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Device for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuitDevice for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit description/claimsThe Patent Description & Claims data below is from USPTO Patent Application 20080155488, Device for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit. Brief Patent Description - Full Patent Description - Patent Application Claims 1. Field of the Invention The present invention is directed to the design and manufacture of integrated circuits. More specifically, but without limitation thereto, the present invention is directed to a method and computer program for placing fill wires in an integrated circuit design. 2. Description of Related Art In recent semiconductor manufacturing technology, copper wires or traces are typically used to conduct signals within each net in an integrated circuit die. As the net density increases, process restrictions are imposed on the metal to oxide ratio and the uniformity of distribution of the copper metal on the surface of the die. These process restrictions are a consequence of forming the metal traces on the die. The metal traces are made by cutting trenches into a surface oxide layer of the die, filling the trenches and the die surface with copper metal, and polishing the surface of the die to just below the top of the trenches. The copper-filled trenches constitute the traces that interconnect the cells of each net. The rate of material removal during the polishing process is dependent on the metal density, that is, the ratio of copper to oxide on the surface of the die. If the metal density is not uniform across the die, then the traces will be thinner in the high density areas than in the low density areas. The varying trace thickness presents problems in net timing modeling and may result in performance failures in the manufactured die. To maintain a uniform trench height and corresponding trace thickness, the distribution of copper metal across the surface of the die must be kept uniform within a controlled tolerance. SUMMARY OF THE INVENTIONIn one aspect of the present invention, a method of avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit die includes steps of: receiving as input timing information for an integrated circuit design including at least one metal layer and a plurality of signal wires and dummy metal wires in the metal layer; finding at least one of a setup time and a hold time for each signal wire in the metal layer from the timing information; identifying a timing-critical signal wire from at least one of the setup time and the hold time for one of the signal wires that would produce a timing violation in the signal wire when the signal wire is shorted to a dummy metal wire by a process defect in the metal layer; calculating at least one of a wire width, a fracture interval, and a spacing for modifying the dummy metal wire to avoid the timing violation in the timing-critical signal wire; and generating as output at least one of the wire width and the fracture interval for the dummy metal wire. In another aspect of the present invention, a computer readable storage medium tangibly embodies instructions that when executed by a computer implement a method for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit, the method including steps of: receiving as input timing information for an integrated circuit design including at least one metal layer and a plurality of signal wires and dummy metal wires in the metal layer; finding at least one of a setup time and a hold time for each signal wire in the metal layer from the timing information; identifying a timing-critical signal wire from at least one of the setup time and the hold time for one of the signal wires that would produce a timing violation in the signal wire when the signal wire is shorted to a dummy metal wire by a process defect in the metal layer; calculating at least one of a wire width, a fracture interval, and a spacing for modifying the dummy metal wire to avoid the timing violation in the timing-critical signal wire; and generating as output at least one of the wire width and the fracture interval for the dummy metal wire. The term “firmware” is used herein to mean “a computer readable storage medium tangibly embodying instructions that when executed by a computer implement a method”. Continue reading about Device for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit... Full patent description for Device for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Device for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit patent application. Patent Applications in related categories: 20090288054 - Method and apparatus for hierarchical design of semiconductor integrated circuit - A hierarchical design apparatus 1 for a semiconductor integrated circuit includes a hierarchical block placing unit 1-02 which places sets of hierarchical blocks onto a chip; a hierarchical block terminal placing unit 1-03 which places terminals of the hierarchical blocks so that for sets of hierarchical blocks having the same ... 20090288053 - Methods of cell association for automated distance management in integrated circuit design - Associated methods and a computer program product are disclosed for modifying a design of an integrated circuit. Properties are assigned to cells in an integrated circuit design. The properties include a location constraint property and a timing constraint property. When a cell is moved and one or more properties are ... ### 1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. Each week you receive an email with patent applications related to your keywords. Start now! - Receive info on patent apps like Device for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit or other areas of interest. ### Previous Patent Application: Systems and methods for reducing wiring vias during synthesis of electronic designs Next Patent Application: Macrocell, integrated circuit device, and electronic instrument Industry Class: Data processing: design and analysis of circuit or semiconductor mask ### FreshPatents.com Support Thank you for viewing the Device for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit patent info. IP-related news and info Results in 0.136 seconds Other interesting Feshpatents.com categories: Tyco , Unilever , Warner-lambert , 3m 174 |
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