| Methods for forming alignment marks on semiconductor devices -> Monitor Keywords |
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  Methods for forming alignment marks on semiconductor devicesUSPTO Application #: 20070172977Title: Methods for forming alignment marks on semiconductor devices Abstract: A semiconductor device includes alignment marks that are aligned with device features. The semiconductor device includes a device feature, a pair of first alignment marks, a pair of second alignment marks, and a pair of third alignment marks. The first alignment marks are aligned along a first direction with the device feature and adjacent to opposite sides of the device feature. The second alignment marks are aligned along a second direction with the device feature that is substantially perpendicular to the first direction, and adjacent to opposite sides of the device feature. The third alignment marks are aligned with the first alignment marks in the first direction and adjacent to opposite sides of the device feature, wherein the third marks are between the first alignment marks and the device feature, and each of the third marks have a shorter length along the first direction than each of the first alignment marks. (end of abstract) USPTO Applicaton #: 20070172977 - Class: 438062000 (USPTO) Related Patent Categories: Semiconductor Device Manufacturing: Process, Making Device Or Circuit Responsive To Nonelectrical Signal, Responsive To Electromagnetic Radiation, Continuous Processing, Using Running Length Substrate
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