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Method of forming a metal line and method of manufacturing a display substrate by using the sameMethod of forming a metal line and method of manufacturing a display substrate by using the same description/claimsThe Patent Description & Claims data below is from USPTO Patent Application 20070249097, Method of forming a metal line and method of manufacturing a display substrate by using the same. Brief Patent Description - Full Patent Description - Patent Application Claims
CROSS-REFERENCE TO RELATED APPLICATIONS [0001]This application claims priority to Korean Patent Application No. 2006-36745 filed on Apr. 24, 2006, the contents of which are herein incorporated by reference in their entireties. BACKGROUND OF THE INVENTION [0002]1. Technical Field [0003]The present invention relates to a display substrate, and more particularly, to a method of forming a metal line and a method of manufacturing a display substrate by using the method of forming a metal line. [0004]2. Discussion of the Related Art [0005]Generally, a liquid crystal display (LCD) device includes a display substrate and a counter substrate coupled to the display substrate to receive a liquid crystal layer. The display substrate has gate lines, source lines crossing the gate lines, switching elements connected to the gate and source lines, and pixel electrodes connected to the switching elements. Each switching element includes a gate electrode extending from the gate lines, a channel insulate from and overlapped with the gate electrode, a source electrode formed from the source lines and electrically connected to the channel, and a drain electrode spaced apart from the source electrode and electrically connected to the channel. [0006]Masks are employed in manufacturing the display substrate. In order to reduce manufacturing time and cost, the number of the masks needed to manufacture the display each of a gate metal patterning process, a channel patterning process, a source metal patterning process, a contact portion patterning process, and a pixel electrode patterning process, and thus a total of five masks may be employed. A four-mask process may be similar to the five-mask process described above however a single mask is used during both the channel patterning process and the source metal patterning process, and thus a total of four masks may be employed. [0007]In display substrates manufactured by the four-mask process, a source metal pattern and a channel pattern are patterned by using one mask. Therefore, the channel pattern is formed more protrusive than the source metal pattern. Having a more protrusive channel pattern reduces an aperture ratio and changes a coupling capacitance between the channel pattern and the pixel electrode. This may be due to a light leaked current, thereby changing waterfall effect noise and driving characteristics of the switching element to incur some problems such as an afterimage. SUMMARY OF THE INVENTION [0008]Embodiments of the present invention provide a method of forming a metal line capable of improving display quality. [0009]Embodiments of the present invention also provide a method of manufacturing a display substrate by using the above-mentioned method. [0010]A method of forming a metal line in accordance with an embodiment of the present invention is provided as follows. A channel layer and a metal layer are successively formed on a base substrate. A photoresist pattern is formed in a wiring area. The metal layer is etched by using the photoresist pattern to form a metal line. The photoresist pattern is removed by a predetermined thickness to form a residual photoresist pattern on the metal line. The channel layer is etched by using the metal line to form an undercut under the metal line. The protruding portion of the metal line is removed by using the residual photoresist pattern. The formation of the undercut may produce the protruding portion. [0011]A method of manufacturing a display substrate in accordance with an embodiment of the present invention is provided as follows. A channel layer and a source metal layer are successively formed on a base substrate having a gate line and a gate electrode of a switching element. A first photoresist pattern is formed in a source line area and a first area. A second photoresist pattern is formed in a second area. A source electrode and a drain electrode of the switching element are formed in the first area and a channel portion of the switching element is formed in the second area. Then, the source metal layer is patterned by using the first and second photoresist patterns to form an electrode metal pattern in the first and second areas and to form a source line in the source line area. A residual photoresist pattern is formed on the electrode metal pattern of the first area. The first and second photoresist patterns are removed by a predetermined thickness to expose the electrode metal pattern in the second area. The channel layer is etched using the electrode metal pattern and the source line to form undercuts under the electrode metal pattern and the source line. The electrode metal pattern is etched in the second area to form the source electrode and the drain electrode. A pixel electrode that is electrically connected to the drain electrode of the switching element is formed. [0012]According to the above, a protruding portion of a channel pattern disposed under a source line, a source electrode and a drain electrode is removed. As a result, an aperture ratio may be increased, an afterimage may be prevented, and display quality may be improved. BRIEF DESCRIPTION OF THE DRAWINGS [0013]The above and other features of the present disclosure will become more apparent be describing exemplary embodiments thereof with reference to the accompanying drawings, in which: [0014]FIG. 1 is a plan view illustrating a display substrate according to an exemplary embodiment of the present invention; [0015]FIG. 2A to 2G are cross-sectional views illustrating a method of manufacturing a display substrate according to an exemplary embodiment of the present invention; [0016]FIG. 3A to 3D are cross-sectional views illustrating a method of manufacturing a display substrate according to an exemplary embodiment of the present invention; and [0017]FIG. 4A to 4F are cross-sectional views illustrating a method of manufacturing a display substrate according to an exemplary embodiment of the present invention. DETAILED DESCRIPTION OF THE EXEMPLARY EMBODIMENTS [0018]The invention is described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. [0019]It will be understood that when an element or layer is referred to as being "on," "connected to" or "coupled to" another element or layer, it can be directly on, connected or coupled to the other element or layer or intervening elements or layers may be present. Continue reading about Method of forming a metal line and method of manufacturing a display substrate by using the same... 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