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Dale R. Du Bois patents

Recent bibliographic sampling of Dale R. Du Bois patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):



09/18/14 - 20140261178 - Peald apparatus to enable rapid cycling
Methods and apparatus for forming thin films are described. A semiconductor processing chamber includes a substrate support, an electrode opposite the substrate support, the electrode having a gas inlet in a peripheral region thereof, and an edge ring disposed around a peripheral region of the substrate support, the edge ring...
Inventors: Dale R. Du Bois, Jianhua Zhou, Juan Carlos Rocha- Alvarez

03/20/14 - 20140076236 - Method and system for supplying a cleaning gas into a process chamber
A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas...
Inventors: Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-alvarez, Thomas Nowak, Visweswaren Sivaramakrishnan, Hichem M'saad (Applied Materials, Inc.)

08/22/13 - 20130213574 - Method and system for supplying a cleaning gas into a process chamber
A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas...
Inventors: Ramprakash Sankarakrishnan, Dale R. Du Bois, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-alvarez, Thomas Nowak, Visweswaren Sivaramakrishnan, Hichem M'saad

05/23/13 - 20130126206 - Apparatus and methods for improving reliability of rf grounding
Embodiments of the present invention provide an RF conducting rod comprising a hollow portion. Particularly, the RF conducting rod comprises an elongated hollow body having a sidewall enclosing an inner volume, a first solid connector extending from a first end of the elongated hollow body, and a second solid connector...
Inventors: Jianhua Zhou, Dale R. Du Bois, Mohamad A. Ayoub, Juan Carlos Rocha-alvarez (Applied Materials, Inc.)

10/11/12 - 20120258259 - Apparatus and method for uv treatment, chemical treatment, and deposition
Embodiments of the present invention provide apparatus and methods for performing UV treatment and chemical treatment and/or deposition in the same chamber. One embodiment of the present invention provides a processing chamber including a UV transparent gas distribution showerhead disposed above a substrate support located in an inner volume of...
Inventors: Amit Bansal, Dale R. Du Bois, Juan Carlos Rocha-alvarez, Sanjeev Baluja, Scott A. Hendrickson, Thomas Nowak

08/16/12 - 20120205046 - Tunable ground planes in plasma chambers
An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face...
Inventors: Karthik Janakiraman, Thomas Nowak, Juan Carlos Rocha-alvarez, Mark A. Fodor, Dale R. Du Bois, Amit Bansal, Mohamad A. Ayoub, Eller Y. Juco, Visweswaren Sivaramakrishnan, Hichem M'saad (Applied Materials, Inc.)

01/12/12 - 20120009803 - Mixing energized and non-energized gases for silicon nitride deposition
A dual channel gas distributor can simultaneously distribute plasma species of an first process gas and a non-plasma second process gas into a process zone of a substrate processing chamber. The gas distributor has a localized plasma box with a first inlet to receive a first process gas, and opposing...
Inventors: Kee Bum Jung, Dale R. Du Bois, Lun Tsuei, Lihua Li Huang, Martin Jay Seamons, Soovo Sen, Reza Arghavani, Michael Chiu Kwan (Applied Materials, Inc.)

12/01/11 - 20110294303 - Confined process volume pecvd chamber
An apparatus for plasma processing a substrate is provided. The apparatus comprises a processing chamber, a substrate support disposed in the processing chamber, a shield member disposed in the processing chamber below the substrate support, and a lid assembly coupled to the processing chamber. The lid assembly comprises a conductive...
Inventors: Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Juan Carlos Rocha-alvarez, Dale R. Du Bois, Mark Fodor, Jianhua Zhou, Amit Bansal, Mohamad A. Ayoub, Shahid Shaikh, Patrick Reilly, Deenesh Padhi, Thomas Nowak (Applied Materials, Inc.)

06/30/11 - 20110159211 - Shadow ring for modifying wafer edge and bevel deposition
Embodiments of the invention contemplate a shadow ring that provides increased or decreased and more uniform deposition on the edge of a wafer. By removing material from the top and/or bottom surfaces of the shadow ring, increased edge deposition and bevel coverage can be realized. In one embodiment, the material...
Inventors: Dale R. Du Bois, Mohamad A. Ayoub, Robert Kim, Amit Bansal, Mark Fodor, Binh Nguyen, Siu F. Cheng, Hang Yu, Chiu Chan, Ganesh Balasubramanian, Deenesh Padhi, Juan Carlos Rocha (Applied Materials, Inc.)

06/23/11 - 20110147363 - Multifunctional heater/chiller pedestal for wide range wafer temperature control
Embodiments of the invention generally relate to a semiconductor processing chamber and, more specifically, a heated support pedestal for a semiconductor processing chamber. In one embodiment, a pedestal for a semiconductor processing chamber is provided. The pedestal comprises a substrate support comprising a conductive material and having a support surface...
Inventors: Lipyeow Yap, Tuan Anh Nguyen, Dale R. Du Bois, Sanjeev Baluja, Thomas Nowak, Juan Carlos Rocha-alvarez, Jianhua Zhou (Applied Materials, Inc.)

02/10/11 - 20110034034 - Dual temperature heater
A method and apparatus for heating a substrate in a chamber are provided. an apparatus for positioning a substrate in a processing chamber. In one embodiment, the apparatus comprises a substrate support assembly having a support surface adapted to receive the substrate and a plurality of centering members for supporting...
Inventors: Dale R. Du Bois, Juan Carlos Rocha-alvarez, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap, Jianhua Zhou, Thomas Nowak (Applied Materials, Inc.)

11/11/10 - 20100285240 - Apparatus and method for exposing a substrate to a rotating irradiance pattern of uv radiation
Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support...
Inventors: Juan Carlos Rocha-alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson, Dustin W. Ho, Andrzei Kaszuba, Tom K. Cho (Applied Materials, Inc)

12/24/09 - 20090314211 - Big foot lift pin
Embodiments described herein generally provide a lift pin assembly having increased wafer placement accuracy, repeatability, reliability, and corrosion resistance. In one embodiment, a lift pin assembly for positioning a substrate relative to a substrate support is provided. The lift pin assembly comprises a lift pin comprising a pin shaft, a...
Inventors: Dale R. Du Bois, Mark A. Fodor, Karthik Janakiraman, Juan Carlos Rocha-alvarez (Applied Materials, Inc.)

09/24/09 - 20090236214 - Tunable ground planes in plasma chambers
An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face...
Inventors: Karthik Janakiraman, Thomas Nowak, Juan Carlos Rocha-alvarez, Mark A. Fodor, Dale R. Du Bois, Amit Bansal, Mohamad Ayoub, Eller Y. Juco, Visweswaren Sivaramakrishnan, Hichem M'saad

Applied Materials, Inc., Applied Materials, Inc

Archived*
(*May have duplicates - we are upgrading our archive.)

20120258259 - Apparatus and method for uv treatment, chemical treatment, and deposition


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The bibliographic references displayed about Dale R. Du Bois's patents are for a recent sample of Dale R. Du Bois's publicly published patent applications. The inventor/author may have additional bibliographic citations listed at the USPTO.gov. FreshPatents.com is not associated or affiliated in any way with the author/inventor or the United States Patent/Trademark Office but is providing this non-comprehensive sample listing for educational and research purposes using public bibliographic data published and disseminated from the United States Patent/Trademark Office public datafeed. This information is also available for free on the USPTO.gov website. If Dale R. Du Bois filed recent patent applications under another name, spelling or location then those applications could be listed on an alternate page. If no bibliographic references are listed here, it is possible there are no recent filings or there is a technical issue with the listing--in that case, we recommend doing a search on the USPTO.gov website.

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