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Jason R. Cantone patents

Recent patents with Jason R. Cantone listed as an inventor - additional entries may be under other spellings.


Jason R. Cantone - Related organizations: Globalfoundries Inc. patents, Canon Kabushiki Kaisha patents

Finfet device with a substantially self-aligned isolation region positioned under the channel region

06/30/16 - 20160190306 - One illustrative device disclosed herein includes, among other things, a semiconductor substrate, a fin structure, a gate structure positioned around a portion of the fin structure in the channel region of the device, spaced-apart portions of a second semiconductor material positioned vertically between the fin structure and the substrate, wherein
Inventors: Ruilong Xie, Vimal K. Kamineni, Abner F. Bello, Nicholas V. Licausi, Wenhui Wang, Michael Wedlake, Jason R. Cantone

Method and apparatus for a high yield contact integration scheme

05/19/16 - 20160141242 - A methodology for forming contact areas by a multiple patterning process that provides increased yield and lower risk of contact-to-contact short at points of tight tip-to-tip spacing and the resulting device are disclosed. Embodiments include forming one or more trench patterning layers on a planarized surface of a wafer, forming
Inventors: Ryan Kim, Jason R. Cantone, Wenhui Wang

Methods of forming substantially self-aligned isolation regions on finfet semiconductor devices and the resulting devices

10/15/15 - 20150294912 - One method disclosed includes performing a selective etching process through a gate cavity to selectively remove a portion of a first semiconductor material relative to a second layer of a second semiconductor material and a substrate so as to thereby define a space between the second semiconducting material and the
Inventors: Ruilong Xie, Vimal K. Kamineni, Abner F. Bello, Nicholas V. Licausi, Wenhui Wang, Michael Wedlake, Jason R. Cantone

Methods of forming substantially self-aligned isolation regions on finfet semiconductor devices and the resulting devices

05/14/15 - 20150129934 - One method disclosed includes performing a selective etching process through a gate cavity to selectively remove a portion of a first semiconductor material relative to a second layer of a second semiconductor material and a substrate so as to thereby define a space between the second semiconducting material and the
Inventors: Ruilong Xie, Vimal K. Kamineni, Abner F. Bello, Nicholas V. Licausi, Wenhui Wang, Michael Wedlake, Jason R. Cantone

Method and apparatus for high yield contact integration scheme

04/09/15 - 20150097263 - A methodology for forming contact areas by a multiple patterning process that provides increased yield and lower risk of contact-to-contact short at points of tight tip-to-tip spacing and the resulting device are disclosed. Embodiments include forming one or more trench patterning layers on a planarized surface of a wafer, forming
Inventors: Ryan Kim, Jason R. Cantone, Wenhui Wang

Chemical and physical templates for forming patterns using directed self-assembly materials

08/14/14 - 20140224764 - A method includes forming a chemical guide layer above a process layer. A template having a plurality of elements is formed above the process layer. The chemical guide layer is disposed on at least portions of the process layer disposed between adjacent elements of the template. A directed self-assembly layer
Inventors: Gerard M. Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone, Moshe E. Preil

Asymmetric templates for forming non-periodic patterns using directes self-assembly materials

06/05/14 - 20140154630 - A method includes forming a template having a plurality of elements above a process layer, wherein portions of the process layer are exposed between adjacent elements of the template. A directed self-assembly layer is formed over the exposed portions. The directed self-assembly layer has alternating etchable components and etch-resistant components.
Inventors: Gerard M. Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone, Moshe E. Preil


### Jason R. Cantone patent invention listings

The bibliographic references displayed about Jason R. Cantone's patents are for a recent sample of Jason R. Cantone's publicly published patent applications. The inventor/author may have additional bibliographic citations listed at the USPTO.gov. FreshPatents.com is not associated or affiliated in any way with the author/inventor or the United States Patent/Trademark Office but is providing this non-comprehensive sample listing for educational and research purposes using public bibliographic data published and disseminated from the United States Patent/Trademark Office public datafeed. This information is also available for free on the USPTO.gov website. If Jason R. Cantone filed recent patent applications under another name, spelling or location then those applications could be listed on an alternate page. If no bibliographic references are listed here, it is possible there are no recent filings or there is a technical issue with the listing--in that case, we recommend doing a search on the USPTO.gov website.

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