: In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica...

20060158637 - Exposure apparatus and method thereof: An exposure apparatus includes a loading device, a first energy-producing device, and a second energy-producing device. The loading device comprises a plurality of supporting elements, supporting a panel. The first and second energy producing devices are disposed above and below the loading device, respectively....

20060158638 - Lithographic apparatus, device manufacturing method, and device manufactured thereby: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of...

20060152693 - Substrate processing apparatus: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion...

20060152694 - Substrate processing apparatus: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a washing processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The washing processing block comprises washing processing group. A resist...

20060152695 - Exposure apparatus: The exposure apparatus of the invention includes a chamber 1 housing an exposure apparatus body 6 provided with an illumination optical system 2, a reticle 3, a projection lens 4 and a stage 5, gas supply units 7, 13, 17 and 18 that are disposed in the chamber 1 and...

20060152697 - Apparatus and method for providing fluid for immersion lithography: Systems and methods control the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space between a lens and a substrate during the immersion lithography process. Fluid is supplied to the space and is recovered from the space through a porous member...

20060152698 - Exposure apparatus and device manufacturing method: An exposure apparatus in which by filling at least a portion between a projection optical system and a substrate with a liquid and by projecting an image of a pattern onto the substrate via said projection optical system and said liquid, said substrate is exposed, said exposure apparatus includes: a...

20060152699 - Exposure apparatus and method for producing device: An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for...

20060152696 - Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby: A coating for sensors and/or parts of an exposure apparatus, for example a sensor on a substrate table of a lithography apparatus, include a semiconductor, a photocatalyst, and/or a metal oxide....

20060152700 - Exposure apparatus and method, and device manufacturing method using the same: An exposure apparatus for exposing a pattern of a reticle onto a plate includes a projection optical system for projecting the pattern onto the plate, a switch for switching a polarization of a light for illuminating the reticle from a first polarization state to a second polarization state different from...

20060152701 - Optically polarizing retardation arrangement, and a microlithography projection exposure machine: A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of...

20060152703 - Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same: An alignment method for an exposure mask and an object to be exposed, wherein exposure is carried out while the exposure mask having a light blocking film formed at a membrane portion thereof is closely contacted to the object to be exposed and light from a light source is projected...

20060146299 - Lenticular card and processes for making: A process for making a lenticular card including: providing an imaged transparent sheet having a first smooth side and a second side with a lenticulated region, the transparent sheet optionally having at least one printed image area on the first smooth side and a moisture cure adhesive layer over the...

20060146300 - Radiation exposure apparatus comprising a gas flushing system: An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate....

20060146301 - Print order receiving method, print order receiver, and print production system: The print order receiver and print order receiving method acquire image data of first images of one order, input a print order with respect to the first images for individual package units of the one order, a display for displaying an order screen on which the first images is displayed...

20060146302 - Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly: The invention is directed to a method for performing a tilted focus test that includes providing a target object, providing a projection beam of radiation using a radiation source, providing at least one reflective device to produce a projected projection beam of radiation onto the target portion, and producing a...

20060146306 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area...

20060146305 - Exposure apparatus, method for producing device, and method for controlling exposure apparatus: An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid feeding mechanism stops the...

20060146304 - Method of manufacturing a miniaturized device: A lithographic method of manufacturing a miniaturized device using a projection exposure system comprises illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of...

20060146303 - Stage design for reflective optics: A lithography apparatus including a reticle stage, a wafer stage, and an actuator. The reticle stage is operable to project an original image. A final image corresponding to the original image is formed on the wafer stage. The actuator is operable to actuate the reticle stage at a first acceleration...

20060146307 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a support structure configured to hold a phase shift mask, the phase shift mask configured to pattern a beam of unpolarized radiation according to a desired pattern and a substrate table configured to hold a substrate. The lithographic apparatus also includes a projection system configured to...

20060146308 - Systems and methods for minimizing scattered light in multi-slm maskless lithography: The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for...

20060146311 - Exposure apparatus: In an exposure apparatus, light flux from a light source is serially converted into any of a plurality of polarized light beams perpendicular to each other on Poincare sphere and is output. This polarized light beam is injected into a projection optical system or the like to be converted into...

20060146310 - Lithographic apparatus, excimer laser and device manufacturing method: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing...

20060146309 - Method and system for real time uniformity feedback: Provided are a method and system for projecting an illumination beam to an image plane. The method includes producing a sample of the illumination beam and projecting the sample to a secondary image plane. Next, an illumination uniformity profile associated with the projected sample is measured while the received illumination...

20060146312 - Holding apparatus, holding method, exposure apparatus and device manufacturing method: A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision unwarrantable area outside of the precision warrantable area, a pore connected to a suction apparatus that draws out...

20060146313 - Method for adjusting lithographic mask flatness using thermally induced pellicle stress: A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mounted to the mask, the mounting temperature...