Method for fabricating nanotube electron emission source by scanning-matrix type electrophoresis deposition

Abstract: A scanning-matrix type electrophoresis deposition method fabricates nanotube electron emission source. During the electrophoresis deposition process, the electrical field is applied to a single pixel to localize the electrophoresis deposition. The cathode strips on the cathode plate are vertical to the anode strips of the anode plate. A sequential pulse voltage signal is applied to the cathode strips and the anode strips. Therefore only one electrical field is present for one pixel defined by the cathode strip cross with the anode strip at one time and nanotube is formed at that pixel. (end of abstract)

Agent: Hdsl - Fairfax, VA, US
Inventors: Kuei-Wen Cheng, Jin-Lung Tsai, Shie-Heng Lee, Yu-An Li, Chun-Yen Hsiao
USPTO Applicaton #: #20070187245 - Class: 204471000 (USPTO)
Related Patent Categories: Chemistry: Electrical And Wave Energy, Non-distilling Bottoms Treatment, Electrophoresis Or Electro-osmosis Processes And Electrolyte Compositions Therefor When Not Provided For Elsewhere, Coating Or Forming Of Object

Method for fabricating nanotube electron emission source by scanning-matrix type electrophoresis deposition description/claims

The Patent Description & Claims data below is from USPTO Patent Application 20070187245, Method for fabricating nanotube electron emission source by scanning-matrix type electrophoresis deposition.

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