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Hiroyuki Akagawa - bibliographic patent references

Recent bibliographic sampling of patent applications for Hiroyuki Akagawa listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):

20060068300 - Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method
20060159931 - Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
20060223224 - Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank

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The bibliographic references displayed about Hiroyuki Akagawa's patent applications are for a recent sample of publicly published patent applications. The inventor/author may have additional bibliographic citations listed at the USPTO.gov. FreshPatents.com is not associated or affiliated in any way with the author/inventor or the United States Patent/Trademark Office but is providing this non-comprehensive sample listing for educational and research purposes using public bibliographic data published and disseminated from the United States Patent/Trademark Office public datafeed. This information is also available for free on the USPTO.gov website. If Hiroyuki Akagawa filed recent patent applications under another name, spelling or location then those applications could be listed on an alternate page. If no bibliographic references are listed here, it is possible there are no recent filings or there is a technical issue with the listing--in that case, we recommend doing a search on the USPTO.gov website.

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Patent data source: patents published by the United States Patent and Trademark Office (USPTO)
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