Electric resistance heating devices inventions 07/09

20090190907 - Apparatus for utilizing water: An apparatus for utilizing water such as, for example, an atomizer or vaporizer, having at least one container for water. Here, two ceramic electrodes that can be used to treat the water are arranged for the purpose of improving the water quality in the container.... Agent: Burr & Brown

20090190908 - Apparatus for heat-treating substrate and method for heat-treating substrate: In an apparatus for heat-treating a substrate, a substrate holder unit including a substrate stage which is made of carbon or a carbon-covered material having high radiation ratio is arranged in a vacuum chamber to be vertically movable. A heating unit including a heat dissipation surface which opposes the substrate... Agent: Fitzpatrick Cella Harper & Scinto

20090180765 - Multiple-power-selection heat storage device: A multiple-power-selection heat storage device includes a power selection device, a heating device, and a storage tank. The power selection device includes a distribution selector and an uninterrupted power supply device. The distribution selector is arranged inside the uninterrupted power supply device and controls selection of power input of the... Agent: Rosenberg, Klein & Lee

20090180766 - Heat treatment apparatus: In a heat treatment apparatus, a substrate held by a holding part is irradiated with light emitted from halogen lamps to perform preheating thereon and irradiated with a flash of light emitted from flash lamps to perform flash heating thereon. Part of light which is emitted from the halogen lamps... Agent: Ostrolenk Faber Gerb & Soffen

20090180767 - Integrated lamp and heater assembly: An integrated lamp and heater assembly comprises in one embodiment a table lamp and heater intended to be positioned on a table, such as an end table, coffee table, nightstand, or the like and in another embodiment a free-standing floor lamp and heater. The integrated lamp and heater assembly is... Agent: Gray Robinson Attn: Stefan V. Stein/IPDept.

20090180768 - Method and system for recirculating hot water: A method of delivering hot water to a water fixture in which a supplemental hot water heater is installed before the cold water inlet of a tankless hot water heater. The supplemental hot water heater is used to recirculate heated water through the tankless hot water heater at a flow... Agent: Hovey Williams LLP

20090175603 - Equipment group and procedure for storage of heat energy using electric current: Equipment for storage of heat energy preferably for storage of heat energy by converting electric energy produced by plants utilizing wind energy into heat energy and using the stored heat energy for providing various heat supply services, and, in order to eliminate the disadvantages due to the intermittent operation of... Agent: Katten Muchin Rosenman LLP

20090175604 - Nanoparticle generator: A nanoparticle generator includes a heating unit directly heating material for generating nanoparticles. Due to the structure of the heating unit directly heating the material, a space between the heating unit and the material is eliminated such that a volume of the nanoparticle generator is remarkably reduced and the nanoparticle... Agent: Sughrue Mion, PLLC

20090175605 - Heat treatment apparatus for heating substrate by exposing substrate to flash light: A semiconductor wafer to be treated is placed in a horizontal position on a holding plate held by a susceptor. Six bumps are mounted upright on the upper surface of the holding plate. The semiconductor wafer is supported by the six bumps in point contacting relationship, and is held at... Agent: Ostrolenk Faber Gerb & Soffen

20090175606 - Method and structure to control thermal gradients in semiconductor wafers during rapid thermal processing: An article supports a workpiece during thermal processing. At least three elongated support members, e.g., support pins, extend upwardly from an element such as support arms for supporting the workpiece. Each of the support members includes a first portion adjacent to the workpiece. A second portion extends downwardly from the... Agent: International Business Machines Corporation Dept. 18g

20090169190 - Heating system and method for microfluidic and micromechanical applications: An integrated semiconductor heating assembly includes a semiconductor substrate, a chamber formed therein, and an exit port in fluid communication with the chamber, allowing fluid to exit the chamber in response to heating the chamber. The integrated heating assembly includes a first heating element adjacent the chamber, which can generate... Agent: Stmicroelectronics, Inc.