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Euv light source optical elements   

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Abstract: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials. ...

Agent: Cymer Inc Legal Department - San Diego, CA, US
Inventors: Norbert R. Bowering, Alexander I. Ershov, Timothy S. Dyer, Hugh R. Grinolds
USPTO Applicaton #: #20070170378 - Class: 25050400R (USPTO) - 07/26/07 - Class 250 

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The Patent Description & Claims data below is from USPTO Patent Application 20070170378, Euv light source optical elements.

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