Etching a substrate: processes inventions 12/07

20070295688 - Apparatus and method of fabricating thin film pattern: A fabricating method and apparatus of a thin film pattern improves the reliability of forming the thin film pattern by a resist printing method. The apparatus includes a print roller device of a roll shape around which a blanket is wound; a spray device located around the print roller device... Agent: Birch Stewart Kolasch & Birch

20070295686 - Methods of forming semiconductor constructions, light-conducting conduits, and optical signal progapation assemblies: The invention includes optical signal conduits having rare earth elements incorporated therein. The optical signal conduits can, for example, contain rare earth elements incorporated within a dielectric material matrix. For instance, erbium or cerium can be within silicon nanocrystals dispersed throughout dielectric material of optical signal conduits. The dielectric material... Agent: Wells St. John P.s.

20070295687 - Method of manufacturing ink jet recording head, ink jet recording head, and ink jet cartridge: A method of manufacturing an ink jet head which discharges ink, comprising: a step of preparing a silicon substrate; a step of forming a membrane having a layer in which a plurality of holes are disposed to constitute a filter mask, and a layer with which a first surface is... Agent: Fitzpatrick Cella Harper & Scinto

20070295689 - Laser-markable molding masses and products obtained therefrom and method for laser marking: Laser-markable molding compositions, molding produced therewith and method of marking the same, wherein the molding compositions comprise: (a) at least one semicrystalline thermoplastic; and (b) at least one particulate additive selected from the group consisting of (i) light-sensitive salt compounds, (ii) inorganic oxides having an average particle diameter of less... Agent: Connolly Bove Lodge & Hutz, LLP

20070295690 - Method of plasma etching transition metal oxides: A method of plasma etching transition metal oxide thin films using carbon monoxide as the primary source gas. This permits carbonyl chemistries to be used at ambient temperature, without heating.... Agent: Sandisk/robert Groover

20070289943 - Block copolymer mask for defining nanometer-scale structures: A nanometer-scale mask includes a periodic array of nanometer-scale structural elements comprising an inorganic oxide.... Agent: Agilent Technologies Inc.

20070289944 - Method for engraving a golf club head: A method for engraving a golf club head includes the steps of: a) applying a shielding layer on a surface of the golf club head; b) forming a predetermined patterning hole in the shielding layer by removing a part of the shielding layer; c) spraying an etching agent on the... Agent: Ostrolenk, Faber, Gerb & Soffen, LLP

20070289945 - Microstructure and method of manufacturing the same: A method of manufacturing a microstructure wherein an aluminum member having an aluminum substrate and a micropore-bearing anodized film present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a... Agent: Sughrue Mion, PLLC

20070289947 - Method for polishing lithium aluminum oxide crystal: The present invention polishes a lithium aluminum oxide (LiAlo2) crystal several times with three different materials and then the LiAlo2 crystal are soaked into an acid solution to be washed for obtaining a LiAlo2 crystal of film-free, scratch-free with smooth surface.... Agent: Troxell Law Office PLLC

20070289940 - Surfactant-enhanced protection of micromechanical components from galvanic degradation: A microelectromechanical structure is formed by depositing sacrificial and structural material over a substrate to form a structural layer on a component electrically attached with the substrate. The galvanic potential of the structural layer is greater than the galvanic potential of the component. At least a portion of the structural... Agent: Townsend And Townsend And Crew, LLP

20070289941 - Selective bonding for forming a microvalve: A method for forming a micromachined device is disclosed that includes providing a first silicon layer and a second silicon layer. A portion of the second silicon layer is etched to form a slider portion and a layer portion. The slider portion is movable relative to the layer portion. A... Agent: James D. Schweikert Macmillan, Sobanski & Todd

20070289942 - Method of manufacturing ink jet recording head, ink jet recording head, and ink jet cartridge: A method of manufacturing an ink jet head which discharges ink, comprising: a step of preparing a silicon substrate; a step of forming a membrane having a layer in which a plurality of holes are disposed to constitute a filter mask, and a layer with which a first surface is... Agent: Fitzpatrick Cella Harper & Scinto

20070289946 - Method for polishing a substrate surface: According to one aspect of the invention, an improved process for preparing a surface of substrate is provided wherein the surface of the substrate is prepared for a chemical mechanical polishing (CMP) process, the CMP process is performed on the surface of the substrate, and the surface of the substrate... Agent: Goodwin Procter LLP Patent Administrator

20070284336 - Manufacturing method of optical semiconductor device: It is an objective to control the occurrence of the disorder of a far-field pattern and of an optical axial shift. A manufacturing method of a semiconductor laser device has the step for preparing a semiconductor substrate which has growth of a multi-layer including an active layer, the step for... Agent: Stanley P. Fisher Reed Smith LLP

20070284335 - Etching method and etching apparatus: The present invention relates to an etching method for etching a film to form a concave portion therein with the use of a photoresist mask provided with an opening. In this method, there is determined, in advance, a first correlation between a parameter value and an opening dimension of the... Agent: Smith, Gambrell & Russell

20070284337 - Etching method, plasma processing system and storage medium: Disclosed is a method of etching a substrate having a layered structure in which a photoresist mask with a pattern, a coating film made of silicon oxide, and an organic film are laminated in that order from the top. Before etching the coating film of silicon oxide, a deposit is... Agent: Smith, Gambrell & Russell

20070284338 - Chemical mechanical polishing method: A chemical mechanical polishing method includes bringing a body to be polished into contact with a polishing pad mounted on a rotating polishing table while feeding a polishing slurry to the polishing pad. The polishing pad is formed of a laminate comprising a first pad layer in contact with the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070278177 - Processing method using atomic force microscope microfabrication device: Under the condition that the height is fixed at a target height by turning off a feedback control system of a Z piezoelectric actuator of a cantilever of an atomic force microscope having a probe, which is harder than a processed material, flexure and twisting of the cantilever when carrying... Agent: Brinks Hofer Gilson & Lione

20070278179 - Radiation sensitive self-assembled monolayers and uses thereof: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive... Agent: Connolly Bove Lodge & Hutz LLP (for IBM Yorktown)

20070278180 - Electron induced chemical etching for materials characterization: A method of imaging and identifying materials on and below the surface of a structure is described. The method may be used in areas as small as one micron in diameter, and may remove a thin portion of the topmost material, repeating the analysis, until a desired depth is obtained.... Agent: Schwegman, Lundberg & Woessner, P.A.

20070278181 - Manufacturing method of silicon nozzle plate and manufacturing method of inkjet head: A manufacturing method of a silicon nozzle plate, having; a film forming process to provide the film representing an etching mask for etching the silicon substrate on a surface of the silicon substrate; a pattern film forming to form a pattern film by partially removing the film based on a... Agent: Cantor Colburn, LLP

20070278182 - Potassium monopersulfate solutions: A composition comprising a solution of potassium monopersulfate having an active oxygen content of from about 3.4% to about 6.8% and a process for its preparation including neutralization with an alkaline material is disclosed.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070278183 - Wet etch suitable for creating square cuts in si and resulting structures: A single crystal silicon etching method includes providing a single crystal silicon substrate having at least one trench therein. The substrate is exposed to a buffered fluoride etch solution which undercuts the silicon to provide lateral shelves when patterned in the <100> direction. The resulting structure includes an undercut feature... Agent: Trask Britt, P.C./ Micron Technology

20070278178 - Copper conducting wire structure and fabricating method thereof: A copper conducting wire structure is for use in the thin-film-transistor liquid crystal display (LCD) device. The copper conducting wire structure includes at least a buffer layer and a copper layer. A fabricating method of the copper conducting wire structure includes the following steps. At first, a glass substrate is... Agent: Bacon & Thomas, PLLC

20070278184 - Gold cmp composition and method: The invention provides a cyanide-free chemical-mechanical polishing (CMP) composition useful for polishing a gold-containing surface of a substrate. The CMP composition comprises an abrasive, a gold-oxidizing agent, a cyanide-free gold-solubilizing agent, and an aqueous carrier therefor. The invention further provides a method of chemically-mechanically polishing a gold-containing surface of a... Agent: Steven Weseman Associate General Counsel, I.p.

20070278185 - Etching composition and etching process: An etching composition which comprises at least one organic carboxylic acid compound selected from acetic acid, propionic acid, butyric acid, succinic acid, citric acid, lactic acid, malic acid, tartaric acid, malonic acid, maleic acid, glutaric acid, aconitic acid, 1,2,3-propanetricarboxylic acid and ammonium salts of these acids, a polysulfonic acid compound... Agent: Antonelli, Terry, Stout & Kraus, LLP