Photocopying inventions 02/06

20060038968 - Lithographic apparatus and device manufacturing method: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous...

20060038970 - Exposure method and exposure apparatus: For each of pattern projection regions, a mask and a substrate are moved in synchronization with each other in an X direction while projecting a portion of a mask pattern through an optical projection system onto a portion of the pattern projection region. An exposure region is thereby shifted from...

20060038969 - Lithographic apparatus and device manufacturing method: An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a...

20060038971 - Dual reticle device and assembling method thereof: A dual reticle device comprising a ring structure, a first reticle and a second reticle is provided. Four positioning grooves parallel to the axis of the ring structure are formed on the external side surface of the ring. The first reticle and the second reticle are disposed on a first...

20060038972 - Lithographic system with separated isolation structures: Methods and apparatus for isolating or separating a reticle stage arrangement from a lens assembly are disclosed. According to one aspect of the present invention, an apparatus includes a reticle stage assembly, a lens assembly, and an isolator assembly. The isolator assembly is arranged to substantially prevent vibrations from being...

20060038973 - Patterned mask holding device and method using two holding systems: A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and...

20060038974 - Pellicle frame and pellicle for photolithography using the same: A frame that prevents the decrease in the exposure area by preventing the frame from curving inward by the tensile force of the pellicle membrane and makes it possible to obtain a pellicle having excellent dimensional accuracy and attachment position accuracy on a photomask, and a pellicle for photolithography using...

20060033894 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece...

20060033893 - Exposure technique: An atmosphere control technique for an exposure apparatus. An exposure apparatus to which this technique is applied includes, for example, a chamber which contains a space through which exposure light passes, a circulation system which has a path and circulates an inert gas through the path and the chamber, at...

20060033892 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus...

20060033897 - Apparatus for forming pattern: An apparatus for forming a pattern has a light-modulating unit, a scanner, a pattern data processor, a light modulating controller, a position-error detector, and a correction value calculator. The pattern data processor generates band-pattern data corresponding to each scanning band on the basis of pattern data matching a preceding pattern...

20060033899 - Environmental system including vacuum scavenge for an immersion lithography apparatus: An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion...

20060033896 - Exposure apparatus and exposing method: An exposure apparatus for exposing an object to be exposed by elastically deforming an exposing mask having a micro-opening pattern so as to bring the exposing mask into contact with the object includes a compression/decompression section for elastically deforming the exposing mask with compression/decompression so as to bring the exposing...

20060033901 - Exposure apparatus and method for manufacturing device: An exposure apparatus wherein an image of a pattern is projected onto a substrate via a projection optical system to expose the substrate, includes: a substrate moving device that is movable while holding the substrate above the projection optical system; and a liquid immersion unit that fills at least a...

20060033900 - Exposure method and apparatus: There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thicker than the dummy...

20060033895 - Illumination system having a more efficient collector optic: An illumination system having a light source is disclosed, the light source having a source size and emitting radiant power in a spatial angle element Ω(α), α indicating the aperture angle, a collector, which collects radiant power from the source up to a first maximum aperture angle αmax(1), a first...

20060033898 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control...

20060033902 - System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool: The present invention provides systems and methods for maskless lithographic printing that compensate for static and/or dynamic misalignments and deformations. In an embodiment, a misalignment of a pattern formed by a spatial light modulator is measuring during printing. Rasterizer input data is generated based on the measured misalignment and passed...

20060033903 - Moving mechanism with high bandwidth response and low force transmissibility: Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing...

20060033904 - Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method: A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate, and a sensor that identifies an identification sign provided on the plate....

20060033905 - Pellicle-reticle methods with reduced haze or wrinkle formation: Methods for using and/or storing a pellicle-reticle assembly that does not result in the formation of haze on the reticle and/or the formation of wrinkles on the pellicle....

20060033906 - Exposure device: A laser exposure device at which alignment marks of a plate material on an exposure stage, which is moving in a direction opposite to a scanning direction, are read by a CCD camera mounted at a support gate, after which an imaging region, whose position is judged using the alignment...

20060028629 - Exposure apparatus: An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the coolant flowing in the channel, and a UV sterilization unit which performs UV sterilization processing for...

20060028628 - Lens cleaning module: A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in...

20060028627 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is disclosed. The apparatus includes the following components: an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target...

20060028626 - Megasonic immersion lithography exposure apparatus and method: A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer. An optical transfer chamber is provided adjacent to the optical system for containing...

20060028632 - Environmental system including vacuum scavenge for an immersion lithography apparatus: An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion...

20060028631 - Exposure apparatus and exposure method: An exposure apparatus which projects a pattern of an original onto a substrate. The apparatus includes an original stage which supports the original, a substrate stage which supports the substrate, a reference pattern which is arranged on the original stage and to align the original stage and the substrate stage,...

20060028630 - Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method: A liquid immersion exposure apparatus for exposing a pattern onto a substrate through a projection lens unit while a space between the substrate and the projection lens unit is filled with a liquid, the apparatus including a stage which carries the substrate, and a controller which controls the driving of...

20060028633 - Laser crystallization apparatus: A laser crystallization apparatus has a light source, a phase shifter which modulates a laser light from the light source, an illumination system which is provided between the light source and the phase shifter, homogenizes a light intensity of the laser light from the light source and illuminates the phase...

20060028634 - Multiple exposures of photosensitve material: A method of accurately registering successive exposures of photosensitive material by forming between the exposures an image of the latent exposure pattern caused by initial exposures. In a photosensitive material comprising a photo acid generator and an acid-catalyzed cross-linkable resin precursor, the image may be obtained by including in the...

20060023186 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece...

20060023185 - Cleanup method for optics in immersion lithography: An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination...

20060023182 - Environmental system including a transport region for an immersion lithography apparatus: An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier, an immersion fluid system, and a transport region. The fluid barrier is positioned near the device and maintains the transport region near the gap. The immersion fluid system delivers...

20060023187 - Environmental system including an electro-osmotic element for an immersion lithography apparatus: An environmental system that controls an environment in a gap between an optical assembly and a device includes a fluid barrier, an immersion fluid system, an electro-osmotic element, and a control system. The fluid barrier is positioned near the device and maintains the electro-osmotic element near the gap. The immersion...

20060023180 - Exposure apparatus and device manufacturing method: Disclosed is an apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, a first anti-vibration mount being supported by the first unit and for supporting a...

20060023188 - Exposure apparatus and method for manufacturing device: An exposure apparatus wherein an image of a pattern is projected onto a substrate via a projection optical system to expose the substrate, includes: a substrate moving device that is movable while holding the substrate above the projection optical system; and a liquid immersion unit that fills at least a...

20060023184 - Immersion lithography fluid control system: A fluid control system for immersion lithography that uses an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, includes a fluid-supplying device for providing an immersion fluid such as water to...

20060023183 - Liquid jet and recovery system for immersion lithography: A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as...

20060023189 - Lithographic apparatus and device manufacturing method: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space....

20060023178 - Lithographic apparatus and method for calibrating the same: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position...

20060023179 - Optical system of a microlithographic projection exposure apparatus: In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the...

20060023181 - Run-off path to collect liquid for an immersion lithography apparatus: An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device...

20060023190 - Lithographic apparatus and device manufacturing method: A lithographic apparatus and method include an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, and a projection system that directs the patterned beam a substrate supported on a substrate table. The projection system defines a pupil. Either the pupil...

20060023192 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, a substrate table for supporting a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system comprises...

20060023191 - Off-axis catadioptric projection optical system for lithography: The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold...

20060023193 - Projection exposure system for microlithography and method for generating microlithographic images: A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the...

20060023195 - Levitated reticle-masking blade stage: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference...

20060023194 - Lithographic apparatus and method for calibrating the same: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position...

20060023196 - Reticle gripper barrier system for lithography use: A reticle gripper barrier system for use in concert with a reticle gripper device that contacts a lithographic reticle is presented. In a particular embodiment, a reticle gripper barrier device includes a support plate affixed near or to the reticle gripper device and a gripper barrier or a set of...

20060023197 - Method and system for automated production of autostereoscopic and animated prints and transparencies from digital and non-digital media: A method and system for automated production of stereoscopic and animated images and hardcopies can utilize a light-sensitive lenticular material employing a conventional or non-conventional photographic emulsion or an instant-developing material. An automated printer can produce autostereoscopic and animated hardcopies in multiple formats from digital and non-digital sources, including single...

20060023198 - Method for correcting structure-size-dependent positioning errors in photolithography: A method for correcting structure-size-dependent positioning errors during the photolithographic projection by an exposure apparatus and the use thereof includes providing an exposure apparatus for exposing a plurality of exposure fields and a simulation model of the exposure apparatus for specifying correction values for intra-field errors, providing a first pattern...