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  Inductively coupled plasma system with internal coilUSPTO Application #: 20080023146Title: Inductively coupled plasma system with internal coil Abstract: Embodiments of the inventive technology may be a plasma system that comprises a coil powered by a power source so as to generate or enhance a plasma in a process chamber; and a dielectric form that itself is established within the process chamber and that defines an internal volume in which at least a portion of a coil is established. In various embodiments, the dielectric form has two ends supported by at least one support member at two support sites and/or has a form centerline in a system with a substrate support adapted to support a substrate with a process surface that defines a process surface plane that is parallel the form centerline. (end of abstract) Agent: Santangelo Law Offices, P.C. - Fort Collins, CO, US Inventor: Andrew Shabalin USPTO Applicaton #: 20080023146 - Class: 15634548 (USPTO)
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