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05/01/08 | 19 views | #20080099339 | Prev - Next | USPTO Class 205 | About this Page  205 rss/xml feed  monitor keywords

Deposition method for nanostructure materials

USPTO Application #: 20080099339
Title: Deposition method for nanostructure materials
Abstract: A method of depositing a coating of a nanostructure material onto a substrate includes: (1) forming a solution of suspension of coating the nanostructure material; (2) selectively adding “chargers” to the solution; (3) immersing electrodes in the solution, the substrate upon which the nanostructure material is to be deposited acting as one of the electrodes; (4) applying a direct and/or alternating current electrical field between the two electrodes for a certain period of time thereby causing the nanostructure materials in the solution to migrate toward and attach themselves to the substrate electrode; and (5) subsequent optional processing of the coated substrate. (end of abstract)
Agent: Jenkins, Wilson, Taylor & Hunt, P. A. - Durham, NC, US
Inventors: Otto Z. Zhou, Bo Gao, Guozhen Yue, Soojin Oh
USPTO Applicaton #: 20080099339 - Class: 205147 (USPTO)


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Method for electrochemical fabrication
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Substrate processing apparatus and substrate processing method
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Electrolysis: processes, compositions used therein, and methods of preparing the compositions

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