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Kamal Hadidi patents

Recent bibliographic sampling of Kamal Hadidi patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):



05/07/15 - 20150126355 - Method for making amorphous particles using a uniform melt-state in a microwave generated plasma torch
Feed material comprising uniform solution precursor droplets is processed in a uniform melt state using microwave generated plasma. The plasma torch employed is capable of generating laminar gas flows and providing a uniform temperature profile within the plasma. Plasma exhaust products are quenched at high rates to yield amorphous products....
Inventors: Kamal Hadidi, Makhlouf Redjdal (Amastan Technologies Llc)

11/20/14 - 20140342093 - Method for densification and spheroidization of solid and solution precursor droplets of materials using microwave generated plasma processing
A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch...
Inventors: Kamal Hadidi, Makhlouf Redjdal (Amastan Llc)

09/25/14 - 20140287162 - Microwave plasma apparatus and method for materials processing
A microwave plasma apparatus for processing a material includes a plasma chamber, a microwave radiation source, and a waveguide guiding microwave radiation from the microwave radiation source to the plasma chamber. A process gas flows through the plasma chamber and the microwave radiation couples to the process gas to produce...
Inventors: Eric Jordan, Baki Cetegen, Kamal Hadidi, Paul P. Woskov

08/07/14 - 20140217630 - Method for the production of multiphase composite materials using microwave plasma process
Disclosed herein is a method to produce multiphase composite materials directly from solution precursor droplets by a fast pyrolysis process using a microwave plasma embodiment containing a microwave generating source, a dielectric plasma torch, and a droplet maker. Here, using homogenous solution precursors, droplets are generated with a narrow size...
Inventors: Makhlouf Redjdal, Kamal Hadidi (Amastan Llc)

06/05/14 - 20140155249 - Method for making amorphous particles using a uniform melt-state in a microwave generated plasma torch
Feed material comprising uniform solution precursor droplets is processed in a uniform melt state using microwave generated plasma. The plasma torch employed is capable of generating laminar gas flows and providing a uniform temperature profile within the plasma. Plasma exhaust products are quenched at high rates to yield amorphous products....
Inventors: Kamal Hadidi, Makhlouf Redjdal

05/15/14 - 20140131906 - Method for the densification and spheroidization of solid and solution precursor droplets of materials using microwave generated plasma processing
A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch...
Inventors: Kamal Hadidi, Makhlouf Redjdal

04/03/14 - 20140091155 - High frequency uniform droplet maker and method
There is disclosed a piezoelectric droplet maker that is driven at high frequency and energized with high power and high frequency Operational Amplifier (OP-AMP) electronics. The droplet maker implements a method of producing jets of uniform droplets of solution precursors (or any other homogeneous liquids). The formation of droplets results...
Inventors: Eric Jordan, Makhlouf Radjdal, Kamal Hadidi (University Of Connecticut)

10/17/13 - 20130270261 - Microwave plasma torch generating laminar flow for materials processing
A microwave plasma torch providing two laminar flows is described. Two laminar flows are created using a set of at least three concentric, staggered dielectric tubes connected to a pressurized gas source. An inner laminar flow entrains injected particles entering the plasma. An outer laminar flow creates a sheath around...
Inventors: Kamal Hadidi, Makhlouf Redjdal

04/04/13 - 20130082599 - Transformer-coupled rf source for plasma processing tool
A RF source and method are disclosed which inductively create a plasma within an enclosure without an electric field or with a significantly decreased creation of an electric field. A ferrite material with an insulated wire wrapped around its body is used to efficiently channel the magnetic field through the...
Inventors: Kamal Hadidi, Rajesh Dorai (Varian Semiconductor Equipment Associates, Inc.)

03/28/13 - 20130075253 - Titanium diboride coating for plasma processing apparatus
An improved plasma processing chamber is disclosed, wherein some or all of the components which are exposed to the plasma are made of, or coated with, titanium diborane. Titanium diborane has a hardness in excess of 9 mhos, making it less susceptible to sputtering. In addition, titanium diborane is resistant...
Inventors: Kamal Hadidi, George D. Papasouliotis, Craig R. Chaney (Varian Semiconductor Equipment Associates, Inc.)

10/11/12 - 20120255491 - System and method for plasma monitoring using microwaves
A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma...
Inventors: Kamal Hadidi (Varian Semiconductor Equipment Associates, Inc.)

01/05/12 - 20120000606 - Plasma uniformity system and method
A plasma processing tool comprises a plasma chamber configured to generate a plasma from a gas introduced into the chamber where the generated plasma has an electron plasma frequency. A plurality of electrodes disposed within the chamber. Each of the electrodes configured to create a rapidly-rising-electric-field pulse in a portion...
Inventors: Rajesh Dorai, Kamal Hadidi, Mayur Jagtap (Varian Semiconductor Equipment Associates, Inc.)

12/22/11 - 20110309049 - Techniques for plasma processing a substrate
Techniques for plasma processing a substrate are disclosed. In one particular exemplary embodiment, the technique may be realized with a method comprising introducing a feed gas proximate to a plasma source, where the feed gas may comprise a first and second species, where the first and second species have different...
Inventors: George D. Papasouliotis, Kamal Hadidi, Helen L. Maynard, Ludovic Godet, Vikram Singh, Timothy J. Miller, Bernard Lindsay (Varian Semiconductor Equipment Associates, Inc.)

01/06/11 - 20110000896 - System and method for selectively controlling ion composition of ion sources
A method is disclosed for adjusting the composition of plasmas used in plasma doping, plasma deposition and plasma etching techniques. The disclosed method enables the plasma composition to be controlled by modifying the energy distribution of the electrons present in the plasma. Energetic electrons are produced in the plasma by...
Inventors: Kamal Hadidi, Rajesh Dorai, Bernard G. Lindsay, Vikram Singh, George D. Papasouliotis (Varian Semiconductor Equipment Associates, Inc.)

03/11/10 - 20100062547 - Technique for monitoring and controlling a plasma process with an ion mobility spectrometer
A plasma processing apparatus includes a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate a plasma in the process chamber, and a monitoring system including an ion mobility spectrometer configured to monitor a condition of the plasma. A monitoring method...
Inventors: Kamal Hadidi, Bernard G. Lindsay (Varian Semiconductor Equipment Associates, Inc.)

Amastan Technologies Llc, Amastan Llc, University Of Connecticut, Varian Semiconductor Equipment Associates, Inc.

Archived*
(*May have duplicates - we are upgrading our archive.)

20120255491 - System and method for plasma monitoring using microwaves


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The bibliographic references displayed about Kamal Hadidi's patents are for a recent sample of Kamal Hadidi's publicly published patent applications. The inventor/author may have additional bibliographic citations listed at the USPTO.gov. FreshPatents.com is not associated or affiliated in any way with the author/inventor or the United States Patent/Trademark Office but is providing this non-comprehensive sample listing for educational and research purposes using public bibliographic data published and disseminated from the United States Patent/Trademark Office public datafeed. This information is also available for free on the USPTO.gov website. If Kamal Hadidi filed recent patent applications under another name, spelling or location then those applications could be listed on an alternate page. If no bibliographic references are listed here, it is possible there are no recent filings or there is a technical issue with the listing--in that case, we recommend doing a search on the USPTO.gov website.

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