Electrode pattern for resistance heating element and wafer processing apparatus -> Monitor Keywords
Fresh Patents
Monitor Patents Patent Organizer How to File a Provisional Patent Browse Inventors Browse Industry Browse Agents Browse Locations
     new ** File a Provisional Patent ** 
site info Site News  |  monitor Monitor Keywords  |  monitor archive Monitor Archive  |  organizer Organizer  |  account info Account Info  |  
02/07/08 | 1 views | #20080029195 | Prev - Next | USPTO Class 156 | About this Page  156 rss/xml feed  monitor keywords

Electrode pattern for resistance heating element and wafer processing apparatus

USPTO Application #: 20080029195
Title: Electrode pattern for resistance heating element and wafer processing apparatus
Abstract: There is disclosed a wafer processing apparatus having optimized electrode patterns for its resistive heating element. The optimized electrode pattern is designed to compensate for the heat loss around contact areas, electrical connections, and through-holes, etc., by generating more heat near or around those areas, providing maximum temperature uniformity. In another embodiment of the optimized design of the invention, the resistance of heating element closely matches the impedance of the power supply for higher efficiency, especially when higher operating temperature or higher electrical power is required. (end of abstract)
Agent: Momentive Performance Materials Inc.-quartz C/o Dilworth & Barrese, LLP - Uniondale, NY, US
Inventor: Zhong-Hao Lu
USPTO Applicaton #: 20080029195 - Class: 156 1 (USPTO)


[The Full Description and Claims for this patents is not available from FreshPatents.com temporarily]

We apologize for the inconvenience:
Normally the full description and claims of the patent you are viewing (20080029195, Electrode pattern for resistance heating element and wafer processing apparatus) would be available here (see sample below). However, this information from this patent is currently not available from our database.

Most likely, this is a temporary technical issue. We have logged this message and will attempt to resolve the issue. Please check back again soon.

sample




Click on the above for other options relating to this Electrode pattern for resistance heating element and wafer processing apparatus patent application.
###
monitor keywords

How KEYWORD MONITOR works... a FREE service from FreshPatents
1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored.
3. Each week you receive an email with patent applications related to your keywords.  
Start now! - Receive info on patent apps like Electrode pattern for resistance heating element and wafer processing apparatus or other areas of interest.
###


Previous Patent Application:
Pressure control system
Next Patent Application:
Surface treating apparatus using atomic hydrogen
Industry Class:
Adhesive bonding and miscellaneous chemical manufacture

###

Design/code © 2008 FreshContext LLC/Freshpatents.com. Website Terms and Conditions - Also read: About this Page
Patent data source: patents published by the United States Patent and Trademark Office (USPTO)
Information published here is for research/educational purposes only (and in conjunction with our Keyword Monitor) and is not meant to be used in place of the full USPTO patent document/images or a comprehensive patent archive search. Complete official applications are on file at the USPTO and often contain additional data/images (Freshpatents is currently text-only). FreshPatents.com is not affiliated with or endorsed by the USPTO or firms/individuals or products/designs/ideas related to listed patents.
FreshPatents.com Support
Thank you for viewing the Electrode pattern for resistance heating element and wafer processing apparatus patent info.
IP-related news and info


Results in 1.13127 seconds


Other interesting Feshpatents.com categories:
Medical: Surgery ,  Surgery(2) ,  Surgery(3) ,  Drug ,  Drug(2) ,  Prosthesis ,  Dentistry