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02/07/08 | 31 views | #20080029402 | Prev - Next | USPTO Class 205 | About this Page  205 rss/xml feed  monitor keywords

Electrochemical processing apparatus and method of processing a semiconductor device

USPTO Application #: 20080029402
Title: Electrochemical processing apparatus and method of processing a semiconductor device
Abstract: An electrochemical processing apparatus is provided, in which a substrate and an anode placed in a chamber are partitioned into a cathode region including the substrate and an anode region including the anode by placing a multi-layered structure of a filtration film and a cation exchange film so that the filtration film is positioned on the substrate side. A plating solution containing additives is introduced into the cathode region, whereby a substrate is plated.
(end of abstract)
Agent: Young & Thompson - Arlington, VA, US
Inventors: Tetsuya Kurokawa, Koji Arita, Kaori Noda
USPTO Applicaton #: 20080029402 - Class: 205157 (USPTO)


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