| Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same -> Monitor Keywords |
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  Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of sameUSPTO Application #: 20070172763Title: Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same Abstract: respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.
and the formula (14):
There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): (end of abstract)
USPTO Applicaton #: 20070172763 - Class: 430270100 (USPTO) Related Patent Categories: Radiation Imagery Chemistry: Process, Composition, Or Product Thereof, Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product, Radiation Sensitive Composition Or Product Or Process Of Making
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