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Electrolytic looping for forming layering in the deposit of a coatingUSPTO Application #: 20080041728Title: Electrolytic looping for forming layering in the deposit of a coating Abstract: A method for depositing a metal onto a substrate including the steps of providing a plating bath including ions of the metal, positioning the substrate in the plating bath, positioning at least one counter electrode in the plating bath, performing a first electrolytic process for a predetermined first period of time, performing a second electrolytic process for a predetermined second period of time and looping between the first and second electrolytic processes to form a coating of the metal on the substrate. (end of abstract)
Agent: Thompson Hine L.L.P. Intellectual Property Group - Dayton, OH, US Inventors: Paul Chalmer, John J. Fortman, Phillip O. Miller, Robert Renz USPTO Applicaton #: 20080041728 - Class: 205283 (USPTO)
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