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Janah & Associates, P.C. patentsThe following is a sampling of recent Janah & Associates, P.C. patent applications (USPTO Patent Application #, Patent Title) sorted by month.
April 2008 - Janah & Associates, P.C. patents
20080092806 - Removing residues from substrate processing components
20080089001 - Detachable electrostatic chuck having sealing assembly
20080081130 - Treatment of effluent in the deposition of carbon-doped silicon
March 2008 - Janah & Associates, P.C. patents
20080066785 - Method of refurbishing a magnet assembly for plasma process chamber
February 2008 - Janah & Associates, P.C. patents
20080038481 - Fabricating and cleaning chamber components having textured surfaces
January 2008 - Janah & Associates, P.C. patents
20080017104 - Substrate processing with rapid temperature gradient control
20080017516 - Forming a chamber component having a yttrium-containing coating
20080000530 - Gas flow control by differential pressure measurements
December 2007 - Janah & Associates, P.C. patents
20070283884 - Ring assembly for substrate processing chamber
November 2007 - Janah & Associates, P.C. patents
20070258186 - Substrate support with electrostatic chuck having dual temperature zones
October 2007 - Janah & Associates, P.C. patents
20070246346 - Electroformed sputtering target
September 2007 - Janah & Associates, P.C. patents
20070215463 - Pre-conditioning a sputtering target prior to sputtering
August 2007 - Janah & Associates, P.C. patents
20070190790 - Fine grinding a low-k dielectric layer off a wafer
20070190791 - Removing a low-k dielectric layer from a wafer by chemical mechanical polishing
20070190798 - Removing a low-k dielectric layer from a wafer
20070190799 - Refurbishing a wafer having a low-k dielectric layer
July 2007 - Janah & Associates, P.C. patents
20070170052 - Target for sputtering chamber
20070173059 - Process kit components for titanium sputtering chamber
20070165356 - Substrate support having heat transfer system
June 2007 - Janah & Associates, P.C. patents
20070144436 - Gas coupler for substrate processing chamber
20070132054 - Memory cell having stressed layers
20070125646 - Sputtering target for titanium sputtering chamber
May 2007 - Janah & Associates, P.C. patents
20070113783 - Band shield for substrate processing chamber
20070108161 - Chamber components with polymer coatings and methods of manufacture
20070102286 - Process kit and target for substrate processing chamber
20070099310 - Reclaiming substrates having defects and contaminants
April 2007 - Janah & Associates, P.C. patents
20070085032 - Writing a circuit design pattern with shaped particle beam flashes
20070085033 - Electron beam column for writing shaped electron beams
20070075887 - Electrostatic particle beam deflector
March 2007 - Janah & Associates, P.C. patents
20070047170 - Electrostatic chuck having textured contact surface
February 2007 - Janah & Associates, P.C. patents
20070040265 - Substrate support having brazed plates and resistance heater
January 2007 - Janah & Associates, P.C. patents
20070014949 - Localized surface annealing of components for substrate processing chambers
December 2006 - Janah & Associates, P.C. patents
20060283770 - Transportation fixture and package for substrate rack
20060272774 - Substrate support with clamping electrical connector
November 2006 - Janah & Associates, P.C. patents
20060260937 - Interior antenna for substrate processing chamber
20060264063 - Deposition of tensile and compressive stressed materials for semiconductors
September 2006 - Janah & Associates, P.C. patents
20060211202 - Forming metal silicide on silicon-containing features of a substrate
August 2006 - Janah & Associates, P.C. patents
20060188742 - Chamber component having grooved surface
July 2006 - Janah & Associates, P.C. patents
20060162661 - Mixing energized and non-energized gases for silicon nitride deposition
20060159940 - Corrosion-resistant aluminum component having multi-layer coating
20060160314 - Substrate having silicon germanium material and stressed silicon nitride layer
20060160364 - Refreshing wafers having low-k dielectric materials
20060160478 - Chemical mechanical polishing pad for controlling polishing slurry distribution
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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Janah & Associates, P.C. in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Janah & Associates, P.C. with additional patents listed. Browse our Agent directory for other possible listings.
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