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02/22/07 - USPTO Class 355 |  78 views | #20070041000 | Prev - Next | About this Page  355 rss/xml feed  monitor keywords

Pattern formed body and method for manufacturing same

USPTO Application #: 20070041000
Title: Pattern formed body and method for manufacturing same
Abstract: A main object of the present invention is to provide a pattern formed body capable of forming highly precise functional parts on various base materials, and a method for manufacturing the same. To achieve the object, the present invention provides a method for manufacturing a pattern formed body, having a plasma radiating step of radiating plasma to a patterning substrate having: a base material; an intermediate layer formed on the base material and containing a silane coupling agent or a polymer of the silane coupling agent; and a resin layer formed in a pattern form on the intermediate layer, wherein a fluorine gas is used as an introduction gas to radiate the plasma from the resin layer side. (end of abstract)



Agent: Seyfarth Shaw LLP - Chicago, IL, US
Inventor: Hironori Kobayashi
USPTO Applicaton #: 20070041000 - Class: 355030000 (USPTO)

Pattern formed body and method for manufacturing same description/claims


The Patent Description & Claims data below is from USPTO Patent Application 20070041000, Pattern formed body and method for manufacturing same.

Brief Patent Description - Full Patent Description - Patent Application Claims
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BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a pattern formed body which is capable of forming a highly precise functional part and is used to manufacture such as a color filter, a microlens, an organic electroluminescent (hereinafter, may be referred to as an organic EL) element, or a cell culturing substrate; a method for manufacturing the same; and so on.

[0003] 2. Description of the Related Art

[0004] Conventionally, various methods have been suggested as a method for manufacturing a pattern formed body wherein various patterns such as designs, images, characters, and circuits are formed on a base material. For example, the following is used: lithography, offset printing, or a printing process wherein a lithographic original plate using a heat mode recording material is formed. There is also known, for example, a method for manufacturing a pattern formed body by photolithography of radiating light in a pattern form to a photoresist layer applied on a base material and developing the photoresist after the radiation to perform etching, or of using a material having functionality as a photoresist and radiating light to the photoresist so as to form a target pattern directly.

[0005] However, the above-mentioned printing processes have a problem such as that at the time of manufacturing a highly precise pattern formed body used in, for example, a color filter, only a low location accuracy is attained. Thus, it is difficult to use the printing processes. The above-mentioned photolithography has a problem that it becomes necessary to treat waste liquid since it is necessary to use a photoresist and further develop the resist with a developing solution or perform etching after radiation of light to the resist, and other problems. When a functional material is used as a photoresist to form a functional part, there is caused a problem that the functional part is deteriorated by such as an alkaline solution that is used in development.

[0006] Thus, as a method for forming a colored layer of a color filter or the like, suggested is a method of forming a bank made of a resin on a base material made of, such as an inorganic material, radiating plasma to the entire surface thereof while using a fluorine compound as an introduction gas to make only the bank liquid repellent, and causing a colored layer forming coating solution to stay between individual portions of the bank, thereby forming a colored layer (Japanese Patent Application Laid-Open (JP-A) No. 2000-187111). This is a method using the fact that when plasma treatment is conducted using a fluorine compound as an introduction gas, the fluorine can be introduced into only an organic material but not into any inorganic material. However, in this method, as the base material, one made of an organic material cannot be used and one made of an inorganic material is used; therefore, there is caused a problem that the adhesive property between the bank or the functional part of a colored layer formed by using the bank and the base material becomes low. Additionally, for example, even if a base material made of an organic material is used, there arise a problem by the above-mentioned plasma radiation that the adhesive property between the base material and the bank of the resin layer declines, and other problems.

SUMMARY OF THE INVENTION

[0007] Thus, it is desired to provide a pattern formed body capable of forming highly precise functional parts on various base materials, and a method for manufacturing the same.

[0008] The invention provides a method for manufacturing a pattern formed body, having a plasma radiating step of radiating plasma to a patterning substrate having: a base material; an intermediate layer formed on the base material and containing a silane coupling agent or a polymer of the silane coupling agent; and a resin layer formed in a pattern form on the intermediate layer, wherein a fluorine gas is used as an introduction gas to radiate the plasma from the resin layer side.

[0009] In the present invention, when the above-mentioned plasma radiation is performed, the fluorine gas can be introduced onto the resin layer, so that the upper face of the resin layer can be rendered a region having liquid repellency. At this time, in a region where the intermediate layer is exposed, a Si--C bond of the silane coupling agent or the polymer thereof is broken through the plasma radiation, whereby an organic group bonded to the Si element is removed and an OH group or the like is introduced thereto. Thus, the region is rendered a lyophilic region. Consequently, according to the invention, a difference in wettability between the resin layer and the region where the intermediate layer is exposed can be made large. The use of this difference in the wettability makes it possible to manufacture a pattern formed body capable of forming a functional part highly precisely only in the region where the intermediate layer is exposed. In the invention, the intermediate layer is formed; therefore, not only a base material made of an inorganic material but also a base material made of an organic material can be used as the above-mentioned base material. Additionally, the invention has an advantage that the adhesive property between the base material and the resin layer can be made good even if a base material made of an inorganic material is used as the above-mentioned base material. Additionally, in the plasma radiating step, the adhesive property between the base material and the resin layer is not lowered since the intermediate layer is formed.

[0010] The invention also provides a pattern formed body having: a base material; an intermediate layer formed on the base material and containing a silane coupling agent or a polymer of the silane coupling agent; and a liquid repellent resin layer formed in a pattern form on the intermediate layer and containing a fluorine in its surface.

[0011] According to the pattern formed body of the invention, a difference in wettability between the upper face of the liquid repellent resin layer and a region where the intermediate layer is exposed is used to make it possible to form a functional part highly precisely only on the region where the intermediate layer is exposed. Moreover, in the invention, the intermediate layer is formed; therefore, the invention has an advantage that the adhesive property between the functional part formed on the pattern formed body of the invention and the base material can be made good even if the above-mentioned base material is made of an inorganic material.

[0012] The region of the intermediate layer where the liquid repellent resin layer is not formed is preferably rendered a lyophilic region having a contact angle with water, in its surface, of 60.degree. or less.

[0013] This makes it possible that a difference in wettability between the upper face of the liquid repellent resin layer and the region where the intermediate layer is exposed is made large, thereby manufacturing a pattern formed body capable of forming a functional part further highly precisely.

[0014] The present invention also provides: a color filter, wherein a colored layer is formed on the lyophilic region of the above-mentioned pattern formed body; an organic EL element, wherein an organic EL layer is formed on the lyophilic region of the above-mentioned pattern formed body; and a microlens, wherein a lens is formed on the lyophilic region of the above-mentioned pattern formed body. According to the invention, in the pattern formed body, the region where the liquid repellent resin layer is formed, that is, the liquid repellent region, and the lyophilic region are formed; therefore, the wettability difference therebetween is used to make it possible to manufacture a functional element wherein various functional parts are highly precisely formed only in the lyophilic region. The invention also has an advantage that in this case the adhesive property between the functional part and the base material can be made good.

[0015] The invention also provides a cell culturing substrate, wherein the upper face of the lyophilic region of the above-mentioned pattern formed body is used to culture a cell. According to the invention, in the pattern formed body, the liquid repellent region and the lyophilic region are formed; therefore, the wettability difference therebetween is used to make it possible to manufacture a cell culturing substrate for culturing cells in a highly precise pattern only in the lyophilic region.

[0016] In the method for manufacturing the pattern formed body of the invention, the wettability difference between the resin layer and the region where the intermediate layer is exposed can be made large since the above-mentioned plasma radiating step is performed. Accordingly, this wettability difference is used to make it possible to manufacture a pattern formed body capable of forming a functional part highly precisely only in the region where the intermediate layer is exposed. Additionally, the invention produces advantages that: as the base material, various ones can be used; and further the adhesive property between the base material and the functional part can be made good.

BRIEF DESCRIPTION OF THE DRAWINGS

[0017] FIG. 1 is a process drawing illustrating an example of a method for manufacturing the pattern formed body of the invention; and

[0018] FIG. 2 is a schematic sectional view illustrating an example of the pattern formed body of the invention.

DESCRIPTION OF THE PREFERRED EMBODIMENT

[0019] The present invention relates to a pattern formed body which is capable of forming a highly precise functional part and is used to manufacture such as a color filter, a microlens, an organic EL element, or a cell culturing substrate; a method for manufacturing the same; and so on. Each of them will be described hereinafter.

A. Method for Manufacturing a Pattern Formed Body

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Previous Patent Application:
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
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