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Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patentsThe following is a sampling of recent Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patent applications (USPTO Patent Application #, Patent Title) sorted by month.
April 2008 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20080096376 - Transparent zinc oxide electrode having a graded oxygen content 20080083610 - Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum March 2008 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20080060938 - Coaxial shafts for radial positioning of rotating magnetron 20080061285 - Metal layer inducing strain in silicon February 2008 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20080050922 - Chamber recovery after opening barrier over copper 20080029387 - Ganged scanning of multiple magnetrons, especially two level folded magnetrons December 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070293058 - Method of laser annealing using two wavelengths of radiation 20070281479 - Process including silo-chloro passivation for etching tungsten silicide overlying polysilicon 20070281477 - Process for etching tungsten silicide overlying polysilicon particularly in a flash memory September 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070209925 - Etch and sidewall selectivity in plasma sputtering August 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070190266 - Water vapor passivation of a wall facing a plasma July 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070151841 - Flexible magnetron including partial rolling support and centering pins May 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070114214 - Scanning laser light source 20070102284 - Small scanned magentron 20070095654 - Controlled multi-step magnetron sputtering process April 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070079936 - Bonded multi-layer rf window 20070077780 - Process to open carbon based hardmask March 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070045103 - Aluminum sputtering while biasing wafer February 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070023275 - Controllable target cooling 20070026693 - Method of thermally oxidizing silicon using ozone January 2007 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20070017798 - Evacuable magnetron chamber 20070020783 - Method of feed forward control of scanned rapid thermal processing 20070012562 - Method and apparatus for sputtering onto large flat panels December 2006 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20060289305 - Centering mechanism for aligning sputtering target tiles 20060289504 - Scanned rapid thermal processing with feed forward control 20060283703 - Bonding of target tiles to backing plate with patterned bonding agent 20060272935 - Multiple scanning magnetrons November 2006 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20060266638 - Multiple target tiles with complementary beveled edges forming a slanted gap therebetween 20060266639 - Sputtering target tiles having structured edges separated by a gap 20060251872 - Conductive barrier layer, especially an alloy of ruthenium and tantalum and sputter deposition thereof October 2006 - Law Offices Of Charles Guenzer Attn: Applied Materials, Inc. patents
20060240680 - Substrate processing platform allowing processing in different ambients 20060234458 - Dual wavelength thermal flux laser anneal 20060228818 - Edge temperature compensation in thermal processing particularly useful for soi wafers 20060223315 - Thermal oxidation of silicon using ozone
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