Photocopying inventions 05/06

20060109435 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a patterning device that patterns a projected beam. The patterning device includes an array of cells that contain a polar fluid, a non-polar fluid, and an electrode. A potential difference across the electrode and the polar fluid causes displacement of the non-polar fluid. Based on a...

20060109436 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes an illumination system configured to provide a beam of radiation of radiation; a support configured to support a patterning device configured to impart a pattern to the beam of radiation; a substrate table configured to hold a substrate; a projection system configured to project the patterned...

20060109438 - Method and apparatus for self-referenced dynamic step and scan intra-field lens distortion: A reticle stage grid and yaw in a projection imaging tool is determined by exposing a first portion of a reticle pattern onto a substrate with a recording media thereby producing a first exposure. The first portion of the reticle pattern includes at least two arrays of alignment attribute that...

20060109437 - Photolithography system including control system to control photolithography apparatus and method of controlling the same: A photolithography system includes a photolithography apparatus adapted to perform a photolithography process on a wafer; and a control system adapted to control the photolithography apparatus. The control system includes a measurement unit adapted to measure one or more characteristics of a feature formed on the wafer by the photolithography...

20060109439 - Clamping device for optical elements, lithographic apparatus with optical elements in a clamping device, and method for manufacturing such apparatus: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate. The apparatus includes an optical element, and at least two clamping assemblies for clamping the optical element. The clamping assemblies each include a first clamp with a first clamping surface in contact with a first...

20060109440 - Lithographic apparatus and device manufacturing method: A lithographic apparatus including an illumination system for supplying a plurality of beams of radiation, an array of individually controllable elements for imparting to each beam a pattern in its cross section, a substrate table for supporting a substrate, and projection systems for projecting the patterned beams onto the substrate....

20060109441 - Reticle, exposure apparatus, and methods for measuring the alignment state thereof: A reticle and an exposure apparatus using the reticle are provided. The reticle includes alignment marks having a plurality of segments along coordinate directions corresponding to a plurality of regions of the reticle, in symmetrical positions about coordinate axes. The reticle also includes detection sensors having detection regions corresponding to...

20060109442 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the...

20060109444 - Exposure apparatus: Provided is a wafer exposure apparatus used in a semiconductor device manufacturing process, the exposure apparatus including: a reflective mirror for reflecting light provided from a light source; an optical path changer for changing a path of the light provided from the reflective mirror; first mirrors installed at both sides...

20060109445 - Maskless lithography system and method: In a lithographic system, data transmission is carried out by means of a powerful electro-optical free-beam connection system enabling optical pattern data to be guided from light exit places to light entrance places inside the vacuum chamber by means of free-space optical beams in order to produce control signals. The...

20060109443 - Optical integrator, illumination optical device, exposure apparatus, and exposure method: An optical integrator having characteristics to reduce effects of manufacturing errors of many minute refraction surfaces integrally formed by, for example, etching on an illumination intensity distribution. An optical integrator (8) comprising an integrally formed plurality of first minute refraction surfaces (80a) and an integrally formed plurality of second minute...

20060109446 - Radially polarized light in lithographic apparatus: The present invention relates to a lithographic apparatus and a method of using the apparatus in the manufacture of a device such as an integrated circuit (IC). In particular, the present invention relates to a lithographic apparatus designed to be used with radiation having a wavelength in the Deep Ultra-Violet...

20060109447 - Lithographic apparatus and device manufacturing method: A method and lithographic apparatus in which a surface of a sensor is protected from dissolution in a liquid through application of a bias voltage to the surface with respect to one or more parts which are also exposed to the liquid....

20060109448 - Method for bonding a pellicle to a patterning device and patterning device comprising a pellicle: A method is provided to reduce differences between the way in which reticle chucking forces and gravity force act upon the reticle during use and during assembly of the pellicle, and to combine this with a similar reduction concerning pellicle chucking forces and gravity force acting upon the pellicle during...

20060109449 - Reticle-carrying container: The present invention supports a reticle 12 in a safe and secure manner. A reticle-carrying container 11 includes a pod 13 for storing the reticle 12, a door 14 and a seal 15 for blocking and sealing hermetically the pod 13. A pair of retile retainers 25 and 45 is...

20060103817 - lithographic apparatus and device manufacturing method: In an immersion lithography apparatus in which, for example, immersion liquid is supplied to a localized space, a plate is provided to divide the space into two parts. Such a division of the space may facilitate reduction of stray radiation, a temperature gradient, and the transportation of contaminants....

20060103816 - Lithographic apparatus and device manufacturing method: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate....

20060103820 - Lithographic apparatus and device manufacturing method: In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate displacement mechanism using, for example, a combination of one or more leaf springs and one or more electromagnets or...

20060103821 - Lithographic apparatus and device manufacturing method: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between...

20060103819 - Measurement method, device manufacturing method and lithographic apparatus: To increase a measurement range of a measurement system taking measurement samples of an object moving with respect to said measurement system, the measurement system is configured to take measurement samples at different sample positions while the object accelerates with respect to the measurement system. In particular, a measurement timing...

20060103818 - Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system: A method and apparatus for reduction and prevention of residue formation and removal of residues formed in an immersion lithography tool. The apparatus including incorporation of a cleaning mechanism within the immersion head of an immersion lithographic system or including a cleaning mechanism in a cleaning station of an immersion...

20060103822 - Alignment strategy optimization method: The invention relates to a method of optimizing an alignment strategy for processing batches of substrates in a lithographic projection apparatus. First, all substrates in a plurality of batches of substrates in the lithographic projection apparatus are sequentially aligned and exposed using a predefined alignment strategy. Then, alignment data is...

20060103824 - Auto focus system, auto focus method, and exposure apparatus using the same: An auto focus system includes a stage on which a substrate is mounted, light sources that irradiate the substrate with a plurality of focus beams directed towards the substrate at different angles, sensors that detect the focus beams reflected from the substrate, and a controller that determines the relative location...

20060103823 - Focus monitoring method: A shot of a focus-monitoring mark is provided on a wafer at a first focus position (ΔDF) defocused from a second focus position (Fk) by a certain amount to measure a dimension (La) of the focus-monitoring mark. The actual focus position (F) of the defocused shot is calculated by the...

20060103825 - Focus test mask, focus measurement method and exposure apparatus: This focus test mask is provided with a test pattern that is projected onto a wafer via a projection optical system. This test pattern includes: a plurality of line patterns that are lined up in a direction of measurement; phase shift sections that are provided in areas adjacent to each...

20060103828 - Adjustable illumination blade assembly for photolithography scanners: A method and structure for providing adjustable optical lithography illumination comprises a blade which can be customized to provide a desired light pattern. The adjustable blade can be selectively configured to optimize a light pattern during development of a photolithographic process, then the optimized pattern can be transferred to a...

20060103827 - Lithographic apparatus and device manufacturing method: In a maskless lithography apparatus light deflected by a patterning array out of a path towards a substrate is directed onto a detector that detects malfunctions of the patterning array. If the patterning array is of a type which selectively diverts radiation in order to pattern the beam, the detector...

20060103826 - Lithographic apparatus, method of determining properties thereof and computer program: A lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate using a projection system. The lithographic apparatus comprises: an interferometric sensor for measuring the wavefront of the radiation beam at the level of the substrate, the interferometric sensor having a detector; an...

20060103829 - Exposure apparatus and exposure method: An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on the exposure target substrate as a result of exposure by the exposure heads; and light adjusting means...

20060103833 - Aligning apparatus and its control method, and exposure apparatus: An aligning apparatus having a stage movable on a stage base, a table, which is provided on the stage and which is movable while holding an object to be aligned, an actuator to perform alignment of the stage, an actuator to perform alignment of the table, an electromagnetic coupling, which...

20060103831 - Lithographic apparatus and device manufacturing method: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate....

20060103830 - Method and apparatus for immersion lithography: An apparatus for holding a wafer and a method for immersion lithography. The apparatus, including a wafer chuck having a central circular vacuum platen, an outer region, and a circular groove centered on the vacuum platen, a top surface of the vacuum platen recessed below a top surface of the...

20060103832 - Wafer table for immersion lithography: Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to...

20060098175 - Lithographic apparatus and device manufacturing method: A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs...

20060098178 - Exposure apparatus, exposure method, and method for producing device: A liquid immersion photolithography system has an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system. In addition, a liquid flow is provided between the projection optical system and the exposure area. Further, a member at one side of the...

20060098177 - Exposure method, exposure apparatus, and exposure method for producing device: When exposing a substrate by projecting a pattern image onto the substrate via a projection optical system (PL) and liquid (1), an exposure method includes a determination of a liquid immersion condition to be performed to the substrate, such as a liquid type, depending on a film (SP) formed as...

20060098179 - Exposure method, exposure apparatus, and method for producing device: A liquid immersion photolithography system has an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. In addition, a plurality of...

20060098180 - Lithographic apparatus and device manufacturing method: In an immersion lithography apparatus, an isolator is provided between the substrate table and the projection system to, for example, prevent currents in the liquid exerting forces on the projection system that might tend to distort the reference frame to which said projection system is connected. The isolator may be...

20060098176 - Lithographic apparatus, device manufacturing method, and substrate table: A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the patterned beam onto a target portion of...

20060098181 - Advanced exposure techniques for programmable lithography: Advanced techniques for programmable photolithography provide enhanced resolution and other aspects of a photolithography system. A combination of multiple exposures and movement of a substrate relative to a programmable mask in a photolithographic system accomplishes single shutter exposure overlaps to create features smaller than the single shutter intensity profile, i.e.,...

20060098183 - Exposure system, test mask for monitoring polarization, and method for monitoring polarization: An exposure system includes an exposure tool configured to project grating patterns oriented in different directions onto test areas by a linearly polarized light, respectively, each of the grating patterns having a space width preventing higher order diffracted lights from an image formation, a data collector configured to collect sets...

20060098182 - Radially polarized light in lithographic apparatus: The present invention relates to a lithographic apparatus and a method of using the apparatus in the manufacture of a device such as an integrated circuit (IC). In particular, the present invention relates to a lithographic apparatus designed to be used with radiation having a wavelength in the Deep Ultra-Violet...

20060098185 - Mask holder for irradiating uv-rays: A mask holder for irradiating UV-rays is disclosed in the present invention. The mask holder includes a lower part having a frame and a mask supporting member supporting a mask, wherein the mask supporting member is in the frame and has a plurality of first connecting portions, and an upper...

20060098184 - Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method: A stage apparatus including: a movement member movable with a plate member placed on a placement surface; and a fixing apparatus that fixes said plate member to said placement surface in parallel with said movement member passing through a prescribed first region....

20060092392 - Projection optical system, exposure apparatus and method using the same: A projection optical system includes an optical element that includes and locally uses a reflective or refractive area that is substantially axially symmetrical around an optical axis, the optical element being rotatable around the optical axis....

20060092393 - Lithographic apparatus having an adjustable projection system and device manufacturing method: A system and method use a pattern generator to pattern illumination that is projected using an adjustable projection system to form one or more devices on a substrate. The adjustable projection system includes at least one active mirror, which is adjusted to compensate for errors found on a surface of...

20060092394 - Lithographic tool with dual isolation system and method for configuring the same: An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle...

20060092395 - Apochromatic unit-magnification projection optical system: A projection optical system suitable for projection photolithography is disclosed. The projection optical system is a modified Wynne-Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The projection optical system includes a positive lens group arranged adjacent to but spaced apart from...

20060092396 - Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane: A lithography system comprises an illumination system that supplies radiation and a projection system comprising an optical system and a patterning device located at a pupil plane. The patterning device patterns the radiation and the optical system projects the patterned radiation onto a target portion of a substrate. In one...

20060092397 - Lithographic apparatus and device manufacturing method: A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding...

20060092398 - Method and apparatus for variable polarization control in a lithography system: A polarization control device for a lithography system selectively polarizes light in horizontal, vertical and/or circular orientations. A pair of relatively rotatable quarter-wave plates move to provide the desired polarization. When the quarter-wave plates are at a relative angle of 45 degrees, the polarization is circular. When the quarter-wave plates...

20060092399 - Lithographic apparatus, a control system for controlling a lithographic apparatus, and a device manufacturing method: The present invention relates to a lithographic apparatus that includes a substrate table constructed and arranged to hold a plurality of substrates at a plurality of respective exposable locations on the substrate table, and a projection system constructed and arranged to project a patterned radiation beam onto a target portion...

20060092400 - Printing system for use with microencapsulated media: A printing system having a printer that is adapted to develop images on microencapsulated media. The printing system includes a pressure applicator that includes micro-features that are adapted to contact the media to develop images on the media. The invention provides for improved image quality while enabling the use of...