Controlled vapor deposition of multilayered coatings adhered by an oxide layer -> Monitor Keywords

Site News |

Monitor Keywords |

Monitor Archive |

Organizer |

Account Info |

12/08/05 - USPTO Class 428 | 14 views | #20050271893 | Prev - Next | About this Page

Controlled vapor deposition of multilayered coatings adhered by an oxide layer

Title: Controlled vapor deposition of multilayered coatings adhered by an oxide layer

Related Patent Categories: Stock Material Or Miscellaneous Articles, All Metal Or With Adjacent Metals, Composite; I.e., Plural, Adjacent, Spatially Distinct Metal Components (e.g., Layers, Joint, Etc.), With Additional, Spatially Distinct Nonmetal Component, Oxide-containing Component, Plural Oxides

Brief Patent Description - Full Patent Description - Patent Claims

The Patent Description & Claims data below is from USPTO Patent Application 20050271893, Controlled vapor deposition of multilayered coatings adhered by an oxide layer.

We claim:

1. A method of depositing multilayered coatings on a substrate, which coatings are tailored to provide a particular characteristic behavior, wherein all layers of said multilayered coating are deposited from a vapor phase, and wherein said multilayered coatings include a at least one oxide-based layer and at least one organic-based layer.

2. A method in accordance with claim 1, wherein a plurality of oxide based layers are deposited.

3. A method in accordance with claim 1, wherein said vapor phase deposition employs a stagnant source of reactive moities during the formation of each layer of the coating, which source of reactive moities is depleted as the layer deposition continues.

4. A method in accordance with claim 1 or claim 3, wherein said method is carried out using a stepped addition of reactive moities to be consumed during deposition of a coating layer.

5. A method in accordance with claim 4, wherein said coating layer is deposited using a series of stepped addition and mixing steps during deposition.

6. A method in accordance with claim 1 or claim 3, wherein a plasma treatment is carried out after the deposition of each organic-based layer which is not the final surface layer of the coating.

7. A method in accordance with claim 1 or claim 3, wherein said plurality of oxide-based layers and organic-based layers are deposited so that an oxide-based layer alternates with an organic-based layer.

8. A method in accordance with claim 1 or claim 3, wherein prior to deposition of a first organic-based layer on a substrate, an oxide-based layer is applied over said substrate.

9. A method in accordance with claim 8, wherein an exposed surface of said oxide-based layer contains --OH moieties.

10. A method in accordance with claim 8, wherein an exposed surface of said oxide-based layer contains halogen moieties.

11. A method in accordance with claim 10, wherein said halogen moieties comprise chlorine.

12. A method in accordance with claim 8, wherein prior to deposition of said oxide-based layer, said substrate is treated using an oxygen-based plasma.

13. A method in accordance with claim 8, wherein said oxide-based layer is deposited in the presence of an oxygen-containing plasma.

14. A method in accordance with claim 1 or claim 3, where more than 50% of the thickness contribution to the multilayered coating is provided by said plurality of oxide-based layers.

15. A method in accordance with claim 8, wherein said oxide-based layer is formed by a reaction between a chlorosilane vapor and water vapor.

16. A method in accordance with claim 15, wherein said chlorosilane vapor and said water vapor react essentially on said substrate surface.

17. A method in accordance with claim 15, wherein a combination of a partial pressure of a chlorosilane vaporous precursor and a partial pressure of a water vapor precursor are used to control said reaction between said chlorosilane precursor and said water precursor.

18. A method in accordance with claim 17, wherein said chlorosilane is selected from the group consisting of tetrachlorosilane, hexachlorosilane, hexachlorosiloxane and combinations thereof.

19. A method in accordance with claim 17, wherein a total pressure in said process chamber ranges from about 0.5 Torr to about 30 Torr, and a partial pressure of said chlorosilane vaporous precursor ranges from about 0.5 Torr to about 15 Torr.

20. A method in accordance with claim 19 wherein a substrate temperature during deposition of said oxide ranges from about 15.degree. C. and about 80.degree. C.

21. A method in accordance with claim 20, wherein a temperature of a major processing surface inside said processing chamber ranges from about 20.degree. C. to about 100.degree. C.

22. A method in accordance with claim 17, wherein a partial pressure of said water vapor precursor ranges from about 0.5 Torr to about 20 Torr.

23. A method in accordance with claim 17, wherein, subsequent to the deposition of said oxide and the creation of hydroxyl groups on said oxide surface, a vaporous organo-chlorosilane which includes a specific functional group is reacted with said hydroxyl groups to impart specific functional characteristics to said coating.

24. A method in accordance with claim 23, wherein a partial pressure of said organo-chlorosilane vaporous precursor is used to control said reaction between said organo-chlorosilane precursor and said hydroxyl groups so that said reaction occurs substantially on said substrate surface.

25. A method in accordance with claim 24, wherein said reaction occurs essentially on said substrate surface.

26. A method in accordance with claim 23 wherein said organo-silane vaporous precursor includes a functional moiety selected from the group consisting of an alkyl group, an alkoxyl group, an alkyl substituted group containing fluorine, an alkoxyl substituted group containing fluorine, a vinyl group, an ethynyl group, an epoxy group, a glycoxy group, an acrylo group, a glycol substituted group containing a silicon atom or an oxygen atom, and combinations thereof.

27. A method in accordance with claim 26, wherein a total pressure in said process chamber ranges from about 0.5 Torr to about 30 Torr, and a partial pressure of said organo-chlorosilane vaporous precursor ranges from about 0.1 Torr to about 10 Torr.

28. A method in accordance with claim 27, wherein a substrate temperature during deposition of said organo-chlorosilane vaporous precursor ranges from about 15.degree. C. and about 80.degree. C.

29. A method in accordance with claim 28, wherein said temperature of said major process surface ranges from about 20.degree. C. to about 100.degree. C.

30. A method of depositing a multilayered coating on a substrate from a vapor phase, wherein each layer deposition rate is controlled by controlling a total pressure in a processing chamber in which said coating is deposited, a partial pressure of at least one coating precursor, a temperature of a substrate on which said coating is deposited, and at least one temperature of a major processing surface inside said processing chamber.

31. A method of depositing a multilayered coating on a substrate from a vapor phase, wherein each layer deposition rate and a surface roughness of said multilayered coating are simultaneously controlled by controlling a total pressure in a processing chamber in which said coating is deposited, a partial pressure of at least one coating precursor, a temperature of a substrate on which said coating is deposited, and at least one temperature of a major processing surface inside said processing chamber.

32. A method of controlling the surface roughness of a multilayered organo-silicon-containing coating on a substrate, wherein said multilayered coating is deposited from a vapor phase, wherein at least one layer is formed using an organosilane precursor which is introduced into a coating deposition chamber in which said multilayered coating is deposited, followed by the introduction of water vapor, and wherein said surface roughness of said at least one layer is further controlled by controlling a total pressure in said deposition chamber, a partial pressure of at least one precursor, and a temperature of a substrate on which said coating is deposited.

33. A method in accordance with claim 32, wherein at least two organosilane precursors are introduced into said coating deposition chamber, followed by the introduction of water, whereby controllable co-deposition of said organosilane precursors is obtained.

34. A method in accordance with claim 32, where a partial pressure of each precursor is controlled to adjust said surface roughness of said organo-silicon-containing coating.

35. A method in accordance with claim 32, wherein a partial pressure of said water vapor precursor is controlled to adjust said surface roughness of said organo-silicon-containing coating.

36. A method of depositing a multilayered coating wherein an oxide-based layer thickness in direct contact with a substrate is controlled as a function of the chemical composition of said substrate, and wherein a SAM organic-based layer is deposited directly over said oxide-based layer, whereby an ability of said SAM organic-based layer to bond to said oxide-based layer is improved due to control of said oxide-based layer thickness.

37. A method of depositing a multilayered coating over a substrate, comprising deposition of at least two oxide-based layers and at least one organic-based layer, where each layer is deposited from a vapor phase, wherein said oxide based layer and said organic-based layer are alternated, and wherein an oxide-based layer is deposited directly over a surface of said substrate.

38. A method in accordance with claim 37, wherein said multilayered coating includes at least two oxide-based layers and at least two organic-based layers.

39. A method in accordance with claim 38, wherein said multilayered coating includes at least five oxide-based layers and at least five organic-based layers.

40. A structure comprising a substrate with a multilayered coating deposited over a surface of said substrate, wherein said multilayered coating comprises a SAM organic-based layer deposited directly over an oxide-based layer which is deposited directly over said substrate, and wherein a thickness of said oxide-based layer which is in direct contact with said substrate is controlled as a function of the chemical composition of said substrate, whereby an ability of said SAM organic-based layer to bond to said oxide-based layer is improved.

41. A structure in accordance with claim 40, wherein said multilayered coating comprises at least two oxide-based layers and at least one organic-based layer, wherein an oxide-based layer and an organic-based layer are alternated.

42. A structure in accordance with claim 41, wherein said multilayered coating comprises at least two oxide-based layers and at least two organic-based layers, wherein an organic-based layer forms the surface of said multilayered coating.

43. A structure comprising a substrate with a multilayered coating applied over a surface of said substrate, wherein said multilayered coating comprises a SAM organic-based layer deposited directly over an oxide-based layer which is deposited directly over said substrate, wherein said multilayered coating includes alternating layers of oxide-based material and SAM organic-based material.

44. A structure in accordance with claim 43, wherein said multilayered coating includes at least two oxide-based layers and at least one SAM organic-based layer.

45. A structure in accordance with claim 44, wherein said multilayered coating includes at least two oxide-based layers and at least two SAM organic based layers.

Brief Patent Description - Full Patent Description - Patent Claims

Click on the above for other options relating to this Controlled vapor deposition of multilayered coatings adhered by an oxide layer patent application.
###

How KEYWORD MONITOR works... a FREE service from FreshPatents
1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored.
3. Each week you receive an email with patent applications related to your keywords.
Start now! - Receive info on patent apps like Controlled vapor deposition of multilayered coatings adhered by an oxide layer or other areas of interest.
###

Previous Patent Application:
Titania-metal composite and method for preparation thereof, and film forming method using dispersion comprising the composite
Next Patent Application:
Bonded metal components having uniform thermal conductivity characteristics and method of making same
Industry Class:
Stock material or miscellaneous articles

###

Design/code © 2009 FreshContext LLC/Freshpatents.com. Website Terms and Conditions - Also read: About this Page
Patent data source: patents published by the United States Patent and Trademark Office (USPTO)
Information published here is for research/educational purposes only (and in conjunction with our Keyword Monitor) and is not meant to be used in place of the full USPTO patent document/images or a comprehensive patent archive search. Complete official applications are on file at the USPTO and often contain additional data/images (Freshpatents is currently text-only). FreshPatents.com is not affiliated with or endorsed by the USPTO or firms/individuals or products/designs/ideas related to listed patents.

FreshPatents.com Support
Thank you for viewing the Controlled vapor deposition of multilayered coatings adhered by an oxide layer patent info.
IP-related news and info

Results in 0.19102 seconds

Other interesting Feshpatents.com categories:
Canon USA , Celera Genomics , Cephalon, Inc. , Cingular Wireless , Clorox , Colgate-Palmolive , Corning , Cymer , 174

* Protect your Inventions
* US Patent Office filing

Provisional Patent
Utility Patent

PATENT INFO