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Browse Inventors: A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z Michael N. GrimbergenRecent sampling of patent applications for Michael N. Grimbergen listed and published in the public domain by the USPTO (USPTO Patent Application #,Title):20080099432 - Process for etching a transparent workpiece including backside endpoint detection steps 20080099434 - Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside 20080099437 - Plasma reactor for processing a transparent workpiece with backside process endpoint detection 20080099450 - Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution 20080100222 - Mask etch plasma reactor with cathode providing a uniform distribution of etch rate 20080100223 - Plasma reactor for processing a workpiece and having a tunable cathode 20080102001 - Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors 20080102202 - Mask etch plasma reactor with variable process gas distribution
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