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  Electrolytic processing apparatusUSPTO Application #: 20070034502Title: Electrolytic processing apparatus Abstract: An electrolytic processing apparatus is used to remove a metal film formed on a surface of a substrate. The electrolytic processing apparatus includes a feeding electrode 31 for feeding electricity to a metal film 6 on a substrate W, a processing electrode 32 for processing the metal film 6, a substrate carrier 11 for holding the substrate W, a first supply passage 51 for supplying a first electrolytic processing liquid, a second supply passage 52 for supplying a second electrolytic processing liquid, an insulating member 36 for electrically isolating the first electrolytic processing liquid and the second electrolytic processing liquid, a table 12 on which the feeding electrode 31, the processing electrode 32, and the insulating member 36 are disposed, and a relative movement mechanism 17 for making a relative movement between the table 12 and the substrate carrier 11. (end of abstract) Agent: Squire, Sanders & Dempsey L.L.P. - San Francisco, CA, US Inventors: Masayuki Kumekawa, Norio Kimura, Yukio Fukunaga, Katsuyuki Musaka USPTO Applicaton #: 20070034502 - Class: 204217000 (USPTO) Related Patent Categories: Chemistry: Electrical And Wave Energy, Apparatus, Electrolytic, Object Protection, Rotary, With Base Treatment, Mechanical Working The Patent Description & Claims data below is from USPTO Patent Application 20070034502. Brief Patent Description - Full Patent Description - Patent Application Claims
BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention relates to an electrolytic processing apparatus, and more particularly to an electrolytic processing apparatus for removing a metal film formed on a surface of a substrate such as a semiconductor wafer to a flat finish. [0003] 2. Description of the Related Art [0004] In recent years, there has been an eminent movement towards using copper (Cu), which has a low electric resistivity and high electromigration endurance, as a material for forming circuits on a substrate such as a semiconductor wafer instead of using aluminum or aluminum alloys. Copper interconnections are generally formed by filling copper into fine recesses formed in a surface of a substrate. There are known various techniques for forming such copper interconnections, including chemical vapor deposition, sputtering, and plating. In any such technique, a copper film is formed on a substantially entire surface of a substrate, and then unnecessary copper is removed by chemical mechanical polishing (CMP). [0005] FIGS. 1A through 1C illustrate an example of process of forming such a substrate W having copper interconnections. As shown in FIG. 1A, an insulating film (interlayer dielectric) 2, such as an oxide film of SiO.sub.2 or a film of low-k material, is deposited on a conductive layer 1a on a semiconductor base 1 on which semiconductor devices have been formed. Contact holes 3 and trenches 4 for interconnections are formed in the insulating film 2 by the lithography/etching technique. Thereafter, a barrier layer 5 of TaN or the like is formed on the surface, and a seed layer 7 as an electric supply layer for electroplating is formed on the barrier layer 5 by sputtering, CVD, or the like. [0006] Then, as shown in FIG. 1B, copper plating is performed onto the surface of the substrate W to fill the contact holes 3 and the trenches 4 with copper and, at the same time, deposit a copper film 6 on the insulating film 2. Thereafter, the redundant copper film 6 and the barrier layer 5 on the insulating film 2 are removed by chemical mechanical polishing (CMP) so as to make the surface of the copper film 6 filled in the contact holes 3 and the trenches 4 and the surface of the insulating film 2 lie substantially in the same plane. Interconnections composed of the copper film 6 are thus formed as shown in FIG. 1C. [0007] Components in various kinds of equipments have recently become finer and have required higher accuracy. As submicron manufacturing technology has commonly been used, the properties of materials are greatly influenced by the processing method itself Under these circumstances, in a conventional machining method in which a desired portion in a workpiece is physically destroyed and removed from the surface thereof by a tool, a large number of defects may be produced by the processing, thus deteriorating the properties of the workpiece. Therefore, it becomes important to perform processing without deteriorating the properties of the materials. [0008] Some processing methods, such as chemical polishing, electrolytic processing, and electrolytic polishing, have been developed in order to solve this problem. In contrast to the conventional physical processing, these methods perform removal processing or the like through chemical dissolution reaction. Therefore, these methods do not produce defects, such as formation of an altered layer and dislocation, due to plastic deformation, and hence processing can be performed without deteriorating the properties of the materials. [0009] Chemical mechanical polishing (CMP), for example, generally requires a complicated operation and control, and needs a considerably long processing time. In addition, a sufficient cleaning of a substrate must be conducted after the polishing because a slurry (a polishing liquid) is used in the CMP process. This process also imposes a considerable load on the waste disposal of the slurry and the cleaning liquid. Accordingly, there is a strong demand for omitting CMP or reducing a load upon the CMP process. Further, a low-k material, which has a low dielectric constant, is expected to be used as interlayer dielectric in the future. However, the low-k material has a low mechanical strength and therefore is hard to endure the stress applied during the CMP process. Thus, also from this standpoint, there is a demand for a process that enables the flattering of a substrate without imposing any stress on the substrate. [0010] In the conventional CMP process, a certain polishing rate (e.g. 500 nm/min) is required in practical use. Accordingly, a polishing pressure should be increased, for example, to about 350 kPa to increase a polishing rate. The polishing rate in the CMP process is determined by the following Preston equation. RR=kPV In the above equation, RR represents a polishing rate (m/s), k constant (Pa.sup.-1), P a polishing pressure (Pa), and V a relative speed between a substrate and a polishing surface (m/s). [0011] It can be seen from the Preston equation that a polishing pressure P or a relative speed V should be increased during polishing to maintain a certain polishing rate. In such a case, a surface of a substrate becomes likely to be scratched or chemically damaged. Further, dishing or recesses are likely to be produced to cause lean interconnections. Accordingly, the resistance of interconnections is problematically increased, and the reliability of interconnections is lowered by defects of the interconnections. SUMMARY OF THE INVENTION [0012] The present invention has been made in view of the above drawbacks. It is therefore an object of the present invention to provide an electrolytic processing apparatus which can flatten a surface of a metal film having fine irregularities on a substrate with a low processing pressure upon formation of interconnections using damascene process, and can process the metal film with a uniform processing rate over an entire surface of the metal film. [0013] In order to solve the above drawbacks, according to one aspect of the present invention, there is provided an electrolytic processing apparatus comprising: at least one feeding electrode for feeding electricity to a metal film on a substrate; at least one processing electrode for processing the metal film; a substrate carrier for holding the substrate in such a state that the metal film faces the feeding electrode and the processing electrode; a first supply passage for supplying a first electrolytic processing liquid to a gap between the feeding electrode and the substrate; a second supply passage for supplying a second electrolytic processing liquid to a gap between the processing electrode and the substrate; an insulating member for electrically isolating the first electrolytic processing liquid and the second electrolytic processing liquid; a table on which the feeding electrode, the processing electrode, and the insulating member are disposed; a power supply for applying voltage between the feeding electrode and the processing electrode; and a relative movement mechanism for making a relative movement between the table and the substrate carrier while the insulating member and the metal film are in contact with each other. [0014] According to the present invention, an electrolytic processing is performed as follows: Since the first electrolytic processing liquid at the feeding electrode side and the second electrolytic processing liquid at the processing electrode side are electrically isolated by the insulating member, electric current flows from the feeding electrode to the processing electrode through the metal film on the substrate. At this time, electric potential of the metal film on the substrate is substantially equal to that of the feeding electrode due to the first electrolytic processing liquid. On the other hand, electrons are supplied to the metal film through the second electrolytic processing liquid. As a result, at the processing electrode side, the metal film is ionized to elute by the electrons supplied, and complex is formed in the surface of the metal film in the second electrolytic processing liquid. In this state, when making a relative movement between the insulating member and the substrate, the complex in the convex portions of the metal film is selectively removed by the insulating member, and hence the surface of the metal film is flattened. [0015] In this manner, according to the present invention, because the first electrolytic processing liquid and the second electrolytic processing liquid are electrically isolated by the insulating member, feeding of electricity to the metal film, to be processed, on the substrate can be securely performed, and electrolytic processing on a portion of the metal film facing the processing electrode can also be securely performed. As a result, a processing pressure can be lowered, and a desired processing rate can be ensured while suppressing damage to the substrate, resulting in an increased throughput. [0016] Here, processing steps for a substrate using the present invention will be described with reference to FIGS. 2A through 2D. As shown in FIG. 2A, an insulating film 2 is deposited on a conductive layer la which is formed on a semiconductor base 1. Contact holes 3 and trenches 4 are formed in the insulating film 2, a barrier layer 5 is formed on the surface of the insulating film 2, and a seed layer 7 is formed on the barrier layer 5. Then, as shown in FIG. 2B, copper plating is performed onto the surface of the substrate W to fill the contact holes 3 and the trenches 4 with copper and, at the same time, deposit a copper film 6 on the insulating film 2. Thereafter, as shown in FIG. 2C, the copper film 6 is removed to a level near the barrier layer 5 with a low processing pressure (e.g., 70 kPa) by the electrolytic processing apparatus of the present invention, so that the irregularities on the copper film 6 are removed. After the electrolytic processing, the remaining copper film 6, the barrier layer 5, and the seed layer 7 are removed by a CMP apparatus with a low pressure and a low processing rate, as shown in FIG. 2D. According to the present invention, processing time of the CMP apparatus can be shortened, and hence load on the substrate can be reduced. [0017] In a preferred aspect of the present invention, the insulating member is made of a material which does not allow a liquid to pass through the insulating member. [0018] In a preferred aspect of the present invention, a partition wall is disposed between the feeding electrode and the processing electrode. [0019] According to the present invention, the electrical isolation between the first electrolytic processing liquid and the second electrolytic processing liquid can be ensured. [0020] In a preferred aspect of the present invention, a plurality of the feeding electrodes and a plurality of the processing electrodes are arranged alternately. [0021] According to the present invention, electricity can be fed to a large area of the metal film by the plurality of the feeding electrodes through the first electrolytic processing liquid. Further, the entire surface of the metal film on the substrate can be securely processed by the plurality of the processing electrodes. [0022] In a preferred aspect of the present invention, the feeding electrode has a surface having a plurality of openings through which the first electrolytic processing liquid is supplied to the metal film, and the processing electrode has a surface having a plurality of openings through which the second electrolytic processing liquid is supplied to the metal film. Continue reading... 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