| Photochromic substrate container -> Monitor Keywords |
|
|
  Photochromic substrate containerUSPTO Application #: 20060292749Title: Photochromic substrate container Abstract: A semiconductor wafer, substrate, or reticle storage or shipping device that includes a photochromic indicator of exposure to undesired electromagnetic radiation. The present invention includes the incorporation of a photochromic material into the plastic used to fabricate at least a portion of a semiconductor wafer, disk, or reticle shipping or storage containers. The container may include photochromic material in the form of a transparent window or a larger portion of the container. the photochromic material may change color or darkness in response to exposure to a selected range of wavelengths of light. (end of abstract) Agent: Patterson, Thuente, Skaar & Christensen, P.A. - Minneapolis, MN, US Inventors: John Burns, Matthew A. Fuller, Jeffery J. King, Martin L. Forbes, Mark V. Smith USPTO Applicaton #: 20060292749 - Class: 438116000 (USPTO) Related Patent Categories: Semiconductor Device Manufacturing: Process, Packaging (e.g., With Mounting, Encapsulating, Etc.) Or Treatment Of Packaged Semiconductor, Having Light Transmissive Window The Patent Description & Claims data below is from USPTO Patent Application 20060292749. Brief Patent Description - Full Patent Description - Patent Application Claims
RELATED APPLICATION [0001] This application is a continuation of application Ser. No. 10/971,556 filed Oct. 22, 2004, which claims the benefit of U.S. Provisional Application No. 60/514,164 filed Oct. 24, 2003. FIELD OF THE INVENTION [0002] The invention relates to wafers containers for transport, shipping and storage of substrates. BACKGROUND OF THE INVENTION [0003] During processing semi-conductor wafers are subjected to numerous process steps in various machines and at various locations. The wafers must be transported from workstation to workstation and from facility to facility to accomplish these various steps. Numerous types of shipping devices are known for handling storing and shipping semi-conductor wafers. In general, such devices hold the wafers in axially aligned arrays. Where wafers are shipped from facility to facility the wafers may be exposed to sunlight for significant periods of time. Sunlight includes substantial amounts of electromagnetic radiation in the ultraviolet wavelengths. Wafer containers may also be exposed to ultraviolet light from other sources. [0004] Current, state of the art, semi-conductor lithography production processes use deep ultraviolet lasers to image circuits with critical features ranging in size as small as one hundred thirty to one hundred fifty nanometers. It is expected that in the near future critical features may shrink to a size range of about seventy nanometers. [0005] In the production process wafers are spin coated with a photoresist. The photoresist is then baked to adhere it to the wafer. Next, an image of the desired circuitry is projected onto the wafer using electromagnetic radiation. Today, this is commonly deep ultraviolet radiation from a laser. The photoresist material is chemically altered by exposure to ultraviolet light to create either a negative or positive image of the circuit depending on the process used. The undesired photoresist material is then etched away leaving an integrated circuit pattern on the wafer. [0006] As discussed above, photoresists that are used in semi-conductor processes are sensitive to light in the ultraviolet wavelengths. Because of the tiny size of the critical elements of modern integrated circuits only a very small exposure to uncontrolled ultraviolet radiation can lead to spoilage of a wafer. Consequently, it is desirable, in the production process, that photoresists only be exposed to the ultraviolet wave lengths of light under carefully controlled conditions. Unintended exposure will destroy the usability of wafers exposed. [0007] Thus, wafer shipping containers used in the handling, storing and shipping of wafers are made of materials, typically plastics, that block ultraviolet light to prevent it from affecting wafers coated with photoresist material. It is also desirable that wafer shipping containers be, at least partially transparent to visible light to allow workers to determine whether a shipping container is empty or full. Thus, shipping containers have been made of materials that are transparent, at least in part, to visible light but that are relatively opaque to ultraviolet light. [0008] Nonetheless, ultraviolet blocking is never absolute and it is desirable to expose wafer containers to ultraviolet radiation as little as possible. Thus, it would be a benefit to the semiconductor industry if wafer containers themselves could signal to workers that the wafer container was currently exposed to ultraviolet radiation. This would signal the worker to move the wafer container to an ultraviolet sheltered location. [0009] Additionally, similar issues exist with regard to the storage and processing the disks for computer hard drives and the reticles for the lithography operations. SUMMARY OF THE INVENTION [0010] The present invention solves the above problem by providing a semiconductor wafer, substrate, or reticle storage or shipping device that includes a photochromic indicator of ultraviolet exposure. [0011] Photochromic materials darken when exposed to sunlight or another source of ultraviolet radiation. Photochromic material transitions between two different states. A low energy state in which the material is clear, uncolored and an activated state in which the material is colored. When electromagnetic radiation of an appropriate energy level impinges on the photochromic material. [0012] The present invention includes the incorporation of a photochromic material into the plastic used to fabricate semiconductor wafer, disk, or reticle shipping or storage containers. [0013] In operation, the photochromic container is used to transport and store semiconductor wafers in a similar fashion to any other semiconductor shipping container. However, if the container is left exposed to sunlight or another source of ultraviolet radiation that may, with sufficient time, have an affect on the photoresist layer which is sensitive to ultraviolet radiation, the shipping container will darken in color. This darkening in color will provide an immediate indication to the shipping workers that the containers are being exposed to ultraviolet light and should be removed from the situation as soon as possible to avoid having a negative affect on the photoresist materials. [0014] It is known in the prior art to introduce organic molecules exhibiting photochromic properties into a number of light-transmissible articles. [0015] The fabrication of photochromic polymers is known in the polymer arts. Some available options for introducing dyes into a polymer article, such as a wafer carrier, are, for example: (1) Impregnation or imbibing from a fluid medium contacting the surface of the polymer, (2) Incorporation of the dye in a resin coating applied to the surface; (3) Impregnation or diffusive transfer from a solid or gel in contact with the polymer surface, (4) Dispersion of the dye in the monomer or thermoplastic from which the article is to be fabricated. [0016] In operation, the photochromic container is used to transport and store semiconductor wafers, disks, or reticles in a similar fashion to any other known substrate container. However, if the container is left exposed to sunlight or another source of ultraviolet radiation that may, with sufficient time, have an affect on the photoresist layer which is sensitive to ultraviolet radiation, the shipping container will darken in color. This darkening in color can provide an immediate indication to the shipping workers that the containers are being exposed to ultraviolet light and should be removed from the situation as soon as possible to avoid having a negative affect on the photoresist materials. Additionally, the darkening in color can provide the functional effect of reducing the UV entering the container. BRIEF DESCRIPTION OF THE DRAWINGS [0017] FIG. 1 depicts an exemplary partially transparent wafer container; and [0018] FIG. 2 depicts an exemplary substantially transparent wafer container. DETAILED DESCRIPTION OF THE INVENTION Continue reading... Full patent description for Photochromic substrate container Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Photochromic substrate container patent application. ###  How KEYWORD MONITOR works... a FREE service from FreshPatents1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. Each week you receive an email with patent applications related to your keywords. Start now! - Receive info on patent apps like Photochromic substrate container or other areas of interest. ### Previous Patent Application: Package having bond-sealed underbump Next Patent Application: Top-surface-mount power light emitter with integral heat sink Industry Class: Semiconductor device manufacturing: process ### FreshPatents.com Support Thank you for viewing the Photochromic substrate container patent info. IP-related news and info Results in 0.18611 seconds Other interesting Feshpatents.com categories: Daimler Chrysler , DirecTV , Exxonmobil Chemical Company , Goodyear , Intel , Kyocera Wireless , |
||
