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  Color organic el display and method for manufacturing the sameThe Patent Description & Claims data below is from USPTO Patent Application 20060017383. Brief Patent Description - Full Patent Description - Patent Application Claims
CROSS REFERENCE TO RELATED APPLICATIONS [0001] This application is based on Japanese Patent Applications No. 2004-211593 filed on Jul. 20, 2004, No. 2005-35891 filed on Feb. 14, 2005, and No. 2005-157722 filed on May 30, 2005, the disclosures of which are incorporated herein by references. FIELD OF THE INVENTION [0002] The present invention relates to a color organic EL display and a method for manufacturing a color organic EL display. BACKGROUND OF THE INVENTION [0003] A color organic EL (i.e., electroluminescence) display constituted by interposing a gas barrier layer between an organic EL (electroluminescence) structural body and a color filter is well-known. [0004] This sort of color organic EL display is equipped with such a structure that a color filter layer, a gas barrier layer, and an organic EL structural body have been successively stacked on a substrate. [0005] Specifically, when an organic EL structural body for emitting white light is combined with a color filter, the below-mentioned structure of such a color organic EL display is known. That is, a color filter layer, an overcoat layer, a gas barrier layer, and an organic EL structural body element are successively stacked on a transparent substrate, while the organic EL structural body element emits white light. [0006] In this color organic EL display, the gas barrier layer is provided to prevent difficulties such as dark spots of the white light emitting organic EL structural body and lowering of a luminous efficiency thereof. These difficulties are caused by water contents and the like, which are volatilized from the color filter layer and the overcoat layer, which are made of resin. [0007] Accordingly, as to the gas barrier layer, pin-holeless characteristics are required, and superior step coverage thereof is required. In addition to the above-described performance, other performance such as transparent characteristics and flat characteristics of surfaces is required. [0008] Conventionally, as examples of gas barrier layers, one gas barrier layer has been proposed which contains a silicon oxide and is manufactured by executing a sputtering film forming method. For example, Japanese Laid-open Patent Application No. Hei-11-260562 (which corresponds to EP 1115269-A1) discloses the structure. Also, another gas barrier layer has been proposed in which an insulating inorganic oxide layer is arranged as the gas barrier layer of a color converting element (CCM). For example, Japanese Laid-open Patent Application No. Hei-8-279394 (which corresponds to U.S. Pat. No. 5,909,081) discloses this structure. [0009] However, pin-holes are not considered in view of gas barrier characteristics, as to these conventional gas barrier layers, so that dark spots are easily produced in pixels, and such pixels which cannot maintain desirable light emitting characteristics of organic EL elements are readily produced. [0010] As measures capable of solving such pin-hole problems occurred in these gas barrier layers, one measure has been proposed in which while a gas barrier layer is formed in a multilayer structure, cleaning steps are carried out among film forming steps for these plural gas barrier layers. For instance, Japanese Laid-open patent Application No. 2003-229271 discloses this structure. Another measure has been proposed in which while a gas barrier layer is formed in a multilayer structure, resin layers are distributed to the respective gas barrier layers. For instance, Japanese Laid-open Patent Application No. 2003-282239 discloses the structure. [0011] Also, as the pin-hole measures, one measure has been proposed in which a gas barrier layer is formed by a plasma CVD method (P-CVD method), while this P-CVD method is capable of forming a dense film, as compared with a sputtering method which corresponds to a general-purpose film forming method for a gas barrier layer. For example, Japanese Laid-open Patent Application No. 2004-39468 discloses the structure. [0012] However, the pin-hole measures described in the above documents own problems as to productivity and cost aspects, since the structures of the gas barrier layers and the manufacturing processes thereof are complex. [0013] Also, in the gas barrier layer manufactured by employing the P-CVD method, when the gas barrier layer is formed by way of the P-CVD method, the film forming operations are carried out at a relatively low temperature, since heat resistance characteristics as to the color filter layer and the overcoat layer are considered, which are provided under the gas barrier layer. In this film forming operation, since dense characteristics of these films are deteriorated, gas barrier characteristics thereof are deteriorated. As a result, these layer structures must be replaced by other stacked layer structures, or the film thicknesses of these layers must be made thicker, so that the problem as to the productivity still remains, and thus, the manufacturing cost is increased. SUMMARY OF THE INVENTION [0014] In view of the above-described problem, it is an object of the present invention to provide a color organic EL display manufactured with low-cost and having simple structure. [0015] A color organic EL display includes: a substrate; a color filter layer disposed on the substrate; a gas barrier layer disposed on the color filter layer; and an organic EL structural body disposed on the gas barrier layer. The substrate and the color filter layer provide an underlayer of the gas barrier layer. The underlayer is a degassed underlayer. The gas barrier layer is provided by an atomic layer deposition method at a temperature equal to or lower than a decomposition starting temperature of the color filter layer. [0016] In the display, since the underlayer of the gas barrier layer is degassed, the amount of gas discharged from the substrate and the color filter layer is reduced. Further, since the gas barrier layer is formed at the temperature equal to or lower than the decomposition starting temperature of the color filter layer by the atomic layer deposition method, the color filter layer is not deteriorated with time. Therefore, the gas barrier layer can be formed appropriately. Further, the gas barrier layer is formed by the atomic layer deposition method, which is superior in coating performance and minimum pin holes, compared with a vacuum deposition method, a sputtering method, and a plasma CVD method; and therefore, step coverage of the gas barrier layer is improved and the number of pin holes is reduced. Furthermore, the gas barrier layer can be formed by single process of the atomic layer deposition method, so that productivity of the display is increased, and the manufacturing cost is reduced. Furthermore, the underlayer of the gas barrier layer is degassed so that the amount of gas discharged from the underlayer is reduced. Therefore, the gas barrier layer is prevented from expanding by the discharged gas. Thus, the gas barrier layer is not peeled off. Thus, the color organic EL display is manufactured with low-cost and having simple structure. [0017] Further, a method for manufacturing a color organic EL display is provided. The display includes a substrate, a color filter layer, a gas barrier layer and an organic EL structural body, which are stacked in this order. The substrate and the color filter layer provide an underlayer of the gas barrier layer. The method includes the steps of: degassing the underlayer of the gas barrier layer; and forming the gas barrier layer by an atomic layer deposition method in such a manner that a plurality of raw material gases is alternately introduced on the substrate under reduced pressure at a temperature equal to or lower than a decomposition starting temperature of the color filter layer. [0018] In the display, the amount of gas discharged from the substrate and the color filter layer is reduced. Further, the color filter layer is not deteriorated with time. Therefore, the gas barrier layer can be formed appropriately. Further, the gas barrier layer is formed by the atomic layer deposition method, which is superior in coating performance and minimum pin holes; and therefore, step coverage of the gas barrier layer is improved and the number of pin holes is reduced. Furthermore, productivity of the display is increased, and the manufacturing cost is reduced. Furthermore, the gas barrier layer is not peeled off. Thus, the color organic EL display is manufactured with low-cost and having simple structure. BRIEF DESCRIPTION OF THE DRAWINGS [0019] The above and other objects, features and advantages of the present invention will become more apparent from the following detailed description made with reference to the accompanying drawings. In the drawings: Continue reading... 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