Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same

Abstract: respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist. and the formula (14): There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): (end of abstract)

Agent: Sughrue Mion, PLLC - Washington, DC, US
Inventors: Takayuki Araki, Yuzo Komatsu, Meiten Koh
USPTO Applicaton #: #20070172763 - Class: 430270100 (USPTO)
Related Patent Categories: Radiation Imagery Chemistry: Process, Composition, Or Product Thereof, Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product, Radiation Sensitive Composition Or Product Or Process Of Making

Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same description/claims

The Patent Description & Claims data below is from USPTO Patent Application 20070172763, Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same.

Brief Patent Description - Full Patent Description - Patent Application Claims

CROSS-REFERENCE TO RELATED APPLICATION

[0001] This application is a divisional of U.S. application Ser. No. 10/644,953 filed Aug. 21, 2003, which is a continuation-in-part of PCT international application No. PCT/JP02/01518 filed on Feb. 21, 2002, the above-noted applications incorporated herein by reference in their entirety.

BACKGROUND OF THE INVENTION

[0002] The present invention relates to a novel fluorine-containing ethylenic monomer which has hydroxyl group or fluoroalkyl carbonyl group and possesses good polymerizability, particularly radical polymerizability, and further relates to a novel fluorine-containing polymer obtained by polymerization of the monomer.

[0003] The fluorine-containing ethylenic monomer having hydroxyl of the present invention is a tertiary alcohol which has a carbon-carbon double bond having good radical polymerizability and has, on another end thereof, two fluorine-containing alkyl groups and hydroxyl which are bonded to the same carbon. The monomer is a novel compound which has not been disclosed in any literatures. The fluorine-containing ethylenic monomer having hydroxyl of the present invention can be polymerized alone and also can be polymerized with other monomer, particularly fluorine-containing ethylenic monomer having no hydroxyl. Thus hydroxyl having high acidity can be introduced to a fluorine-containing polymer.

[0004] The thus obtained fluorine-containing polymer of the present invention is also a novel compound like the above-mentioned fluorine-containing ethylenic monomer having hydroxyl.

[0005] According to the present invention, affinity for and solubility in an aqueous medium, particularly an aqueous alkaline medium are enhanced as compared with fluorine-containing polymers having hydroxyl which are obtained by polymerization of conventional fluorine-containing ethylenic monomers having hydroxyl. Further as compared with the conventional fluorine-containing polymers having hydroxyl and fluorine-containing polymers having other functional group (carboxyl or the like), transparency (particularly transparency in vacuum ultraviolet region) and low refractive index which are characteristics inherent to fluorine-containing polymers can be maintained or improved.

[0006] As mentioned above, an object of the present invention is to provide a novel fluorine-containing ethylenic monomer having hydroxyl and further a novel fluorine-containing polymer which has hydroxyl and is obtained by polymerization of the monomer.

SUMMARY OF THE INVENTION

[0007] The first of the present invention relates to a fluorine-containing ethylenic monomer having hydroxyl which is represented by the formula (1): wherein X.sup.1 and X.sup.2 are the same or different and each is H or F; X.sup.3 is H, F, C.sub.1 or CF.sub.3; Rf.sup.1 and Rf.sup.2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf.sup.3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1.

[0008] The second of the present invention relates to a novel fluorine-containing polymer obtained by (co)polymerizing the fluorine-containing ethylenic monomer having hydroxyl of the present invention.

[0009] The third of the present invention relates to a fluorine-containing ethylenic monomer having fluoroalkyl carbonyl group which is represented by the formula (14): wherein X.sup.1 and X.sup.2 are the same or different and each is H or F; X.sup.3 is H, F, C.sub.1 or CF.sub.3; Rf.sup.1 is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf.sup.3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1.

[0010] The fourth of the present invention relates to a photoresist composition which is a composition comprising:

(A) a fluorine-containing polymer having, as an essential component, a structural unit obtained by polymerizing a fluorine-containing ethylenic monomer having OH group,

(B) a photoacid generator, and

(C) a solvent,

[0011] in which, when the carbon atom bonded to OH group of the fluorine-containing ethylenic monomer having OH group is named the first carbon atom and a structure consisting of the first carbon atom up to the neighboring third or fourth carbon atom is assumed to be a model structure, the fluorine-containing ethylenic monomer having OH group satisfies Equation 1: .DELTA.H.dbd.H(M-O.sup.-)+200-H(M-OH).ltoreq.75 (Equation 1) wherein H(M-OH) is a produced enthalpy of the model structure, H(M-O.sup.-) is a produced enthalpy of the fluorine-containing ethylenic monomer after dissociation of the OH group and a produced enthalpy of hydrogen ion is assumed to be a constant of 200 kJ/mol.

DETAILED DESCRIPTION

[0012] The first of the present invention relates to the fluorine-containing ethylenic monomer having hydroxyl which is represented by the formula (1): wherein X.sup.1 and X.sup.2 are the same or different and each is H or F; X.sup.3 is H, F, C.sub.1 or CF.sub.3; Rf.sup.1 and Rf.sup.2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf.sup.3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1.

[0013] Particularly preferred is a fluorine-containing ethylenic monomer having hydroxyl which is represented by the formula (2): wherein Rf.sup.1 and Rf.sup.2 are as defined in the formula (1); Rf.sup.4 is a fluorine-containing alkylene group having 1 to 39 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 99 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, from the viewpoint of good homopolymerizability and good copolymerizability with fluorine-containing ethylenic monomer having no hydroxyl such as tetrafluoroethylene and vinylidene fluoride.

[0014] Also preferred is a fluorine-containing ethylenic monomer having hydroxyl which is represented by the formula (3): wherein Rf.sup.1 and Rf.sup.2 are as defined in the formula (1); Rf.sup.5 is a fluorine-containing allylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, from the viewpoint of good copolymerizability with fluorine-containing ethylenic monomer having no hydroxyl such as tetrafluoroethylene and vinylidene fluoride.

[0015] In the above-mentioned formulae (1), (2) and (3), a is 0 or 1, which means that the monomers may have or may not have Rf.sup.3, Rf.sup.4 and Rf.sup.5, respectively.

[0016] When a is 0, the monomer is concretely represented by the formula (4): wherein X.sup.1 and X.sup.2 are the same or different and each is H or F; X.sup.3 is H, F, C.sub.1 or CF.sub.3; Rf.sup.1 and Rf.sup.2 are as defined in the formula (1). Examples thereof are: and the like.

[0017] It is particularly preferable from the viewpoint of polymerizability that at least one of X.sup.1, X.sup.2 and X.sup.3 is H.

Brief Patent Description - Full Patent Description - Patent Application Claims
Click on the above for other options relating to this Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same patent application.
###

How KEYWORD MONITOR works... a FREE service from FreshPatents
1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored.
3. Each week you receive an email with patent applications related to your keywords.
Start now! - Receive info on patent apps like Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same or other areas of interest.
###

Previous Patent Application:
Positive photosensitive composition and method of forming pattern using the same
Next Patent Application:
Photoresist composition for deep ultraviolet lithography
Industry Class:
Radiation imagery chemistry: process, composition, or product thereof

###

Design/code © 2010 FreshContext LLC/Freshpatents.com. Website Terms and Conditions - Also read: About this Page
Patent data source: patents published by the United States Patent and Trademark Office (USPTO)
Information published here is for research/educational purposes only (and in conjunction with our Keyword Monitor) and is not meant to be used in place of the full USPTO patent document/images or a comprehensive patent archive search. Complete official applications are on file at the USPTO and often contain additional data/images (Freshpatents is currently text-only). FreshPatents.com is not affiliated with or endorsed by the USPTO or firms/individuals or products/designs/ideas related to listed patents.

FreshPatents.com Support
Thank you for viewing the Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same patent info.
AAPL - Apple, BA - Boeing, CALP, DTV - Direct TV, EBAY, FRX, GOOG - Google, HEPH, IBM, JBL - Jabil, KO - Coca Cola, LXRX, MOT - Motorla IP-related news and info

Results in 0.09036 seconds

Other interesting Feshpatents.com categories:
Daimler Chrysler , DirecTV , Exxonmobil Chemical Company , Goodyear , Intel , Kyocera Wireless , 174

PATENT INFO

About this Page

noimage