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  Method of forming component interface in semiconductor or mems manufactureUSPTO Application #: 20060115960Title: Method of forming component interface in semiconductor or mems manufacture Abstract: A method of forming component interface in semiconductor or MEMS manufacture is by way of a bad adhesion material or manufacture, or an easy etching and removable material, to form an easily removed component interface in the middle between a manufactured substrate and a layer of semiconductor circuit or MEMS component formed on the manufactured substrate as a basis, therefore, after semiconductor or MEMS manufacture is completed, the component interface is so easily destroyed by an external force that the layer of semiconductor circuit or MEMS component is easily separated from the manufactured substrate. (end of abstract) Agent: Bacon & Thomas, PLLC - Alexandria, VA, US Inventor: Wen-Chang Dong USPTO Applicaton #: 20060115960 - Class: 438458000 (USPTO) Related Patent Categories: Semiconductor Device Manufacturing: Process, Bonding Of Plural Semiconductor Substrates, Subsequent Separation Into Plural Bodies (e.g., Delaminating, Dicing, Etc.) The Patent Description & Claims data below is from USPTO Patent Application 20060115960. Brief Patent Description - Full Patent Description - Patent Application Claims
BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention generally relates to a method of forming component interface in semiconductor or microelectromechanical system (MEMS) manufacture, more particularly; it is applicable to making a flexible MEMS thin film product without a manufactured substrate. [0003] 2. Description of the Prior Art [0004] Conventionally, semiconductor wafer manufacture is meant the semiconductor technique manufactured on a silicon chip. It includes lithography, etching, plating, thin film, chemical mechanical polishing, and ion implantation. For example, the lithography technique is used for image transformation, plating technique is used for plating the metal, ion dry etching is used for anisotropic etching, chemical wet etching is used for isotropic etching, and thin film is used for metal or non-metal thin film growth and coating. [0005] In sum, the semiconductor manufacture uses different kinds of micro image transformation techniques accompanied with different etching, thin film growth and coating, physical and chemical plating to process the metal or non-metal material on the substrate. After the semiconductor manufacture is done, the semiconductor or component is cut along with the substrate for processing other assemblies. [0006] Moreover, different kinds of MEMS techniques developed by the semiconductor manufacture recently can use micro-process techniques to manufacture different kinds of micro mechanisms and MEMS components of micro structure, sensor component, and opto-electronic components on the manufactured substrate. However, only a few micro structures can be removed individually. In other words, most MEMS components for package, testing, or other manufactures require cutting along the manufactured substrate. [0007] However, the structure of the semiconductor or MEMS component with the manufactured substrate has many structural disadvantages including: [0008] 1. As shown in FIG. 1, a manufactured substrate (10) occupies the volume of a component (60) over 80%, and the manufactured component (60) is required to process polishing on the manufactured substrate (10). [0009] 2. The component (60) can only connect or assembly with circuits on one single side, but we cannot design the circuits on both sides at the same time. Therefore, the structure will affect the design and function of the component (60). [0010] For example, the pressured sensor component used by the MEMS capacitor in package or assembly process requires a single side of the pressure sensor component contacting the environment. Otherwise, it will affect the sensibility of the pressure sensor component. [0011] Or, as shown in FIG. 2 is an example showing the CMOS sensor component (70) of the opto-electronic component. It illustrates that the sensor unit needs to be avoided being covered in the package manufacture. Further, FIG. 3 is another example showing that the CMOS sensor component (70) of the opto-electronic component requires using the transparent package substrate (75). SUMMARY OF THE INVENTION [0012] The primary object of the present invention is to provide a method of forming a component interface in a semiconductor or microelectromechanical system (MEMS) manufacture. More particularly, the semiconductor or MEMS component can be manufactured without a manufactured substrate. The present invention uses different kinds of component interface methods in the middle between layers of the manufactured substrate and the semiconductor component or the MEMS component in the semiconductor or the MEMS process. Therefore, the sequent manufacture can separate the component interface by the external force for achieving the purpose of separation between the semiconductor or MEMS component and the manufactured substrate. [0013] Another object of the present invention is to provide a flexible MEMS thin film without a manufactured substrate. By using in manufacture of forming a component interface, the MEMS thin film can be out of the limitation from the manufactured substrate. Further, it can have flexibility, particularly, both sides of the MEMS thin film can manufacture as an electrical circuit, a micro structure, or all kinds of MEMS components. The present invention, therefore, is widely applied in practice. BRIEF DESCRIPTION OF THE DRAWINGS [0014] FIG. 1 is a prior art showing the semiconductor or MEMS component with the manufactured substrate, and the manufactured substrate over 80% of the component; [0015] FIG. 2 shows a prior CMOS sensor component of the opto-electronic component requiring avoiding covering the sensor unit during packaging; [0016] FIG. 3 shows another prior CMOS sensor component requiring the transparent package substrate; [0017] FIG. 4 is one of the preferred embodiments in the present invention showing a component interface used by a bad adhesion material; [0018] FIG. 5 is one of the preferred embodiments in the present invention showing the component interface used by bad adhesion manufacture; [0019] FIG. 6 is one of the preferred embodiments in the present invention showing the component interface used by a removable material. [0020] FIG. 7 shows a flow chart used by the method of forming the component interface of the present invention applying different kinds of MEMS thin films. [0021] FIG. 8 is one of the preferred embodiments in the present invention showing the flexible MEMS thin film without the manufactured substrate used by the method of forming the component interface in the present invention. [0022] FIG. 9 is one of the preferred embodiments in the present invention showing that the circuit joint and the micro structure can be individually manufactured on different sides of the MEMS thin film, particularly one side of the MEMS thin film forms a circuit connection without affecting the function on the other side of the micro structure. [0023] FIG. 10 is one of the preferred embodiments in the present invention showing that the substrate is removed after the assembly. Continue reading... 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